Dr. Yi-Hsing Peng Profile

Dr. Yi-Hsing Peng

Senior Product Engineer at ASML

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Publications (6)

Proceedings Article | 28 April 2023 Presentation + Paper

A holistic approach to model-based stochastic-aware computational lithography

ChangAn Wang, Yongfa Fan, Mu Feng, Qian Xie, Jazer Wang, Chris Kaplan, Michael Crouse, Xiaoyang Li, Stephen Hsu, Peigen Cao, Yi-Hsing Peng, Stephen Chang, Jun Ye, Youping Zhang, Bin Cheng, Ken Yang, Leiwu Zheng, Jen-Shiang Wang, Austin Peng, Li-Hao Yeh, Cuiping Zhang, Rafael Howell, Alexander Tan, Yiqiong Zhao, Jun Lang, Xiaolong Zhang

Proceedings Volume 12494, 124940B (2023) https://doi.org/10.1117/12.2658508

KEYWORDS: Stochastic processes, Data modeling, Optical proximity correction, Line width roughness, Source mask optimization, Computational lithography, Semiconducting wafers, Modeling, Performance modeling, Photons

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Proceedings Article | 22 February 2021 Presentation + Paper

Stochastic defect criticality prediction enabled by physical stochastic modeling and massive metrology

ChangAn Wang, Peigen Cao, Maxence Delorme, Jen-Yi Wuu, Jiyou Fu, Fuming Wang, Bob Lin, Yiqiong Zhao, Yi-Hsing Peng, Yongfa Fan, Mu Feng, Bin Cheng, Jen-Shiang Wang, Mark Simmoms, Stefan Hunsche, Oliver Patterson, Kuo-Feng Pao, Abdalmohsen Elmalk, Kevin Gao, Ruochong Fei, Xuefeng Zeng, Xiaolong Zhang

Proceedings Volume 11609, 1160916 (2021) https://doi.org/10.1117/12.2584767

KEYWORDS: Stochastic processes, Pattern recognition, Semiconducting wafers, Wafer inspection, Inspection, Defect detection, Metrology, Failure analysis, Data modeling, Calibration

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Proceedings Article | 20 March 2018 Presentation

Analysis of hotspots that impact defectivity from light source bandwidth variation using Lithography Manufacturability Checker (LMC) (Conference Presentation)

Will Conley, Yi-Hsing Peng, Xiaolong Zhang, Stephen Hsu, Raphael La Greca

Proceedings Volume 10587, 105870E (2018) https://doi.org/10.1117/12.2299319

KEYWORDS: Light sources, Lithography, Manufacturing, Yield improvement, Deep ultraviolet, Scanners, Semiconducting wafers

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Proceedings Article | 4 October 2016 Paper

OPC care-area feedforwarding to MPC

Brian Dillon, Yi-Hsing Peng, Masakazu Hamaji, Dai Tsunoda, Tomoyuki Muramatsu, Shuichiro Ohara, Yi Zou, Vincent Arnoux, Stanislas Baron, Xiaolong Zhang

Proceedings Volume 9985, 99851A (2016) https://doi.org/10.1117/12.2242972

KEYWORDS: Photomasks, Optical proximity correction, Semiconducting wafers, Photovoltaics, Modulation, Beam shaping, Metals, SRAF, Control systems, Source mask optimization

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Proceedings Article | 25 March 2016 Paper

Design-based metrology: beyond CD/EPE metrics to evaluate printability performance

Sandip Halder, Julien Mailfert, Philippe Leray, David Rio, Yi-Hsing Peng, Bart Laenens

Proceedings Volume 9778, 97780W (2016) https://doi.org/10.1117/12.2221894

KEYWORDS: Metrology, Scanning electron microscopy, Semiconducting wafers, Critical dimension metrology, Optical proximity correction, Logic, Image processing, Process control, Electron microscopes, Tolerancing, Distance measurement, Lithography, Finite element methods, Calibration

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Proceedings Article | 15 October 2004 Paper

Advances in polymer optical devices and waveguide fabrication techniques

Warren Herman, Wei-Yen Chen, Younggu Kim, Glenn Hutchinson, Wei Lou Cao, Yongzhang Leng, Victor Yun, Hongye Liang, Yi-Hsing Peng, Min Du, Lisa Lucas, Ping-Tong Ho, Julius Goldhar, Chi Lee

Proceedings Volume 5517, (2004) https://doi.org/10.1117/12.560029

KEYWORDS: Polymers, Waveguides, Polymer multimode waveguides, Microrings, Resonators, Bistability, Switches, Fabrication, Refractive index, Picosecond phenomena

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Showing 5 of 6 publications

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