Soichi Shida
Department Manager at Advantest Corp
SPIE Involvement:
Author
Publications (17)

Proceedings Article | 18 September 2024 Paper
Proceedings Volume 13273, 132730S (2024) https://doi.org/10.1117/12.3029528
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Extreme ultraviolet, Metrology, Scanning electron microscopy, Smoothing, Extreme ultraviolet lithography, Scanners, Design, Printing

Proceedings Article | 21 November 2023 Presentation + Paper
Deepan Kishore Kumar, Varun Mohan, Hatsey Frezghi, Adam Seeger, Malahat Tavassoli, Masayuki Kuribara, Kiyoshi Oura, Wataru Ito, Soichi Shida, Tatsuro Okawa, Mark Sheppard, Toshimichi Iwai
Proceedings Volume 12751, 127510R (2023) https://doi.org/10.1117/12.2687660
KEYWORDS: Metrology, Extreme ultraviolet, Scanning electron microscopy, Critical dimension metrology, Photomasks, Optical proximity correction, Reticles

Proceedings Article | 5 October 2023 Paper
Tatsuro Okawa, Yusuke Kakinuma, Yoshiaki Ogiso, Naoyuki Tanaka, Kazuo Mukawa, Soichi Shida, Shinichi Kojima, Toshimichi Iwai
Proceedings Volume 12802, 128020D (2023) https://doi.org/10.1117/12.2675545
KEYWORDS: Image processing, Metrology, Design and modelling, Computer hardware, Image processing software, Scanning electron microscopy, Contour extraction, Parallel processing, Computing systems, Lithography

Proceedings Article | 10 May 2016 Paper
Won Joo Park, Hyung-Joo Lee, Yoon Taek Han, Seuk Hwan Choi, Hak Seung Han, Dong Hoon Chung, Chan-Uk Jeon, Yoshiaki Ogiso, Soichi Shida, Jun Matsumoto, Takayuki Nakamura
Proceedings Volume 9984, 998407 (2016) https://doi.org/10.1117/12.2242496
KEYWORDS: Scanning electron microscopy, Photomasks, Critical dimension metrology, Metrology, Image processing, Statistical analysis, Image quality, Neodymium, Semiconductors, Optical proximity correction

Proceedings Article | 23 October 2015 Paper
Shingo Yoshikawa, Nobuaki Fujii, Koichi Kanno, Hidemichi Imai, Katsuya Hayano, Hiroyuki Miyashita, Soichi Shida, Tsutomu Murakawa, Masayuki Kuribara, Jun Matsumoto, Takayuki Nakamura, Shohei Matsushita, Daisuke Hara, Linyong Pang
Proceedings Volume 9635, 96351X (2015) https://doi.org/10.1117/12.2197818
KEYWORDS: Lithography, Photomasks, Scanning electron microscopy, Semiconducting wafers, 3D acquisition, 3D metrology, Defect inspection, Defect detection, Manufacturing, Standards development, Critical dimension metrology, Extreme ultraviolet, Bridges, Image analysis, 193nm lithography

Showing 5 of 17 publications
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