Dr. Soichi Owa
Nikon Fellow
SPIE Involvement:
Author | Editor
Publications (40)

Proceedings Article | 10 April 2024 Presentation + Paper
Yoji Watanabe, Yuho Kanaya, Yosuke Okudaira, Shunsuke Kibayashi, Toshiaki Sakamoto, Yasushi Mizuno, Kazuo Masaki, Soichi Owa, Thomas Koo, Bryant Lin, Michael Tan, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan
Proceedings Volume 12953, 129530R (2024) https://doi.org/10.1117/12.3010082
KEYWORDS: Spatial light modulators, Micromirrors, Optical lithography, Maskless lithography, Phase shifting

Proceedings Article | 29 September 2023 Paper
Yuho Kanaya, Yoji Watanabe, Toshiaki Sakamoto, Yasushi Mizuno, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, Kazuo Masaki, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Sujuan Li, Michael Tan, Bryant Lin, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan
Proceedings Volume 12915, 129150G (2023) https://doi.org/10.1117/12.2684546
KEYWORDS: Maskless lithography, Direct write lithography, Scanners, Printing, Optical proximity correction, Spatial light modulators, Semiconducting wafers, Photomasks, Raster graphics, Projection systems

SPIE Journal Paper | 5 June 2023
JM3, Vol. 22, Issue 04, 041403, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041403
KEYWORDS: Semiconducting wafers, Spatial light modulators, Deep ultraviolet, Optical proximity correction, UV optics, Solid state lasers, Pulsed laser operation, Lithography, Chip manufacturing, Printing

SPIE Journal Paper | 5 June 2023 Open Access
JM3, Vol. 22, Issue 04, 041402, (June 2023) https://doi.org/10.1117/12.10.1117/1.JMM.22.4.041402
KEYWORDS: Spatial light modulators, Semiconducting wafers, Micromirrors, Optics manufacturing, Semiconductor manufacturing, Silicon, Digital micromirror devices, Wafer-level optics, Pulsed laser operation, Projection systems

Proceedings Article | 28 April 2023 Presentation + Paper
Proceedings Volume 12494, 124940A (2023) https://doi.org/10.1117/12.2657730
KEYWORDS: Semiconducting wafers, Scanners, Optical proximity correction, Optical lithography, Laser scanners, Semiconductors, Printing, Solid state lasers, Fabrication, Chip manufacturing

Proceedings Article | 1 December 2022 Poster + Paper
Yuho Kanaya, Yoji Watanabe, Yusuke Saito, Toshiaki Sakamoto, Ryota Matsui, Yosuke Okudaira, Shunsuke Kibayashi, Koshi Komuro, Hiroyuki Tsukamoto, Soichi Owa, Thomas Koo, David Tseng, Conrad Sorensen, Sujuan Li, Stephen Renwick, Noriyuki Hirayanagi, Bausan Yuan
Proceedings Volume 12293, 122930U (2022) https://doi.org/10.1117/12.2641419
KEYWORDS: Scanners, Data conversion, Photomasks, Spatial light modulators, Optical proximity correction, Raster graphics, Semiconducting wafers, Phase shifts, Deep ultraviolet, Maskless lithography

Proceedings Article | 26 May 2022 Presentation + Paper
Proceedings Volume 12051, 1205108 (2022) https://doi.org/10.1117/12.2613902
KEYWORDS: Semiconducting wafers, Photomasks, Scanners, Data conversion, Spatial light modulators, Printing, Deep ultraviolet, Semiconductors, Optical lithography, Solid state lasers

Proceedings Article | 12 October 2021 Presentation + Paper
Proceedings Volume 11855, 1185508 (2021) https://doi.org/10.1117/12.2600898
KEYWORDS: Spatial light modulators, Projection systems, Scanners, Semiconducting wafers, Digital imaging, Image resolution, Raster graphics, Photomasks, Micromirrors

Proceedings Article | 22 February 2021 Presentation + Paper
Proceedings Volume 11613, 1161309 (2021) https://doi.org/10.1117/12.2583680
KEYWORDS: Deep ultraviolet, Solid state lasers, Laser scanners, 3D scanning, Spatial light modulators, Semiconducting wafers, Prototyping, Laser optics, Security printing, Printing

Proceedings Article | 15 March 2016 Paper
Proceedings Volume 9780, 978004 (2016) https://doi.org/10.1117/12.2219918
KEYWORDS: Optical lithography, Lithography, Metamaterials, Optical metamaterials, Split ring resonators, Immersion lithography, High volume manufacturing, Maskless lithography, Semiconductor manufacturing, Scanners, Spatial light modulators, Photomasks, Semiconductors, Particles

Proceedings Article | 31 March 2014 Paper
Proceedings Volume 9052, 90520O (2014) https://doi.org/10.1117/12.2046604
KEYWORDS: Optical lithography, Transistors, Immersion lithography, Metals, Reactive ion etching, Line edge roughness, Logic, Semiconductors, Etching, Photoresist processing

Proceedings Article | 10 March 2010 Paper
Yasushi Mizuno, Tomoyuki Matsuyama, Soichi Owa, Osamu Tanitsu, Naonori Kita, Masahiko Okumura
Proceedings Volume 7640, 76401I (2010) https://doi.org/10.1117/12.846476
KEYWORDS: Fiber optic illuminators, Source mask optimization, Resolution enhancement technologies, Modulation, Lithographic illumination, Photomasks, Optical lithography, Zernike polynomials, Immersion lithography, Double patterning technology

Proceedings Article | 10 March 2010 Paper
Katsushi Nakano, Rei Seki, Tadamasa Kawakubo, Yoshihiro Maruta, Toshiyuki Sekito, Kenichi Shiraishi, Toshihiko Sei, Tomoharu Fujiwara, Tsunehito Hayashi, Yasuhiro Iriuchijima, Soichi Owa
Proceedings Volume 7640, 76400X (2010) https://doi.org/10.1117/12.846520
KEYWORDS: Semiconducting wafers, Photoresist processing, Immersion lithography, Double patterning technology, Atrial fibrillation, Polymers, Particles, Inspection, Printing, Scanning electron microscopy

Proceedings Article | 4 March 2010 Paper
Proceedings Volume 7640, 764007 (2010) https://doi.org/10.1117/12.846639
KEYWORDS: Modulation, Distortion, Source mask optimization, Tolerancing, Error analysis, Image processing, Optical lithography, Optical simulations, Fiber optic illuminators, Scanning electron microscopy

Proceedings Article | 10 December 2009 Paper
Proceedings Volume 7520, 75200C (2009) https://doi.org/10.1117/12.837161
KEYWORDS: Source mask optimization, Lithography, Photomasks, Metals, Optical lithography, Optical proximity correction, Lithographic illumination, Image transmission, Double patterning technology, Image processing

Proceedings Article | 6 May 2009 Paper
Proceedings Volume 7281, 728102 (2009) https://doi.org/10.1117/12.831424
KEYWORDS: Semiconducting wafers, Lithography, Photomasks, Lithographic illumination, Manufacturing, Optical lithography, Deep ultraviolet, Imaging systems, Photoresist materials, Resolution enhancement technologies

Proceedings Article | 16 March 2009 Paper
Katsushi Nakano, Rei Seki, Toshiyuki Sekito, Masato Yoshida, Tomoharu Fujiwara, Yasuhiro Iriuchijima, Soichi Owa
Proceedings Volume 7274, 72741P (2009) https://doi.org/10.1117/12.814238
KEYWORDS: Semiconducting wafers, Particles, Head-mounted displays, Inspection, Silicon, Contamination, Immersion lithography, Scanning electron microscopy, Photoresist processing, Manufacturing

Proceedings Article | 4 December 2008 Paper
Proceedings Volume 7140, 714015 (2008) https://doi.org/10.1117/12.804709
KEYWORDS: Immersion lithography, Semiconducting wafers, Lithography, Water, Liquids, Optical lithography, Double patterning technology, Extreme ultraviolet lithography, Semiconductors, Projection systems

Proceedings Article | 17 March 2008 Paper
Katsushi Nakano, Shiro Nagaoka, Masato Yoshida, Yasuhiro Iriuchijima, Tomoharu Fujiwara, Kenichi Shiraishi, Soichi Owa
Proceedings Volume 6924, 692418 (2008) https://doi.org/10.1117/12.772270
KEYWORDS: Particles, Semiconducting wafers, Photoresist processing, Inspection, Bridges, Coating, Printing, Photomasks, Immersion lithography, Materials processing

Proceedings Article | 7 March 2008 Paper
Proceedings Volume 6924, 692413 (2008) https://doi.org/10.1117/12.771622
KEYWORDS: Lithography, Surface finishing, Transparency, Immersion lithography, Refractive index, Polarization, Birefringence, Control systems, Point spread functions, Lens design

Proceedings Article | 3 May 2007 Paper
Proceedings Volume 6533, 653304 (2007) https://doi.org/10.1117/12.731916
KEYWORDS: Semiconducting wafers, Imaging systems, Double patterning technology, Water, Immersion lithography, Manufacturing, Lithography, Refractive index, Photoresist developing, Thin film coatings

Proceedings Article | 29 March 2007 Paper
Katsushi Nakano, Hiroshi Kato, Soichi Owa
Proceedings Volume 6519, 65190D (2007) https://doi.org/10.1117/12.711466
KEYWORDS: Particles, Semiconducting wafers, Bridges, Photoresist processing, Immersion lithography, Scanning electron microscopy, Photomasks, Signal attenuation, Materials processing, Defect detection

Proceedings Article | 26 March 2007 Paper
Yasuhiro Ohmura, Toshiharu Nakashima, Hiroyuki Nagasaka, Ayako Sukegawa, Satoshi Ishiyama, Koichi Kamijo, Masahiko Shinkai, Soichi Owa
Proceedings Volume 6520, 652006 (2007) https://doi.org/10.1117/12.711252
KEYWORDS: Microfluidics, Immersion lithography, Lithography, Refractive index, Water, Lens design, Semiconducting wafers, Absorption, Birefringence, Polarization

Proceedings Article | 26 March 2007 Paper
Katsushi Nakano, Hiroshi Kato, Tomoharu Fujiwara, K. Shiraishi, Yasuhiro Iriuchijima, Soichi Owa, Irfan Malik, Steve Woodman, Prasad Terala, Christine Pelissier, Haiping Zhang
Proceedings Volume 6520, 652016 (2007) https://doi.org/10.1117/12.711464
KEYWORDS: Semiconducting wafers, Particles, Immersion lithography, Inspection, Wafer inspection, Bridges, Photoresist processing, Optical lithography, Calibration, Defect inspection

Proceedings Article | 11 April 2006 Paper
Tomoyuki Ando, Katsumi Ohmori, Satoshi Maemori, Toshikazu Takayama, Keita Ishizuka, Masaaki Yoshida, Tomoyuki Hirano, Jiro Yokoya, Katsushi Nakano, Tomoharu Fujiwara, Soichi Owa
Proceedings Volume 6153, 615309 (2006) https://doi.org/10.1117/12.656164
KEYWORDS: Semiconducting wafers, Photoresist processing, Immersion lithography, Resonance energy transfer, Lithography, Materials processing, Bridges, 193nm lithography, Molecular bridges, Lens design

Proceedings Article | 11 April 2006 Paper
Hiroki Nakagawa, Kenji Hoshiko, Motoyuki Shima, Shiro Kusumoto, Tsutomu Shimokawa, Katsushi Nakano, Tomoharu Fujiwara, Soichi Owa
Proceedings Volume 6153, 61530D (2006) https://doi.org/10.1117/12.655541
KEYWORDS: Semiconducting wafers, Scanners, Water, Lithography, Immersion lithography, Resonance energy transfer, Photoresist processing, Photoresist materials, Silicon, Chemical analysis

Proceedings Article | 21 March 2006 Paper
Katsushi Nakano, Soichi Owa, Irfan Malik, Tetsuya Yamamoto, Somnath Nag
Proceedings Volume 6154, 61544J (2006) https://doi.org/10.1117/12.656195
KEYWORDS: Semiconducting wafers, Coating, Scanning electron microscopy, Immersion lithography, Particles, Bridges, Inspection, Resonance energy transfer, Photoresist processing, Defect inspection

Proceedings Article | 15 March 2006 Paper
Proceedings Volume 6154, 615408 (2006) https://doi.org/10.1117/12.656887
KEYWORDS: Optics manufacturing, Semiconducting wafers, Water, Resonance energy transfer, Double patterning technology, Immersion lithography, Scanners, Combined lens-mirror systems, Particles, Projection systems

Proceedings Article | 12 May 2005 Paper
Hisashi Nishinaga, Noriaki Tokuda, Soichi Owa, Shigeru Hirukawa, Osamu Tanitsu, Takehito Kudo, Hirohisa Tanaka
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599356
KEYWORDS: Polarization, Fiber optic illuminators, Lithographic illumination, Resolution enhancement technologies, Wave plates, Lithography, Photomasks, Semiconducting wafers, Line width roughness, Image processing

Proceedings Article | 12 May 2005 Paper
Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599352
KEYWORDS: Resonance energy transfer, Semiconducting wafers, Thin film coatings, Combined lens-mirror systems, Contamination, Phase shifts, Polarization, Projection systems, Critical dimension metrology, Inspection

Proceedings Article | 28 May 2004 Paper
Soichi Owa, Hiroyuki Nagasaka, Yuuki Ishii, Osamu Hirakawa, Taro Yamamoto
Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.536852
KEYWORDS: Polarization, Semiconducting wafers, Water, Immersion lithography, Reflectivity, Projection systems, Optical sensing, Photomasks, Particles, Optical design

SPIE Journal Paper | 1 January 2004
JM3, Vol. 3, Issue 01, (January 2004) https://doi.org/10.1117/12.10.1117/1.1637593
KEYWORDS: Immersion lithography, Semiconducting wafers, Water, Liquids, Photomasks, Lithography, Polarization, Projection systems, Binary data, Temperature metrology

Proceedings Article | 26 June 2003 Paper
Soichi Owa, Yukako Matsumoto, Yasuhiro Ohmura, Shigeru Sakuma, Takashi Aoki, Jin Nishikawa, Hiroyuki Nagasaka, Takeyuki Mizutani, Naomasa Shiraishi, Kazuhiro Kido, Issei Tanaka, Jun Nagatsuka
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.485451
KEYWORDS: Pellicles, Projection systems, Photomasks, Lithography, Coating, Birefringence, Crystals, Binary data, Refractive index, Optical design

Proceedings Article | 26 June 2003 Paper
Proceedings Volume 5040, (2003) https://doi.org/10.1117/12.504599
KEYWORDS: Immersion lithography, Water, Semiconducting wafers, Liquids, Photomasks, Projection systems, Temperature metrology, Lithography, Polarization, Binary data

Proceedings Article | 30 July 2002 Paper
Naomasa Shiraishi, Soichi Owa, Yasuhiro Ohmura, Takashi Aoki, Yukako Matsumoto, Jin Nishikawa, Issei Tanaka
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474607
KEYWORDS: Birefringence, Crystals, Projection systems, Optical design, Wavefronts, Lithography, Chemical species, Absorption, Combined lens-mirror systems, Calcium

Proceedings Article | 30 July 2002 Paper
Yasuaki Fukuda, Seiji Takeuchi, Takashi Aoki, Hiroyuki Nagasaka, Soichi Owa, Fumika Yoshida, Youichi Kawasa, Keiji Egawa, Takehito Watanabe, Ikuo Uchino, Akira Sumitani, Kiyoharu Nakao
Proceedings Volume 4691, (2002) https://doi.org/10.1117/12.474622
KEYWORDS: Adhesives, Oxygen, Metals, Quartz, Lithography, Systems modeling, Transmittance, Information operations, Lenses, Scanning electron microscopy

Proceedings Article | 14 September 2001 Paper
Naomasa Shiraishi, Soichi Owa, Yasuhiro Ohmura, Takashi Aoki, Yukako Matsumoto, Masato Hatasawa, Takashi Mori, Issei Tanaka
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435631
KEYWORDS: Photomasks, Projection systems, Coating, Combined lens-mirror systems, Oxygen, Lithography, Optics manufacturing, Mirrors, Optical components, Logic devices

Proceedings Article | 14 September 2001 Paper
Yasuaki Fukuda, Seiji Takeuchi, Takashi Aoki, Soichi Owa, Fumika Yoshida, Youichi Kawasa, Akira Sumitani, Keiji Egawa, Takehito Watanabe, Kiyoharu Nakao
Proceedings Volume 4346, (2001) https://doi.org/10.1117/12.435763
KEYWORDS: Oxygen, Nitrogen, Surface finishing, Contamination, Lithography, Sensors, Gases, Optical testing, Transmittance, Absorption

Proceedings Article | 30 December 1999 Paper
Hiroki Jinbo, Seishi Fujiwara, Norio Komine, Naomasa Shiraishi, Soichi Owa
Proceedings Volume 3873, (1999) https://doi.org/10.1117/12.373336
KEYWORDS: Silica, Transmittance, Lithography, Birefringence, Photomasks, Vacuum ultraviolet, Fluorine, Absorption, Scattering, Laser scattering

Proceedings Article | 7 July 1997 Paper
Hiroshi Ooki, Derek Coon, Soichi Owa, Toshihiko Sei, Kazuya Okamoto
Proceedings Volume 3051, (1997) https://doi.org/10.1117/12.276012
KEYWORDS: Nonlinear optics, Optical lithography

Showing 5 of 40 publications
Proceedings Volume Editor (4)

SPIE Conference Volume | 14 April 2021

SPIE Conference Volume | 13 April 2020

SPIE Conference Volume | 17 June 2019

SPIE Conference Volume | 23 May 2018

Conference Committee Involvement (16)
Optical and EUV Nanolithography XXXVII
26 February 2024 | San Jose, California, United States
Optical and EUV Nanolithography XXXVI
27 February 2023 | San Jose, California, United States
Optical and EUV Nanolithography XXXV
25 April 2022 | San Jose, California, United States
Optical Lithography XXXIV
22 February 2021 | Online Only, California, United States
Optical Microlithography XXXIII
25 February 2020 | San Jose, California, United States
Optical Microlithography XXXII
26 February 2019 | San Jose, California, United States
Optical Microlithography XXXI
27 February 2018 | San Jose, California, United States
Optical Microlithography XXX
28 February 2017 | San Jose, California, United States
Optical Microlithography XXIX
23 February 2016 | San Jose, California, United States
Optical Microlithography XXVIII
24 February 2015 | San Jose, California, United States
Optical Microlithography XXVII
25 February 2014 | San Jose, California, United States
Optical Microlithography XXVI
26 February 2013 | San Jose, California, United States
Optical Microlithography XXV
14 February 2012 | San Jose, California, United States
Optical Microlithography XXIV
1 March 2011 | San Jose, California, United States
Optical Microlithography XXIII
23 February 2010 | San Jose, California, United States
Optical Microlithography XXII
24 February 2009 | San Jose, California, United States
Showing 5 of 16 Conference Committees
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