Dr. Charles R. Chambers Profile

Dr. Charles R. Chambers

Technical Supervisor at Shintech

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Publications (9)

Proceedings Article | 16 April 2011 Paper

Designing materials for advanced microelectronic patterning applications using controlled polymerization RAFT technology

Michael Sheehan, William Farnham, Charles Chambers, Hoang Tran, Hiroshi Okazaki, Yefim Brun, Matthew Romberger, James Sounik

Proceedings Volume 7972, 79720T (2011) https://doi.org/10.1117/12.882960

KEYWORDS: Polymers, Polymerization, Photoresist materials, Optical lithography, Directed self assembly, Photomasks, Lithography, Photoresist developing, Line width roughness, Microelectronics

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Proceedings Article | 4 May 2005 Paper

Fluids and resists for hyper NA immersion lithography

J. Christopher Taylor, Ramzy Shayib, Sumarlin Goh, Charles Chambers, Will Conley, Shang-Ho Lin, C. Grant Willson

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.600771

KEYWORDS: Water, Refraction, Polymers, Sodium, Immersion lithography, Photoresist materials, Microfluidics, Chlorine, Refractive index, Systems modeling

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Proceedings Article | 14 May 2004 Paper

Design of dissolution inhibitors for chemically amplified photolithographic systems

Charles Chambers, Shiro Kusumoto, Brian Osborn, Alok Vasudev, Michitaka Ootani, Leonidas Walthal, Hale McMichael, Paul Zimmerman, Willard Conley, C. Grant Willson

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535941

KEYWORDS: Polymers, Distributed interactive simulations, Absorbance, Photoresist materials, Scanning electron microscopy, Semiconducting wafers, Picture Archiving and Communication System, Glasses, Transparency, Optical lithography

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Proceedings Article | 14 May 2004 Paper

Implications of immersion lithography on 193-nm photoresists

J. Christopher Taylor, Charles Chambers, Ryan Deschner, Robert LeSuer, Willard Conley, Sean Burns, C. Willson

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535875

KEYWORDS: Water, Photoresist materials, Polymers, Semiconducting wafers, Scintillation, Immersion lithography, Liquids, Refraction, Silicon, Spectroscopic ellipsometry

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Proceedings Article | 12 June 2003 Paper

Negative photoresist for 157-nm microlithography: a progress report

Will Conley, Brian Trinque, Daniel Miller, Stefan Caporale, Brian Osborn, Shiro Kumamoto, Matthew Pinnow, Ryan Callahan, Charles Chambers, Guen Su Lee, Paul Zimmerman, C. Grant Willson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485194

KEYWORDS: Polymers, Photoresist materials, Transparency, Imaging systems, Spectroscopy, Photomasks, Carbon monoxide, Optical lithography, Binary data, Absorbance

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Proceedings Article | 12 June 2003 Paper

Dissolution inhibitors for 157-nm photolithography

Charles Chambers, Shiro Kusumoto, Guen Su Lee, Alok Vasudev, Leonidas Walthal, Brian Osborn, Paul Zimmerman, Will Conley, C. Grant Willson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485191

KEYWORDS: Polymers, Distributed interactive simulations, Semiconducting wafers, Photoresist materials, Carbon monoxide, Carbonates, Optical lithography, Lithography, Absorbance, Fluorine

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Proceedings Article | 12 June 2003 Paper

Advances in TFE-based fluoropolymers for 157-nm lithography: a progress report

Iqbal Sharif, Darryl DesMarteau, Larry Ford, Gregory Shafer, Brian Thomas, Will Conley, Paul Zimmerman, Daniel Miller, Guen Su Lee, Charles Chambers, Brian Trinque, Takashi Chiba, Brian Osborn, C. Grant Willson

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.485192

KEYWORDS: Polymers, Absorbance, Etching, Transparency, Resistance, Lithography, Imaging systems, Chemistry, Optical lithography, Carbon monoxide

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Proceedings Article | 24 July 2002 Paper

Dissolution inhibitors for 157-nm microlithography

Will Conley, Daniel Miller, Charles Chambers, Brian Osborn, Raymond Hung, Hoang Tran, Brian Trinque, Matthew Pinnow, Takashi Chiba, Scott McDonald, Paul Zimmerman, Ralph Dammel, Andrew Romano, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474282

KEYWORDS: Polymers, Absorbance, Photoresist materials, Imaging systems, Lithography, Semiconducting wafers, Transparency, Optical lithography, Vacuum ultraviolet, Phase measurement

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Proceedings Article | 24 July 2002 Paper

Advances in resists for 157-nm microlithography

Brian Trinque, Brian Osborn, Charles Chambers, Yu-Tsai Hsieh, Schuyler Corry, Takashi Chiba, Raymond Hung, Hoang Tran, Paul Zimmerman, Daniel Miller, Will Conley, C. Grant Willson

Proceedings Volume 4690, (2002) https://doi.org/10.1117/12.474272

KEYWORDS: Polymers, Absorbance, Transparency, Fluorine, Vacuum ultraviolet, Spectroscopy, Phase shifts, Optical lithography, Carbon monoxide, Silica

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Showing 5 of 9 publications

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