Mr. James B. Claypool Profile

James B. Claypool

Research Engineer at Missouri Univ of Science & Technology

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Author

Publications (11)

Proceedings Article | 2 April 2007 Paper

Materials for and performance of multilayer lithography schemes

Marc Weimer, Yubao Wang, Charles Neef, James Claypool, Kevin Edwards, Zhimin Zu

Proceedings Volume 6519, 65192S (2007) https://doi.org/10.1117/12.712342

KEYWORDS: Reflectivity, Silicon, Lithography, System on a chip, Etching, Multilayers, Photomasks, Semiconducting wafers, Plasma etching, Plasma

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Proceedings Article | 4 May 2005 Paper

New advanced BARC materials for ultra-high NA applications

James Claypool, Marc Weimer, Vandana Krishnamurthy, Wendy Gehoel, Koen van Ingen Schenau

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599988

KEYWORDS: Reflectivity, Electroluminescence, Line edge roughness, Lithography, Semiconducting wafers, Immersion lithography, Line width roughness, Polarization, Scanning electron microscopy, Lithographic illumination

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Proceedings Article | 12 June 2003 Paper

New materials for 193-nm bottom antireflective coatings

Marc Weimer, Vandana Krishnamurthy, Shelly Fowler, Cheryl Nesbit, James Claypool

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485107

KEYWORDS: Chromophores, Reflectivity, Polymers, Silicon, Lithography, Bottom antireflective coatings, Molecules, Critical dimension metrology, Semiconducting wafers, Silicon films

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Proceedings Article | 24 July 2002 Paper

Thin organic bottom antireflective coatings for 193 nm lithography

Mandar Bhave, James Meador, James Claypool, Shreeram Deshpande, Jill Akers, Anne Lindgren

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474183

KEYWORDS: Reflectivity, Photoresist materials, Polymers, Etching, Lithography, Bottom antireflective coatings, 193nm lithography, Absorbance, Optical properties, Critical dimension metrology

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Proceedings Article | 24 July 2002 Paper

Design considerations for bottom antireflective coating for 157 nm lithography

James Claypool, Rama Puligadda, Jill Akers, Rikimaru Sakamoto, Kenichi Mizusawa

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474182

KEYWORDS: Etching, Photoresist materials, Lithography, Reflectivity, Antireflective coatings, Bottom antireflective coatings, Multilayers, Resistance, Optical lithography, Absorbance

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Proceedings Article | 24 August 2001 Paper

Development of full-fill bottom antireflective coatings for dual-damascene process

Yubao Wang, Xiaoming Wu, Gu Xu, James Lamb, John Sullivan, James Claypool, Jackie Backus, Sean Trautman, Xie Shao, Satoshi Takei, Yasuhisa Sone, Kenichi Mizusawa, Hiroyoshi Fukuro

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436917

KEYWORDS: Coating, Etching, Photoresist materials, Semiconducting wafers, Bottom antireflective coatings, Antireflective coatings, Lithography, Thin films, Critical dimension metrology, Deep ultraviolet

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Proceedings Article | 24 August 2001 Paper

New fast-etching bottom antireflective coatings for 248-nm lithography

Rama Puligadda, Runhui Huang, Chris Cox, James Lamb, Manuel Arjona, James Claypool

Proceedings Volume 4345, (2001) https://doi.org/10.1117/12.436916

KEYWORDS: Etching, Photoresist materials, Reflectivity, Coating, Optical properties, Polymers, Deep ultraviolet, Bottom antireflective coatings, Lithography, Manufacturing

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Proceedings Article | 23 June 2000 Paper

Second-generation 193-nm bottom antireflective coatings (BARCs)

James Meador, Xie Shao, Vandana Krishnamurthy, Mikko Arjona, Mandar Bhave, Gu Xu, James Claypool, Anne Lindgren

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388264

KEYWORDS: Reflectivity, Etching, Polymers, Plasma etching, Manufacturing, Photoresist materials, Lithography, Semiconducting wafers, Particles, Absorbance

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Proceedings Article | 14 June 1999 Paper

Broadband planarizing antireflective coating for i-line, DUV, and 193-nm microlithographic applications

Xie Shao, James Lamb, James Claypool, William Simmons, Earnest Murphy

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350877

KEYWORDS: Reflectivity, Etching, Critical dimension metrology, Photoresist materials, Polymers, Prototyping, Coating, Deep ultraviolet, Lithography, Oxides

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Proceedings Article | 11 June 1999 Paper

Recent progress in 193-nm antireflective coatings

James Meador, Douglas Guerrero, Gu Xu, Xie Shao, Norman Dobson, James Claypool, Kelly Nowak

Proceedings Volume 3678, (1999) https://doi.org/10.1117/12.350269

KEYWORDS: Photoresist materials, Etching, Plasma etching, Polymers, Absorbance, Reflectivity, Plasma, Chemistry, Data modeling, Silicon

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Proceedings Article | 29 June 1998 Paper

Deep-ultraviolet antireflective coating with improved conformality, optical density, and etch rate

Douglas Guerrero, James Meador, Gu Xu, Hitoshi Suzuki, Yasuhisa Sone, Vandana Krishnamurthy, James Claypool, James Lamb

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312412

KEYWORDS: Etching, Photoresist materials, Absorbance, Reflectivity, Deep ultraviolet, Critical dimension metrology, Chemistry, Lithography, Coating, Antireflective coatings

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Showing 5 of 11 publications

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