Mr. Ik-Hyun Jeong Profile

Ik-Hyun Jeong

at SK Hynix Inc

SPIE Involvement:

Author

Publications (8)

Proceedings Article | 10 April 2024 Poster + Paper

Single-cell measurements by parallax effect for process control and target size reduction

Changkyu Lee, Sumin Jang, Baikkyu Hong, Ikhyun Jeong, Sunouk Nam, Hyunsok Kim, Jaewuk Ju, Minho Jung, Mingyu Kim, Hongpeng Su, Yanan Wang, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Roie Volkovich, Nadav Gutman, Ohad Bachar, Renan Milo

Proceedings Volume 12955, 129552H (2024) https://doi.org/10.1117/12.3010101

KEYWORDS: Overlay metrology, Semiconducting wafers, Wafer level optics, Metrology, Optical gratings, Process control, Optical parametric oscillators, Time metrology, Optical alignment

Read Abstract +

Proceedings Article | 27 April 2023 Poster + Paper

ADI to in-cell overlay stability improvement for DRAM using novel scatterometry and comprehensive process control

Hyunsok Kim, Jaewuk Ju, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Changkyu Lee, Kangmin Lee, Sumin Jang, Jaeyoun Lee, Hongcheon Yang, Minho Jeong, Mingyu Kim, Hongpeng Su, Wayne Zhou, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Renan Milo, Rawi Dirawi

Proceedings Volume 12496, 124962E (2023) https://doi.org/10.1117/12.2657632

KEYWORDS: Overlay metrology, Semiconducting wafers, Advanced process control, Scanners, Scatterometry, Process control, Signal processing, Metrology, Control systems, Optical parametric oscillators

Read Abstract +

Proceedings Article | 27 April 2023 Poster + Paper

Effective tool induced shift (eTIS) for determining the total measurement uncertainty (TMU) in overlay metrology

Hyunsok Kim, Ikhyun Jeong, Baikkyu Hong, Sejung Ham, Dongsu Kim, Dongsuk Lim, Kangmin Lee, Jeongpyo Lee, Minho Jung, Nanglyeom Oh, Dongsub Choi, Hedvi Spielberg, Ohad Bachar

Proceedings Volume 12496, 124963O (2023) https://doi.org/10.1117/12.2670420

KEYWORDS: Semiconducting wafers, Metrology, Calibration, Overlay metrology, Measurement uncertainty, Optical parametric oscillators, Advanced process control, Time metrology, Reproducibility, Optical lithography

Read Abstract +

Proceedings Article | 27 April 2023 Presentation + Paper

Enhancement of overlay metrology accuracy by multi-wavelength scatterometry with rotated quadrupole illumination

Hyunsok Kim, Ikhyun Jeong, Baikkyu Hong, Sunouk Nam, Sumin Jang, Kangmin Lee, Hongpeng Su, Minho Jeong, Mingyu Kim, Hongcheon Yang, Wayne Zhou, Nanglyeom Oh, Dongsub Choi, Tal Yaziv, Hedvi Spielberg, Ohad Bachar, Rawi Dirawi

Proceedings Volume 12496, 1249620 (2023) https://doi.org/10.1117/12.2657678

KEYWORDS: Overlay metrology, Light sources and illumination, Metrology, Signal detection, Scatterometry, Diffraction, Semiconducting wafers, Etching, Tunable lasers, Signal processing

Read Abstract +

Proceedings Article | 20 March 2020 Presentation + Paper

Optical overlay measurement accuracy improvement with machine learning

Alexander Verner, Hyunsok Kim, Ikhyun Jeong, Seungwoo Koo, Dongjin Lee, Honggoo Lee, Boaz Ophir, Ohad Bachar, Liran Yerushalmi, Sanghuck Jeon, Dongsub Choi, Jeongpyo Lee

Proceedings Volume 11325, 113251Z (2020) https://doi.org/10.1117/12.2551850

KEYWORDS: Detection and tracking algorithms, Semiconducting wafers, Overlay metrology, Scanning electron microscopy, Optical parametric oscillators, Data modeling, Machine learning, Optical testing, Feature extraction, Metrology

Read Abstract +

Proceedings Article | 20 March 2020 Paper

Improving after-etch overlay performance using high-density in-device metrology in DRAM manufacturing

Ik-Hyun Jeong, Seung-Woo Koo, Hyun-Sok Kim, Jung-Il Hwang, Dong-Jin Lee, Min-Shik Kim, Jae-Wuk Ju, Kang-Min Lee, Young-Sik Kim, Cees Lambregts, Rizvi Rahman, Marc Hauptmann, Raheleh Pishkari, Allwyn Boustheen, Kwang-Young Hu, Paul Böcker, Dong-Hak Lee, In-Ho Joo, Kang-San Lee

Proceedings Volume 11325, 113252X (2020) https://doi.org/10.1117/12.2552028

KEYWORDS: Overlay metrology, Etching, Inspection, Semiconducting wafers, Metrology, Feedback loops, Scanners, Spatial frequencies, High volume manufacturing

Read Abstract +

Proceedings Article | 20 March 2019 Presentation + Paper

Scanner and etch co-optimized corrections for better overlay and CD control

Ik-Hyun Jeong , Seung-Woo Koo, Hyun-Sok Kim, Jae-Wuk Ju, Young-Sik Kim, Yong-Tae Cho, Heung-Joo Kim, Katja Viatkina, Tom van Hemert, Ruud de Wit, David Deckers, Owen Chen, Nang-Lyeom Oh, Marcus Musselman, Marcus Carbery, Ssuwei Chen, Lucian Schmidt, Heidi Kwon, Jae Gyoo Lee

Proceedings Volume 10963, 1096308 (2019) https://doi.org/10.1117/12.2516578

KEYWORDS: Etching, Overlay metrology, Scanners, Semiconducting wafers, Metrology, Critical dimension metrology, Lithography, Plasma, Process control, Optical lithography

Read Abstract +

Proceedings Article | 20 March 2019 Presentation + Paper

Improved wafer alignment model algorithm for better on-product overlay

Ik-Hyun Jeong, Hyun-Sok Kim, Yeong-Oh Kong, Ji-Hyun Song, Jae-Wuk Ju, Young-Sik Kim, Cees Lambregts, Miao Yu, Rizvi Rahman, Leendertjan Karssemeijer, Elliott McNamara, Paul Böcker, Jong-Cheol Choi, Nang-Lyeom Oh, Kang-San Lee, Jin-Seo Lee

Proceedings Volume 10961, 109610A (2019) https://doi.org/10.1117/12.2516259

KEYWORDS: Optical alignment, Semiconducting wafers, Calibration, Data modeling, Overlay metrology, Metrology, Scanners, High volume manufacturing, Lithography, Sensors

Read Abstract +

Showing 5 of 8 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years