CONFERENCE PROCEEDINGS
Advanced Search
Dr. Yan Guo
at Nearfield Instruments BV
SPIE Involvement:
Author
Publications (5)
Proceedings Article | 10 April 2024 Poster + Paper
Feature identification for parameter extraction and defect detection using machine learning
Y. Guo, H. Pahlavani, A. Khachaturiants, K. Elsayed, J. van de Laar, E. Simons, N. Saikumar, H. Sadeghian
Proceedings Volume 12955, 129553I (2024) https://doi.org/10.1117/12.3011237
KEYWORDS: Scanning probe microscopy, Image processing, Education and training, Image segmentation, Algorithm development, Defect detection, Metrology, Feature extraction, Machine learning, Defect inspection
Proceedings Article | 10 April 2024 Poster + Paper
Image resolution enhancement for advanced semiconductor nodes
L. Rencker, O. Tajalizadehkhoob, K. Elsayed, A. Khachaturiants, H. Pahlavani, Y. Guo, J. van de Laar, E. Simons, N. Saikumar, H. Sadeghian
Proceedings Volume 12955, 129553J (2024) https://doi.org/10.1117/12.3011239
KEYWORDS: Image enhancement, Image resolution, Resolution enhancement technologies, Scanning probe microscopy, Machine learning, Semiconductors, Metrology, Image restoration
Proceedings Article | 16 September 2022 Paper
High-NA EUV photoresist metrology using high-throughput scanning probe microscopy
M. Mucientes, A. Khachaturiants, R. Trussell, A. Kalinin, Y. Guo, E. Simons, S. Kim, O. Nadyarnykh, A. Moussa, J. Bogdanowicz, J. Severi, G. Lorusso, D. De Simone, A.-L. Charley, P. Leray, M. van Reijzen, C. Bozdog, H. Sadeghian
Proceedings Volume 12325, 123250M (2022) https://doi.org/10.1117/12.2641698
KEYWORDS: Scanning probe microscopy, Semiconducting wafers, Metrology, Optical lithography, Bridges, Extreme ultraviolet lithography, Defect inspection, Photoresist materials, Inspection, Atomic force microscopy
Proceedings Article | 13 June 2022 Presentation
High throughput scanning probe metrology for high-NA EUV photoresist profiling
Artem Khatchaturiants, Marta Mucientes, Arseniy Kalinin, Yan Guo, Seokhan Kim, Alain Moussa, Janusz Bogdanowicz, Joren Severi, Gian Lorusso, Danilo De Simone, Anne-Laure Charley, Philippe Leray, Maarten van Reijzen, Cornel Bozdog, Hamed Sadeghian
Proceedings Volume PC12053, PC120530I (2022) https://doi.org/10.1117/12.2616089
KEYWORDS: Scanning probe microscopy, Metrology, Photoresist materials, Extreme ultraviolet lithography, Scanning probe metrology, Profiling, Process control, Extreme ultraviolet, Atomic force microscopy, Stochastic processes
Proceedings Article | 26 May 2022 Presentation + Paper
Subsurface scanning probe metrology for overlay through opaque layers
I. Battisti, K. Makles, M. S. Mucientes, Y. Guo, E. Simons, J. Bogdanowicz, A. Moussa, V. Blanco, F. Yasin, D. Crotti, A.-L. Charley, P. Leray, M. van Reijzen, C. Bozdog, H. Sadeghian
Proceedings Volume 12053, 1205310 (2022) https://doi.org/10.1117/12.2616093
KEYWORDS: Overlay metrology, Semiconducting wafers, Opacity, Atomic force microscopy, Scanning probe metrology, Image resolution, Pixel resolution, Photomasks
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top