Fundamental study of photoresist dissolution with real-time spectroscopic ellipsometry and interferometry

Sean D. Burns; Gerard M. Schmid; Brian C. Trinque; James Willson; Jennifer Wunderlich; Pavlos C. Tsiartas; James Chris Taylor; Ryan L Burns; C. Grant Wilson

doi:10.1117/12.485182

12 June 2003 Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry

Sean D. Burns, Gerard M. Schmid, Brian C. Trinque, James Willson, Jennifer Wunderlich, Pavlos C. Tsiartas, James Chris Taylor, Ryan L Burns, C. Grant Wilson

Author Affiliations +

Proceedings Volume 5039, Advances in Resist Technology and Processing XX; (2003) https://doi.org/10.1117/12.485182
Event: Microlithography 2003, 2003, Santa Clara, California, United States

Abstract

The use of in situ spectroscopic ellipsometry (SE) is demonstrated as a technique for studying photoresist dissolution. Experiments carried out using a J.A.Woollam M-2000 ellipsometer and a custom built cell designed for in situ film measurements show that bulk dissolution rate measurements using the SE technique agree with dissolution rate data obtained using multiwavelength interferometry. SE is also demonstrated as a method for measuring thin film dissolution rates, water sorption, and films that swell. An additional focus of this work was the topic of interfacial “gel” layer formation during photoresist dissolution. Ellipsometry and interferometry were used to test several photoresist resins, with an emphasis on phenolic polymers. Single and multiple layer models were used to analyze the data, and were compared to model calculations predicting formation of a gel layer. For the materials studied, interfacial gel layer formation in low molecular weight phenolic polymers was not detected, within the resolution of the experimental techniques (< 15 nm).

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Sean D. Burns, Gerard M. Schmid, Brian C. Trinque, James Willson, Jennifer Wunderlich, Pavlos C. Tsiartas, James Chris Taylor, Ryan L Burns, and C. Grant Wilson "Fundamental study of photoresist dissolution with real time spectroscopic ellipsometry and interferometry", Proc. SPIE 5039, Advances in Resist Technology and Processing XX, (12 June 2003); https://doi.org/10.1117/12.485182

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