Dr. Marc Hauptmann Profile

Dr. Marc Hauptmann

Team Lead EUV Defectivity at ASML Netherlands BV

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Publications (2)

Proceedings Article | 20 March 2020 Paper

Improving after-etch overlay performance using high-density in-device metrology in DRAM manufacturing

Ik-Hyun Jeong, Seung-Woo Koo, Hyun-Sok Kim, Jung-Il Hwang, Dong-Jin Lee, Min-Shik Kim, Jae-Wuk Ju, Kang-Min Lee, Young-Sik Kim, Cees Lambregts, Rizvi Rahman, Marc Hauptmann, Raheleh Pishkari, Allwyn Boustheen, Kwang-Young Hu, Paul Böcker, Dong-Hak Lee, In-Ho Joo, Kang-San Lee

Proceedings Volume 11325, 113252X (2020) https://doi.org/10.1117/12.2552028

KEYWORDS: Overlay metrology, Etching, Inspection, Semiconducting wafers, Metrology, Feedback loops, Scanners, Spatial frequencies, High volume manufacturing

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Proceedings Article | 24 March 2017 Paper

Experimental verification of on-product overlay improvement by intra-lot overlay control using metrology based grouping

Honggoo Lee, Junghwan Moon, Jaesun Woo, Sangjun Han, Changrock Song, Marc Hauptmann, Weitian Kou, Alexander Ypma, Hyun-Woo Yu, Hank Han, Michiel Kupers, Paul Böcker, Daan Slotboom

Proceedings Volume 10147, 1014713 (2017) https://doi.org/10.1117/12.2259846

KEYWORDS: Semiconducting wafers, Overlay metrology, Process control, Optical lithography, Scanners, Optical alignment, Near infrared, Polishing

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