Dr. Shiro Kusumoto Profile

Dr. Shiro Kusumoto

Manager at JSR Engineering Co Ltd

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Author

Publications (11)

Proceedings Article | 1 April 2009 Paper

Double patterning process with freezing technique

Goji Wakamatsu, Yusuke Anno, Masafumi Hori, Tomohiro Kakizawa, Michihiro Mita, Kenji Hoshiko, Takeo Shioya, Koichi Fujiwara, Shiro Kusumoto, Yoshikazu Yamaguchi, Tsutomu Shimokawa

Proceedings Volume 7273, 72730B (2009) https://doi.org/10.1117/12.814073

KEYWORDS: Double patterning technology, Lithography, Optical lithography, Photoresist processing, Manufacturing, Etching, Semiconducting wafers, Scanning electron microscopy, Image processing, Photomasks

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Proceedings Article | 1 April 2009 Paper

CD uniformity improvement for double-patterning lithography (litho-litho-etch) using freezing process

Hisanori Sugimachi, Hitoshi Kosugi, Tsuyoshi Shibata, Junichi Kitano, Koichi Fujiwara, Kouji Itou, Michihiro Mita, Akimasa Soyano, Shiro Kusumoto, Motoyuki Shima, Yoshikazu Yamaguchi

Proceedings Volume 7273, 72731D (2009) https://doi.org/10.1117/12.814033

KEYWORDS: Photoresist processing, Critical dimension metrology, Line width roughness, Lithography, Coating, Double patterning technology, Semiconducting wafers, Factor analysis, Etching, Neodymium

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Proceedings Article | 1 April 2009 Paper

Non-topcoat process development for ArF immersion lithography

Takehiko Naruoka, Nobuji Matsumura, Akimasa Soyano, Shiro Kusumoto, Yoshikazu Yamaguchi, Hiroshi Arima, Yuichi Yoshida, Kousuke Yoshihara, Tsuyoshi Shibata

Proceedings Volume 7273, 727328 (2009) https://doi.org/10.1117/12.814084

KEYWORDS: Surface properties, Water, Immersion lithography, Lithography, Photoresist processing, Thin film coatings, Semiconducting wafers, Defect inspection, Coating, Line width roughness

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Proceedings Article | 26 March 2008 Paper

Sub-40-nm half-pitch double patterning with resist freezing process

Masafumi Hori, Tomoki Nagai, Atsushi Nakamura, Takayoshi Abe, Gouji Wakamatsu, Tomohiro Kakizawa, Yuusuke Anno, Makoto Sugiura, Shiro Kusumoto, Yoshikazu Yamaguchi, Tsutomu Shimokawa

Proceedings Volume 6923, 69230H (2008) https://doi.org/10.1117/12.772403

KEYWORDS: Double patterning technology, Critical dimension metrology, Lithography, Optical lithography, Photoresist processing, Immersion lithography, Scanning electron microscopy, Semiconducting wafers, Water, Etching

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Proceedings Article | 23 March 2007 Paper

High-performance 193-nm photoresists based on fluorosulfonamide

Wenjie Li, Kuang-Jung Chen, Ranee Kwong, Margaret Lawson, Mahmoud Khojasteh, Irene Popova, P. Rao Varanasi, Tsutomu Shimokawa, Yoshikazu Yamaguchi, Shiro Kusumoto, Makoto Sugiura, Takanori Kawakami, Mark Slezak, Gary Dabbagh, Zhi Liu

Proceedings Volume 6519, 65190F (2007) https://doi.org/10.1117/12.712231

KEYWORDS: Polymers, Etching, Fluorine, Resistance, Lithography, Immersion lithography, 193nm lithography, Chemical species, Photoresist materials, Lithographic illumination

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Proceedings Article | 11 April 2006 Paper

Immersion topcoat and resist material improvement study by using immersion scanner

Hiroki Nakagawa, Kenji Hoshiko, Motoyuki Shima, Shiro Kusumoto, Tsutomu Shimokawa, Katsushi Nakano, Tomoharu Fujiwara, Soichi Owa

Proceedings Volume 6153, 61530D (2006) https://doi.org/10.1117/12.655541

KEYWORDS: Semiconducting wafers, Scanners, Water, Lithography, Immersion lithography, Resonance energy transfer, Photoresist processing, Photoresist materials, Silicon, Chemical analysis

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Proceedings Article | 11 April 2006 Paper

Improvement of watermark defect in immersion lithography: mechanism of watermark defect formation and its reduction by using alkaline-soluble immersion topcoat

Hiroki Nakagawa, Atsushi Nakamura, Hiroshi Dougauchi, Motoyuki Shima, Shiro Kusumoto, Tsutomu Shimokawa

Proceedings Volume 6153, 61531R (2006) https://doi.org/10.1117/12.655517

KEYWORDS: Digital watermarking, Photoresist materials, Immersion lithography, Water, Semiconducting wafers, Photoresist processing, Thin film coatings, Semiconductors, Image processing, Materials processing

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Proceedings Article | 11 April 2006 Paper

High-refractive-index fluids for the next-generation ArF immersion lithography

Yong Wang, Takashi Miyamatsu, Taiichi Furukawa, Kinji Yamada, Tetsuo Tominaga, Yutaka Makita, Hiroki Nakagawa, Atsushi Nakamura, Motoyuki Shima, Shiro Kusumoto, Tsutomu Shimokawa, Katsuhiko Hieda

Proceedings Volume 6153, 61530A (2006) https://doi.org/10.1117/12.656022

KEYWORDS: Refractive index, Water, Immersion lithography, Ultraviolet radiation, Absorbance, Laser irradiation, Absorption, Photoresist materials, Transmittance, Prisms

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Proceedings Article | 4 May 2005 Paper

Material design for immersion lithography with high refractive index fluid (HIF)

Takashi Miyamatsu, Yong Wang, Motoyuki Shima, Shiro Kusumoto, Takashi Chiba, Hiroki Nakagawa, Katsuhiko Hieda, Tsutomu Shimokawa

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599165

KEYWORDS: Refractive index, Photoresist materials, Water, Immersion lithography, Ultraviolet radiation, Lithography, Transmittance, Semiconducting wafers, Interferometry, Transparency

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Proceedings Article | 4 May 2005 Paper

Contact hole shrink process with novel chemical shrink materials

Takayoshi Abe, Tooru Kimura, Takashi Chiba, Motoyuki Shima, Shiro Kusumoto, Tsutomu Shimokawa

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598960

KEYWORDS: Photoresist materials, Etching, Chemical reactions, 193nm lithography, Image processing, Photoresist developing, Polymers, Lithography, Process control, Photoresist processing

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Proceedings Article | 4 May 2005 Paper

Understanding quencher mechanisms by considering photoacid-dissociation equilibrium in chemically amplified resists

Seiji Nagahara, Lei Yuan, Wojtek Jacob Poppe, Andrew Neureuther, Yoshiyuki Kono, Atsushi Sekiguchi, Koichi Fujiwara, Tsuyoshi (Gary) Watanabe, Kazuo Taira, Shiro Kusumoto, Takanori Nakano, Tsutomu Shimokawa

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598949

KEYWORDS: Systems modeling, FT-IR spectroscopy, Diffusion, 3D modeling, Solids, Semiconducting wafers, Chemically amplified resists, Data modeling, Spectroscopy, Liquids

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Showing 5 of 11 publications

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