Dr. J. Christopher Taylor Profile

Dr. J. Christopher Taylor

R&D Engineer at SUNY Poly SEMATECH

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Publications (10)

Proceedings Article | 2 April 2010 Paper

IR microscopy as an early electrical yield indicator in bonded wafer pairs used for 3D integration

Andrew Rudack, Pratibha Singh, J. Christopher Taylor, Vadim Mashevsky

Proceedings Volume 7638, 763815 (2010) https://doi.org/10.1117/12.848400

KEYWORDS: Semiconducting wafers, Overlay metrology, Wafer bonding, Infrared microscopy, Microscopy, Tolerancing, Optical alignment, 3D metrology, Infrared imaging, Copper

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Proceedings Article | 26 March 2008 Paper

New high-index fluids: exploiting anomalous dispersion for immersion lithography

Elizabeth Costner, Kazuya Matsumoto, Brian Long, J. Christopher Taylor, William Wojtczak, C. Grant Willson

Proceedings Volume 6923, 69230B (2008) https://doi.org/10.1117/12.772979

KEYWORDS: Absorbance, Water, Optical properties, Immersion lithography, Refraction, Absorption, Carbon, Sodium, Refractive index, Electrons

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Proceedings Article | 29 March 2006 Paper

New high-index fluids for immersion lithography

Elizabeth Costner, J. Christopher Taylor, Stefan Caporale, William Wojtczak, Dean Dewulf, Will Conley, C. Grant Willson

Proceedings Volume 6153, 61530B (2006) https://doi.org/10.1117/12.656637

KEYWORDS: Absorbance, Water, Refraction, Digital micromirror devices, Immersion lithography, Metals, Interfaces, Reflection, Refractive index, Optical properties

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Proceedings Article | 23 March 2006 Paper

Photonic crystals from step and flash imprint lithography

J. Christopher Taylor, Tim Hostetler, Pavel Kornilovich, Ken Kramer

Proceedings Volume 6151, 61510L (2006) https://doi.org/10.1117/12.656688

KEYWORDS: Photonic crystals, Lithography, Polymers, Composites, Nanoparticles, Refractive index, Dielectrics, Refraction, Crystals, Photorefractive polymers

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Photonic crystals are structures which exhibit a band gap in the electromagnetic spectrum as a result of dielectric periodicity. These structures present the potential to control electromagnetic waves in a similar manner to the way electrons are controlled by semiconductors. To obtain a photonic band gap in a specific region of the spectrum, there are two important characteristics of the photonic crystal that must be considered. The first is the length scale of the periodicity of the crystal, which governs the frequency range in which the band gap falls. The second is the dielectric contrast between the two media which comprise the crystal, which controls the size of the bang gap. Therefore, to construct a photonic crystal which could be used as an optical device, such as a waveguide or filter, the features should be on the order of optical wavelengths, or nanometers. The dielectric contrast through the visible region should also be large enough to open a band gap. Lithography techniques are ideally suited to pattern such structures. This work focused on the use of step and flash imprint lithography as an ideal patterning technology for two dimensional photonic crystals because of its capability for sub-50 nm patterning. Another attractive aspect of using step and flash imprint lithography is the potential to pattern a functional polymer as the crystal. The feasibility of printing structures needed for photonic crystals using imprint lithography was first demonstrated. Then, a strategy to raise the index of refraction of imprint compatible polymer formulations for large dielectric contrast using metal oxide nanoparticles was investigated. A maximum index of n = 1.65 was achieved, but at the high nanoparticle concentrations needed to reach this value, the formulations would not photocure. At low concentrations, imprints were obtained and uses for the resulting moderate index polymer composites as partial band gap photonic crystals were suggested.

Proceedings Article | 21 March 2006 Paper

Drag-a-drop: a characterization tool for immersion lithography

Derek Bassett, J. Chris Taylor, Will Conley, C. Grant Willson, Roger Bonnecaze

Proceedings Volume 6154, 61544P (2006) https://doi.org/10.1117/12.656482

KEYWORDS: Semiconducting wafers, Microfluidics, Photomasks, Polymers, Glasses, Immersion lithography, Photoresist materials, Dewetting, Reflection, Scanners

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Proceedings Article | 4 May 2005 Paper

Understanding the photoresist surface-liquid interface for ArF immersion lithography

Will Conley, Robert LeSuer, Frank Fan, Allen Bard, Chris Taylor, Pavlos Tsiartas, Grant Willson, Andrew Romano, Ralph Dammel

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.601482

KEYWORDS: Photoresist materials, Semiconducting wafers, Scintillation, Liquids, Water, Immersion lithography, Polymers, Interfaces, Signal detection, Fluorine

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Proceedings Article | 4 May 2005 Paper

Fluids and resists for hyper NA immersion lithography

J. Christopher Taylor, Ramzy Shayib, Sumarlin Goh, Charles Chambers, Will Conley, Shang-Ho Lin, C. Grant Willson

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600771

KEYWORDS: Water, Refraction, Polymers, Sodium, Immersion lithography, Photoresist materials, Microfluidics, Chlorine, Refractive index, Systems modeling

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Proceedings Article | 14 May 2004 Paper

Using scanning electrochemical microscopy to probe chemistry at the solid-liquid interface in chemically amplified immersion lithography

Robert LeSuer, Fu-Ren Fan, Allen Bard, J. Christopher Taylor, Pavlos Tsiartas, Grant Willson, Willard Conley, Gene Feit, Roderick Kunz

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.537527

KEYWORDS: Electrodes, Chemistry, Interfaces, Mercury, Immersion lithography, Platinum, Microscopy, Scanning probe microscopy, Water, Antimony

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Proceedings Article | 14 May 2004 Paper

Implications of immersion lithography on 193-nm photoresists

J. Christopher Taylor, Charles Chambers, Ryan Deschner, Robert LeSuer, Willard Conley, Sean Burns, C. Willson

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535875

KEYWORDS: Water, Photoresist materials, Polymers, Semiconducting wafers, Scintillation, Immersion lithography, Liquids, Refraction, Silicon, Spectroscopic ellipsometry

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Proceedings Article | 12 June 2003 Paper

Fundamental study of photoresist dissolution with real-time spectroscopic ellipsometry and interferometry

Sean Burns, Gerard Schmid, Brian Trinque, James Willson, Jennifer Wunderlich, Pavlos Tsiartas, James Taylor, Ryan Burns, C. Wilson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485182

KEYWORDS: Polymers, Interferometry, Data modeling, Photoresist materials, Water, Ellipsometry, Spectroscopic ellipsometry, Reflectivity, Refraction, Thin films

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Showing 5 of 10 publications

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