Dr. Frans G. C. Bijnen
at ASML Netherlands BV
SPIE Involvement:
Author
Publications (6)

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11613, 116130J (2021) https://doi.org/10.1117/12.2584618
KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Algorithm development, Semiconductor manufacturing, Scanners, Process control, Device simulation

Proceedings Article | 30 December 2004 Paper
Proceedings Volume 5641, (2004) https://doi.org/10.1117/12.573807
KEYWORDS: Glasses, Semiconducting wafers, Overlay metrology, Optical alignment, Silicon, 3D metrology, Lithography, Reflectivity, Microelectromechanical systems, Phase modulation

Proceedings Article | 16 August 2004 Paper
Henk van Zeijl, Frans Bijnen, John Slabbekoorn
Proceedings Volume 5455, (2004) https://doi.org/10.1117/12.545900
KEYWORDS: Semiconducting wafers, Resistors, Overlay metrology, Optical alignment, Etching, Calibration, Resistance, Wafer-level optics, Bulk micromachining, Tin

Proceedings Article | 16 June 2003 Paper
Frans Bijnen, Willy van Buel, Cheng Gui, Joeri Lof
Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.487585
KEYWORDS: Semiconducting wafers, Optical alignment, Calibration, Wafer-level optics, Metrology, Bismuth, Reticles, Overlay metrology, Lithography, Chemical mechanical planarization

Proceedings Article | 1 July 2002 Paper
Cheng-Qun Gui, Willy van Buel, Frans Bijnen, Joeri Lof
Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472359
KEYWORDS: Optical alignment, Semiconducting wafers, Data transmission, Calibration, Wafer-level optics, Optical design, Sensors, Imaging systems, Optical lithography, Lithography

Showing 5 of 6 publications
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