Mr. Sotirios Tsiachris Profile

Sotirios Tsiachris

Sr. Project Manager

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 22 February 2021 Presentation + Paper

Qualification of small alignment mark by on-product overlay performance

Jigang Ma, Frans Bijnen, Edo Hulsebos, Lukasz Macht, Sotirios Tsiachris, Jin Dai, Rob van der Meulen, Miao Yu, Paul Böcker, Jung-Hwan Kim, Hyun Kim, Gwang-Gon Kim, Joon-Seuk Lee, Eung-Ryong Oh, Hong-Bok Yeon, Young-Deuk Kim, Seung-Uk Jeong, Sang-Ho Lee, Chan-Ha Park

Proceedings Volume 11613, 116130J (2021) https://doi.org/10.1117/12.2584618

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Algorithm development, Semiconductor manufacturing, Scanners, Process control, Device simulation

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Proceedings Article | 22 February 2021 Presentation + Paper

Edge placement error wafer mapping and investigation for improvement in advanced DRAM node

Kuan-Ming Chen, Wolfgang Henke, Ji-Hoon Jung, Ewa Kasperkiewicz, Anita Bouma, Rizvi Rahman, Gratiela Isai, Gwang-Gon Kim, Sotirios Tsiachris, Jae-Doug Yoo, Yuna Park, JaeYoung Park, Jonggeun Won, Nang-Lyeom Oh, Hsin-Yu Chen, WeiTai Lin, Chih-Hung Hsieh, Kuo-Feng Pao, Kyoyeon Cho, Abdalmohsen Elmalk, Sudharshanan Raghunathan, Taekwon Jee, Seung-Uk Jeong, Jeongwoo Jae, Sang-Woo Kim, Dongyoung Lee, Jungchan Kim, WonKwang Ma, Sang-Ho Lee, Chan-Ha Park

Proceedings Volume 11611, 116111V (2021) https://doi.org/10.1117/12.2584149

KEYWORDS: Semiconducting wafers, Critical dimension metrology, Overlay metrology, Optical lithography, Metrology, Visualization, Statistical analysis, Lithography, Graphic design, Etching

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Proceedings Article | 23 March 2020 Presentation + Paper

Holistic alignment approach for on-product overlay improvement on DUV lithography process with combined solutions

Jigang Ma, Miao Yu, Cees Lambregts, Sotirios Tsiachris, Paul Böcker, Jun-Yeob Kim, Won-Kwang Ma, Sang-Jun Han, Chan-Ha Park, Kyong-Seok Kim, Jung-Hwan Kim, Sang-Jun Park, Gwang-Gon Kim

Proceedings Volume 11327, 113270S (2020) https://doi.org/10.1117/12.2552938

KEYWORDS: Optical alignment, Overlay metrology, Semiconducting wafers, Deep ultraviolet, Scanners, Lithography, Sensors, Optimization (mathematics), Feedback control

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