Dr. Douglas J. Guerrero Profile

Dr. Douglas J. Guerrero

Senior Technologist at Brewer Science Inc

SPIE Involvement:

Conference Chair | Author | Editor

Area of Expertise:

Lithography , Underlayers , Directed self assembly , Reflection control , Photoactive polymers , Patterning processes

Websites:

Company Website

Profile Summary

Douglas Guerrero received a PhD in Organic Chemistry from the University of Oklahoma and completed Post-doctoral work at the University of Texas-Dallas in the field of conducting polymers.

He joined Brewer Science in 1995 and has served in several positions within the R&D organization where he led the development and commercialization of several Anti-reflecting coating products. He is currently a Senior Technologist in the Semiconductor Materials Business Unit. He has been on assignment at imec in Leuven, Belgium since 2008 where he is supporting development of processes for future nodes.

Dr. Guerrero is a Senior Member of SPIE and chair of the SPIE Advances in Patterning Materials and Processes conference. He has served in several international symposia committees and has published over 80 papers and patents on optoelectronic materials, underlayers for lithography, reflection control, and DSA.

Publications (39)

Proceedings Article | 13 November 2024 Presentation

Presentation

Enhancing sustainability in semiconductor manufacturing: energy-efficient optical crosslinking for lithography processes

Elke Caron, Wesley Zanders, Seungjoo Baek, Seonggil Heo, Jelle Vandereyken, Hyo Seon Suh, Douglas Guerrero, Andreia Santos, Masahiko Harumoto, Tsuyoshi Mitsuhashi

Proceedings Volume PC13215, PC1321507 (2024) https://doi.org/10.1117/12.3036987

KEYWORDS: Lithography, Sustainability, Semiconductor manufacturing, Optics manufacturing, Spin on carbon materials, Semiconductors, Power consumption, Industry, Carbon, System integration

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SPIE Journal Paper | 4 September 2024

Energy-efficient optical crosslinking of underlayers for sustainable and low-power semiconductor manufacturing

Seungjoo Baek, Jelle Vandereyken, Hyo Seon Suh, Elke Caron, Andreia Santos, Masahiko Harumoto, Douglas Guerrero, Seonggil Heo

JM3, Vol. 23, Issue 03, 034602, (September 2024) https://doi.org/10.1117/12.10.1117/1.JMM.23.3.034602

KEYWORDS: Power consumption, Sustainability, Spin on carbon materials, Semiconductors, Etching, Optical lithography, Thermography, Industry, Semiconductor manufacturing, Optics manufacturing

Read Abstract +

Proceedings Article | 10 April 2024 Presentation + Paper

Presentation + Paper

Machine, process, and material efforts towards sustainable lithography

Andreia Santos, Wesley Zanders, Elke Caron, Seungjoo Baek, Seonggil Heo, Jelle Vandereyken, Hyo Seon Suh, Douglas Guerrero, Masahiko Harumoto, Tsuyoshi Mitsuashi

Proceedings Volume 12957, 1295717 (2024) https://doi.org/10.1117/12.3010506

KEYWORDS: Spin on carbon materials, Sustainability, Thermography, Power consumption, Lithography, Displays, Semiconductors, Optical lithography, Materials processing, Extreme ultraviolet

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Proceedings Article | 9 April 2024 Presentation + Paper

Presentation + Paper

Functional underlayers, surface priming, and multilayer stacks to improve dose and adhesion of EUV photoresists

Roberto Fallica, Lander Verstraete, Weizhong Huang, Mihir Gupta, Danilo De Simone, Si (Elly) Li, Daniel Sweat, Douglas Guerrero, Kodai Kato

Proceedings Volume 12957, 1295712 (2024) https://doi.org/10.1117/12.3009801

KEYWORDS: Extreme ultraviolet lithography, Photoresist materials, Adhesion, Etching, Semiconducting wafers, Extreme ultraviolet, Silicon, Line width roughness, Chemically amplified resists, Amorphous carbon

Read Abstract +

Proceedings Article | 9 April 2024 Presentation + Paper

Presentation + Paper

Lithography performance improvement of MOR by underlayers

Si Li, Xinlin Lu, Stephen Grannemann, Daniel Sweat, Kelsey Brakensiek, Pengtao Lu, Joyce Lowes, Vandana Krishnamurthy, Veerle Van Driessche, Douglas Guerrero

Proceedings Volume 12957, 1295715 (2024) https://doi.org/10.1117/12.3010887

KEYWORDS: Polymers, Film thickness, Lithography, Extreme ultraviolet lithography, Semiconducting wafers, Coating, Tin, Silicon, Diffusion

Read Abstract +

Proceedings Article | 9 April 2024 Poster + Paper

Poster + Paper

Understanding and improving performance of 14-nm HP EUV lithography via rational design of materials

Si Li, Daniel Sweat, Xinlin Lu, Kelsey Brakensiek, Pengtao Lu, Joyce Lowes, Veerle Van Driessche, Douglas Guerrero

Proceedings Volume 12957, 129571T (2024) https://doi.org/10.1117/12.3010498

KEYWORDS: Polymers, Extreme ultraviolet lithography, Line width roughness, Lithography, Adhesives, Adhesion, Extreme ultraviolet

Read Abstract +

Proceedings Article | 9 April 2024 Poster + Paper

Poster + Paper

Light-curable underlayers for non-baking process in EUV lithography

Seungjoo Baek, Seonggil Heo, Jelle Vandereyken, Hyo Seon Suh, Elke Caron, Andreia Santos, Masahiko Harumoto, Douglas Guerrero

Proceedings Volume 12957, 129572G (2024) https://doi.org/10.1117/12.3012855

KEYWORDS: Power consumption, Etching, Spin on carbon materials, Semiconductors, Optical lithography, Line edge roughness, Thermography, Extreme ultraviolet lithography, Lithography, Industry

Read Abstract +

Proceedings Article | 21 November 2023 Presentation + Paper

Presentation + Paper

Functional underlayers for dose reduction and collapse mitigation in EUV lithography: a factorial analysis

Roberto Fallica, Weizhong Huang, Hyo Seon Suh, Danilo De Simone, Douglas Guerrero, Kodai Kato

Proceedings Volume 12750, 127500I (2023) https://doi.org/10.1117/12.2687546

KEYWORDS: Factor analysis, Extreme ultraviolet lithography, Surface roughness, Photoresist materials, Statistical analysis, Line width roughness, Extreme ultraviolet, Metal oxides, Lithography

Read Abstract +

Proceedings Article | 1 May 2023 Presentation + Paper

Presentation + Paper

Novel assist layers to enhance EUV lithography performance of photoresists on different substrates

Si Li, Joyce Lowes, Ruimeng Zhang, Ming Luo, Kelsey Brakensiek, Veerle Van Driessche, Douglas Guerrero

Proceedings Volume 12498, 124980N (2023) https://doi.org/10.1117/12.2658529

KEYWORDS: Semiconducting wafers, Extreme ultraviolet lithography, Coating, Coating thickness, Silicon, Photoresist materials, Adhesion, Line width roughness, Resistance, Adhesives

Read Abstract +

Proceedings Article | 13 June 2022 Presentation

Presentation

High-temperature stable spin-on carbon materials for advanced pattern transfer applications

Jakub Koza, Caroline Evans, Runhui Huang, Jamie Storie, Vandana Krishnamurthy, Douglas Guerrero

Proceedings Volume PC12055, PC1205501 (2022) https://doi.org/10.1117/12.2628988

KEYWORDS: Carbon, System on a chip, Chemical vapor deposition, Deposition processes, Atomic layer deposition, Extreme ultraviolet lithography, Double patterning technology, Chemical mechanical planarization

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Proceedings Article | 25 May 2022 Presentation + Paper

Presentation + Paper

Realization of sub-30-pitch EUV lithography through the application of functional spin-on glass

Yichen Liang, Kelsey Brakensiek, Joyce Lowes, Andrea Chacko, Ruimeng Zhang, Veerle Van Driessche, Xiaolong Lang, Jaishankar Kasthuri, Ming Luo, Douglas Guerrero

Proceedings Volume 12055, 120550A (2022) https://doi.org/10.1117/12.2610985

KEYWORDS: Extreme ultraviolet lithography, Adhesives, Polymers, Etching, Plasma etching, Optical lithography, Semiconducting wafers

Read Abstract +

Proceedings Article | 22 February 2021 Presentation

Presentation

Welcome and Introduction to SPIE Conference 11612

Daniel Sanders, Douglas Guerrero

Proceedings Volume 11612, 1161202 (2021) https://doi.org/10.1117/12.2592868

Read Abstract +

Proceedings Article | 23 March 2020 Presentation + Paper

Presentation + Paper

Underlayer optimization method for EUV lithography

Pieter Vanelderen, Nadia Vandenbroeck, Yichen Liang, Veerle Van Driessche, Douglas Guerrero, Andrea Chacko, Danilo De Simone, Geert Vandenberghe

Proceedings Volume 11326, 1132615 (2020) https://doi.org/10.1117/12.2551684

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Lithography, Stochastic processes, Line width roughness, Extreme ultraviolet, Optical lithography, Photoresist developing

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Proceedings Article | 23 March 2020 Paper

Paper

Defect mitigation and characterization in silicon hardmask materials

Vineet Alexander, Shyam Paudel, Glenn Dado, Lucia D'Urzo, Virgil Briggs, Mona Bavarian, Rao Varanasi, Tim Limmer, Nick Brakensiek, Levi Gildehaus, Mike Mesawich, Douglas Guerrero

Proceedings Volume 11326, 113261Q (2020) https://doi.org/10.1117/12.2552833

KEYWORDS: Silicon, Particles, Ions, Aluminum, Semiconducting wafers, Scanning electron microscopy, Plasma etching, Lithography

Read Abstract +

Proceedings Article | 23 March 2020 Presentation + Paper

Presentation + Paper

Improvement of EUV Si hardmask performance through wet chemistry functionalization

Yichen Liang, Andrea Chacko, Samantha Oelklaus, Ethan Lowrey, Veerle Van Driessche, Ivan Sedlacek, Ming Luo, Stephen Grannemann, Douglas Guerrero

Proceedings Volume 11326, 1132614 (2020) https://doi.org/10.1117/12.2551671

KEYWORDS: Lithography, Silicon, Extreme ultraviolet lithography, Line width roughness, Polymers, Plasma etching, Photoresist materials

Read Abstract +

Proceedings Article | 23 March 2020 Paper

Paper

Improving EUV underlayer coating defectivity using Point-Of-Use filtration

Aiwen Wu, Hareen Bayana, Philippe Foubert, Andrea Chacko, Douglas Guererro

Proceedings Volume 11326, 113261Z (2020) https://doi.org/10.1117/12.2551647

KEYWORDS: Extreme ultraviolet, Coating, Particles, Semiconducting wafers, Extreme ultraviolet lithography, Silicon, Photoresist materials, Thin film coatings, Thin films, Polymers

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Proceedings Article | 13 March 2018 Presentation + Paper

Presentation + Paper

Straightforward directed self-assembly process flows enabled by advanced materials

Kui Xu, Eric Calderas, Mary Ann Hockey, Douglas Guerrero, Richard Daugherty, Yichen Liang

Proceedings Volume 10586, 105860W (2018) https://doi.org/10.1117/12.2297013

KEYWORDS: Directed self assembly, Annealing, Polymers

Read Abstract +

Proceedings Article | 27 March 2017 Presentation + Paper

Presentation + Paper

A high chi track-compatible DSA for sub-10nm L/S patterning

Douglas Guerrero, Kaumba Sakavuyi, Kui Xu, Ahmed Gharbi, Raluca Tiron, Isabelle Servin, Laurent Pain, Guillaume Claveau, Harold Stokes, Masahiko Harumoto, Célia Nicolet, Xavier Chevalier

Proceedings Volume 10146, 101460W (2017) https://doi.org/10.1117/12.2261094

KEYWORDS: Directed self assembly, Annealing, Optical lithography, Polymers, Scanning electron microscopy, Semiconducting wafers, Silicon, Line width roughness, Glasses, Ultraviolet radiation

Read Abstract +

Proceedings Article | 27 March 2017 Presentation + Paper

Presentation + Paper

High-χ block copolymers for directed self-assembly patterning without the need for topcoat or solvent annealing

Kui Xu, Mary Ann Hockey, Eric Calderas, Douglas Guerrero, Daniel Sweat, Jeffrey Fiehler, Richard Daugherty

Proceedings Volume 10146, 101460U (2017) https://doi.org/10.1117/12.2257354

KEYWORDS: Directed self assembly, Annealing, Polymers, Scanning electron microscopy, Wet etching, Glasses

Read Abstract +

Proceedings Article | 28 March 2014 Paper

Paper

Streamlined etch integration with a unique neutral layer for self-assembled block copolymers (BCPs)

Mary Ann Hockey, Kui Xu, Yubao Wang, Douglas Guerrero, Eric Calderas

Proceedings Volume 9049, 90492A (2014) https://doi.org/10.1117/12.2046351

KEYWORDS: Etching, Annealing, Resistance, Scanning electron microscopy, Polymethylmethacrylate, Plasma etching, Photoresist materials, System on a chip, Picosecond phenomena, Directed self assembly

Read Abstract +

Proceedings Article | 28 March 2014 Paper

Paper

Evaluation of integration schemes for contact-hole grapho-epitaxy DSA: a study of substrate and template affinity control

A. Romo-Negreira, T. Younkin, R. Gronheid, S. Demuynck, N. Vandenbroeck, T. Seo, D. Guerrero, D. Parnell, M. Muramatsu, S. Kawakami, T. Yamauchi, K. Nafus, M. Somervell

Proceedings Volume 9049, 90491L (2014) https://doi.org/10.1117/12.2046119

KEYWORDS: Etching, Semiconducting wafers, Chemical vapor deposition, Polymers, Fourier transforms, Polymethylmethacrylate, Lithography, Resistance, Picosecond phenomena, Directed self assembly

Read Abstract +

Proceedings Article | 27 March 2014 Paper

Paper

Extending lithography with advanced materials

Douglas Guerrero

Proceedings Volume 9051, 905114 (2014) https://doi.org/10.1117/12.2047302

KEYWORDS: Optical lithography, Lithography, System on a chip, Etching, Antireflective coatings, Plasma etching, Extreme ultraviolet, Immersion lithography, Silicon, Semiconducting wafers

Read Abstract +

Proceedings Article | 29 March 2013 Paper

Paper

Evaluating spin-on carbon materials at low temperatures for high wiggling resistance

Michael Weigand, Vandana Krishnamurthy, Yubao Wang, Qin Lin, Douglas Guerrero, Sean Simmons, Brandy Carr

Proceedings Volume 8685, 86850R (2013) https://doi.org/10.1117/12.2011466

KEYWORDS: System on a chip, Etching, Reactive ion etching, Scanning electron microscopy, Photoresist materials, Semiconducting wafers, Carbon, Resistance, Lithography, Silicon

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Proceedings Article | 29 March 2013 Paper

Paper

Effects on electron scattering and resist characteristics using assisting underlayers for e-beam direct write lithography

Xaver Thrun, Kang-Hoon Choi, Norbert Hanisch, Christoph Hohle, Katja Steidel, Douglas Guerrero, Thiago Figueiro, Johann Bartha

Proceedings Volume 8682, 86820Z (2013) https://doi.org/10.1117/12.2011461

KEYWORDS: Silicon, Semiconducting wafers, System on a chip, Aluminum, Titanium, Scattering, Point spread functions, Metals, Neodymium, Electron beam lithography

Read Abstract +

Proceedings Article | 26 March 2013 Paper

Paper

Multifunctional hardmask neutral layer for directed self-assembly (DSA) patterning

Douglas Guerrero, Mary Ann Hockey, Yubao Wang, Eric Calderas

Proceedings Volume 8680, 86801P (2013) https://doi.org/10.1117/12.2011567

KEYWORDS: Etching, Optical lithography, System on a chip, Lithography, Reflection, Critical dimension metrology, Photoresist materials, Polymethylmethacrylate, Polonium, Directed self assembly

Read Abstract +

Proceedings Article | 23 March 2012 Paper

Paper

EUV assist layers for use in multilayer processes

Tantiboro Ouattara, Carlton Washburn, Aline Collin, Vandana Krishnamurthy, Douglas Guerrero, Michael Weigand

Proceedings Volume 8322, 83222E (2012) https://doi.org/10.1117/12.916469

KEYWORDS: Etching, Extreme ultraviolet lithography, Photoresist materials, Lithography, Extreme ultraviolet, Oxygen, Polymers, System on a chip, Line edge roughness, Scanning electron microscopy

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Proceedings Article | 16 April 2011 Paper

Paper

BARC surface property matching for negative-tone development of a conventional positive-tone photoresist

Douglas Guerrero, Vandana Krishnamurthy, Daniel Sullivan

Proceedings Volume 7972, 79720Q (2011) https://doi.org/10.1117/12.881508

KEYWORDS: Silicon, Photoresist materials, Optical lithography, Lithography, Reflectivity, System on a chip, Photoresist developing, Silicon carbide, Silicon films, Multilayers

Read Abstract +

Proceedings Article | 11 December 2009 Paper

Paper

Resist double patterning on BARCs and spin-on multilayer materials

Douglas Guerrero, Daniel Sullivan, Ramil-Marcelo Mercado

Proceedings Volume 7520, 75200M (2009) https://doi.org/10.1117/12.840419

KEYWORDS: Double patterning technology, Photoresist materials, Multilayers, Lithography, Silicon, Carbon, Photoresist processing, Photoresist developing, Image processing, Etching

Read Abstract +

Proceedings Article | 4 December 2008 Paper

Paper

Acid-degradable hyperbranched polymer and its application in bottom anti-reflective coatings

Ramil-Marcelo Mercado, Hao Xu, Joyce Lowes, Jim Meador, Douglas Guerrero

Proceedings Volume 7140, 71402W (2008) https://doi.org/10.1117/12.804743

KEYWORDS: Polymers, Photoresist developing, Polymer thin films, Photoresist materials, Lithography, Coating, Molecules, Bottom antireflective coatings, Electroluminescence, Etching

Read Abstract +

Proceedings Article | 15 April 2008 Paper

Paper

Dual-layer dye-filled developer-soluble BARCs for 193-nm lithography

Jim Meador, Carol Beaman, Charlyn Stroud, Joyce Lowes, Zhimin Zhu, Douglas Guerrero, Ramil-Marcelo Mercado, David Drain

Proceedings Volume 6923, 69232W (2008) https://doi.org/10.1117/12.772793

KEYWORDS: Polymers, Lithography, Photoresist developing, Photoresist materials, Electroluminescence, Diffractive optical elements, Reflectivity, Polymer thin films, Optical properties, Scanning electron microscopy

Read Abstract +

Proceedings Article | 26 March 2008 Paper

Paper

Anti-reflective coating for multipatterning lithography

Douglas Guerrero, Steve Gibbons, Joyce Lowes, Ramil Mercado

Proceedings Volume 6923, 69230X (2008) https://doi.org/10.1117/12.772827

KEYWORDS: Photoresist processing, Etching, Image processing, Optical lithography, Semiconducting wafers, Oxygen, Lithography, Printing, Argon, Scanning electron microscopy

Read Abstract +

Proceedings Article | 30 March 2007 Paper

Paper

A novel approach to developer-soluble anti-reflective coatings for 248-nm lithography

Ramil-Marcelo Mercado, Joyce Lowes, Carlton Washburn, Douglas Guerrero

Proceedings Volume 6519, 65192X (2007) https://doi.org/10.1117/12.712313

KEYWORDS: Polymers, Lithography, Photoresist developing, Photoresist materials, Electroluminescence, Reflectivity, Antireflective coatings, Critical dimension metrology, Silicon, Light sources

Read Abstract +

Proceedings Article | 11 April 2006 Paper

Paper

Two-layer anti-reflection strategies for implant applications

Douglas Guerrero, Tamara Smith, Masakazu Kato, Shigeo Kimura, Tomoyuki Enomoto

Proceedings Volume 6153, 61530O (2006) https://doi.org/10.1117/12.656528

KEYWORDS: Lithography, Coating, Scanning electron microscopy, Photomicroscopy, Polymers, Bottom antireflective coatings, Semiconducting wafers, Silicon, Control systems, Photoresist processing

Read Abstract +

Proceedings Article | 12 June 2003 Paper

Paper

New generation of bottom antireflective coatings (BARCs): photodefinable BARCs

Douglas Guerrero, Tonya Trudgeon

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.483726

KEYWORDS: Polymers, Electroluminescence, Photoresist materials, Resistance, Bottom antireflective coatings, Silicon, Polymer thin films, Photoresist developing, Optical properties, Deep ultraviolet

Read Abstract +

Proceedings Article | 16 May 2003 Paper

Paper

Dyed red, green, and blue photoresist for manufacture of high-resolution color filter arrays for image sensors

Douglas Guerrero, William DiMenna, Tony Flaim, Ramil Mercado, Sam Sun

Proceedings Volume 5017, (2003) https://doi.org/10.1117/12.476750

KEYWORDS: Photoresist materials, Polymers, Photoresist developing, Optical filters, Electroluminescence, Polymethylmethacrylate, Dysprosium, Imaging arrays, Image sensors, Computer simulations

Read Abstract +

Proceedings Article | 11 June 1999 Paper

Paper

Recent progress in 193-nm antireflective coatings

James Meador, Douglas Guerrero, Gu Xu, Xie Shao, Norman Dobson, James Claypool, Kelly Nowak

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350269

KEYWORDS: Photoresist materials, Etching, Plasma etching, Polymers, Absorbance, Reflectivity, Plasma, Chemistry, Data modeling, Silicon

Read Abstract +

Proceedings Article | 29 June 1998 Paper

Paper

Deep-ultraviolet antireflective coating with improved conformality, optical density, and etch rate

Douglas Guerrero, James Meador, Gu Xu, Hitoshi Suzuki, Yasuhisa Sone, Vandana Krishnamurthy, James Claypool, James Lamb

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312412

KEYWORDS: Etching, Photoresist materials, Absorbance, Reflectivity, Deep ultraviolet, Critical dimension metrology, Chemistry, Lithography, Coating, Antireflective coatings

Read Abstract +

Proceedings Article | 29 June 1998 Paper

Paper

New antireflective coatings for 193-nm lithography

Gu Xu, Douglas Guerrero, Norman Dobson

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312401

KEYWORDS: Photoresist materials, Polymers, Lithography, Absorbance, Ultraviolet radiation, Etching, Antireflective coatings, Plasma etching, Coating, Deep ultraviolet

Read Abstract +

Proceedings Article | 14 June 1996 Paper

Paper

Highly absorbing ARC for DUV lithography

Edward Pavelchek, James Meador, Douglas Guerrero, James Lamb, Ajit Kache, Manuel doCanto, Timothy Adams, David Stark, Daniel Miller

Proceedings Volume 2724, (1996) https://doi.org/10.1117/12.241867

KEYWORDS: Photoresist materials, Etching, Coating, Absorbance, Silicon, Oxides, Lithography, Deep ultraviolet, Antireflective coatings, Reflectivity

Read Abstract +

Showing 5 of 39 publications

Proceedings Volume Editor (4)

SPIE Conference Volume | 24 April 2024

Advances in Patterning Materials and Processes XLI

SPIE Conference Volume | 22 May 2023

Advances in Patterning Materials and Processes XL

SPIE Conference Volume | 6 July 2022

Advances in Patterning Materials and Processes XXXIX

SPIE Conference Volume | 18 March 2021

Advances in Patterning Materials and Processes XXXVIII

Conference Committee Involvement (20)

Advances in Patterning Materials and Processes XLII

24 February 2025 | San Jose, California, United States

Advances in Patterning Materials and Processes XLI

26 February 2024 | San Jose, California, United States

Advances in Patterning Materials and Processes XL

27 February 2023 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXIX

25 April 2022 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXVIII

22 February 2021 | Online Only, California, United States

Advances in Patterning Materials and Processes XXXVII

24 February 2020 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXVI

25 February 2019 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXV

27 February 2018 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXIV

28 February 2017 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXIII

29 February 2016 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXII

24 February 2015 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXI

24 February 2014 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXX

25 February 2013 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXIX

13 February 2012 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXVIII

28 February 2011 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXVII

22 February 2010 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXVI

23 February 2009 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXV

25 February 2008 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXIV

26 February 2007 | San Jose, California, United States

Advances in Resist Materials and Processing Technology XXIII

20 February 2006 | San Jose, California, United States

Showing 5 of 20 Conference Committees

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