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Sang-Jun Park
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Publications (1)
Proceedings Article | 23 March 2020 Presentation + Paper
Holistic alignment approach for on-product overlay improvement on DUV lithography process with combined solutions
Jigang Ma, Miao Yu, Cees Lambregts, Sotirios Tsiachris, Paul Böcker, Jun-Yeob Kim, Won-Kwang Ma, Sang-Jun Han, Chan-Ha Park, Kyong-Seok Kim, Jung-Hwan Kim, Sang-Jun Park, Gwang-Gon Kim
Proceedings Volume 11327, 113270S (2020) https://doi.org/10.1117/12.2552938
KEYWORDS: Optical alignment, Overlay metrology, Semiconducting wafers, Deep ultraviolet, Scanners, Lithography, Sensors, Optimization (mathematics), Feedback control
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