CONFERENCE PROCEEDINGS
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Junyeob Kim
at Samsung Electronics
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Author
Publications (2)
Proceedings Article | 23 March 2020 Presentation + Paper
Holistic alignment approach for on-product overlay improvement on DUV lithography process with combined solutions
Jigang Ma, Miao Yu, Cees Lambregts, Sotirios Tsiachris, Paul Böcker, Jun-Yeob Kim, Won-Kwang Ma, Sang-Jun Han, Chan-Ha Park, Kyong-Seok Kim, Jung-Hwan Kim, Sang-Jun Park, Gwang-Gon Kim
Proceedings Volume 11327, 113270S (2020) https://doi.org/10.1117/12.2552938
KEYWORDS: Optical alignment, Overlay metrology, Semiconducting wafers, Deep ultraviolet, Scanners, Lithography, Sensors, Optimization (mathematics), Feedback control
Proceedings Article | 26 March 2019 Paper
Measuring after etch overlay and characterizing tilt fingerprints in multi-tier 3D-NAND structures
Hong-Goo Lee, Dong-Young Lee, Jun-Yeob Kim, Sang-Jun Han, Chan-Ha Park, Jaap Karssenberg, Mir Shahrjerdy, Arno van Leest, Nang-Lyeom Oh, Dong-Hak Lee, Aileen Soco, Tjitte Nooitgedagt
Proceedings Volume 10959, 1095907 (2019) https://doi.org/10.1117/12.2515299
KEYWORDS: Overlay metrology, Semiconducting wafers, Metrology, Scanners, Etching, Lithography, Scatterometry, Signal detection, Instrument modeling, Optical lithography
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