Dr. Rudy J. Wojtecki Profile

Dr. Rudy J. Wojtecki

Director Process Engineering at Applied Materials Inc.

SPIE Involvement:

Author

SPIE Journal Paper | 21 July 2021

Chemical and structural characterization of EUV photoresists as a function of depth by standing-wave x-ray photoelectron spectroscopy

Giuseppina Conti, Henrique Martins, Isvar Cordova, Jonathan Ma, Rudy Wojtecki, Patrick Naulleau, Slavomír Nemšák

JM3, Vol. 20, Issue 03, 034603, (July 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.034603

KEYWORDS: Extreme ultraviolet lithography, Interfaces, X-rays, Photoresist materials, Mirrors, Aluminum, Multilayers, Self-assembled monolayers, Photoemission spectroscopy, X-ray characterization

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The success in the miniaturization of the electronic device constituents depends mostly on the photolithographic techniques. Recently, to achieve patterning at the sub-10-nm node, extreme ultraviolet (EUV) lithography has been introduced into high volume production. Continued scaling of EUV via increased numerical aperture to achieve nodes at 3-nm and below requires the development of fundamentally new patterning materials and new characterization methods. Current EUV-resist film thicknesses are in the 20- to 40-nm range, and further thickness reduction is required for the next generation. Therefore, interfaces become exceedingly important, and the properties of the resist film would be dominated by top and bottom interfacial effects. X-ray photoelectron spectroscopy (XPS) combined with standing-wave excitation (SW-XPS), a fairly new method in the EUV lithography field, previously had been largely applied in multilayers and superlattices for characterizing the composition and electronic structure of buried layers and interfaces as a function of depth. We applied the SW-XPS method to organic/inorganic photoresists to provide depth-selective information on their structural and chemical conditions of as a function of temperature, EUV exposure, different underlayers, and other fundamental parameters. As a first attempt, we perform an SW-XPS feasibility study on self-assembled monolayer (SAM) films after exposure to an electron beam. By SW-XPS, we determined that the interface between the Al2O3 underlayer and the SAMs is smooth, with a mean roughness of about 0.2 nm. Moreover, we determined that the SAM chains are, on average, tilted by ∼30 deg off the sample normal. The SW-XPS results also suggest that the SAM is not a perfectly aligned and uniform monolayer, with some areas having thickness higher than a single monolayer. We demonstrated that SW-XPS can provide useful information on ultrathin materials with high potential for being used as a characterization method of organic/inorganic photoresists.

Proceedings Article | 10 November 2020 Presentation + Paper

Sub-nm depth characterization of EUV nanoscale photoresist films by standing-wave photoemission spectroscopy

G. Conti, H. Perin Martins, I. Cordova, J. Ma, R. Wojtecki, P. Naulleau, S. Nemsak

Proceedings Volume 11517, 115170I (2020) https://doi.org/10.1117/12.2575463

KEYWORDS: Photoresist materials, Extreme ultraviolet lithography, Nondestructive evaluation, Photoemission spectroscopy, Interfaces, Nanolithography, Photoresist developing, Transistors, Extreme ultraviolet, Optical properties

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Proceedings Article | 20 September 2020 Presentation

Engineering resist-substrate interface: a quantum chemistry study of self-assembled monolayers

Jonathan Ma, Isvar Cordova, Rudy Wojtecki, Andrew Neureuther, Patrick Naulleau

Proceedings Volume 11517, 115170H (2020) https://doi.org/10.1117/12.2574879

KEYWORDS: Self-assembled monolayers, Chemistry, Interfaces, Extreme ultraviolet, Electrons, Chemical reactions, Extreme ultraviolet lithography, Deep ultraviolet, New and emerging technologies, Lithography

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Proceedings Article | 24 March 2020 Presentation

Inhibitor design for area selective atomic layer deposition (Conference Presentation)

Rudy Wojtecki

Proceedings Volume 11326, 113260R (2020) https://doi.org/10.1117/12.2551982

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Proceedings Article | 25 March 2019 Presentation

Defectivity reduction in area selective atomic layer deposition by monolayer design (Conference Presentation)

Rudy Wojtecki, Magi Mettry, Noah Frederick Fine Nathel, Alexander Friz, Anuja De Silva, Noel Arellano, Hosadurga Shobha

Proceedings Volume 10960, 109600P (2019) https://doi.org/10.1117/12.2515465

KEYWORDS: Atomic layer deposition, Etching, Lithography, Self-assembled monolayers, Photomasks, Overlay metrology, Semiconductors, Hydrogen, Polymer thin films, Polymers

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Proceedings Article | 3 October 2018 Presentation + Paper

Study of resist hardmask interaction through surface activation layers

Anuja De Silva, Luciana Meli, Jing Guo, Jennifer Church, Nelson Felix, Dario Goldfarb, Bharat Kumar, Rudy Wojtecki, Magi Mettry, Alexander Hess

Proceedings Volume 10809, 1080916 (2018) https://doi.org/10.1117/12.2501824

KEYWORDS: Polymers, Semiconductors, Interfaces, Silicon, Head-mounted displays, Etching, Electron beam lithography, Optical lithography, Semiconductor materials, Oxides

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Proceedings Article | 21 March 2016 Paper

Contrast enhanced diffusion NMR: quantifying impurities in block copolymers for DSA

Rudy Wojtecki, Ellie Porath, Ankit Vora, Alshakim Nelson, Daniel Sanders

Proceedings Volume 9779, 977922 (2016) https://doi.org/10.1117/12.2218633

KEYWORDS: Diffusion, Polymers, Polymethylmethacrylate, Molecular self-assembly, Spectroscopy, Chromatography, Magnetism, Lithography, Adsorption, Liquids, Thin films, Picosecond phenomena, Polymerization, Rhodium, Carbonates

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Showing 5 of 7 publications

Conference Committee Involvement (2)

Advances in Patterning Materials and Processes XXXIX

25 April 2022 | San Jose, California, United States

Advances in Patterning Materials and Processes XXXVIII

22 February 2021 | Online Only, California, United States

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