Dr. Noel Arellano Profile

Dr. Noel Arellano

at IBM Research - Almaden

SPIE Involvement:

Author

Publications (10)

Proceedings Article | 25 March 2019 Presentation

Defectivity reduction in area selective atomic layer deposition by monolayer design (Conference Presentation)

Rudy Wojtecki, Magi Mettry, Noah Frederick Fine Nathel, Alexander Friz, Anuja De Silva, Noel Arellano, Hosadurga Shobha

Proceedings Volume 10960, 109600P (2019) https://doi.org/10.1117/12.2515465

KEYWORDS: Atomic layer deposition, Etching, Lithography, Self-assembled monolayers, Photomasks, Overlay metrology, Semiconductors, Hydrogen, Polymer thin films, Polymers

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Proceedings Article | 25 March 2019 Presentation

Model studies on the metal salt sensitization of chemically amplified photoresists (Conference Presentation)

Gregory Wallraff, Hoa Truong, Martha Sanchez, Noel Arellno, Alexander Friz, Wyatt Thornley, Oleg Kostko, Dan Slaughter, Frank Ogletree

Proceedings Volume 10960, 1096004 (2019) https://doi.org/10.1117/12.2514610

KEYWORDS: Metals, Photoresist materials, Extreme ultraviolet, Systems modeling, Electrons, Extreme ultraviolet lithography, High volume manufacturing, Semiconductor manufacturing, Semiconductors, Photoresist processing

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Proceedings Article | 25 March 2016 Paper

High chi block copolymer DSA to improve pattern quality for FinFET device fabrication

HsinYu Tsai, Hiroyuki Miyazoe, Ankit Vora, Teddie Magbitang, Noel Arellano, Chi-Chun Liu, Michael Maher, William Durand, Simon Dawes, James Bucchignano, Lynne Gignac, Daniel Sanders, Eric Joseph, Matthew Colburn, C. Grant Willson, Christopher Ellison, Michael Guillorn

Proceedings Volume 9779, 977910 (2016) https://doi.org/10.1117/12.2219544

KEYWORDS: Line edge roughness, Line width roughness, Lithography, Polymers, Etching, Semiconductors, Manufacturing, Directed self assembly, Silicon, Plasma, Oxygen

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Proceedings Article | 20 March 2015 Paper

Directed self-assembly of topcoat-free, integration-friendly high-X block copolymers

Eri Hirahara, Margareta Paunescu, Orest Polishchuk, EunJeong Jeong, Edward Ng, Jianhui Shan, Jihoon Kim, SungEun Hong, Durairaj Baskaran, Guanyang Lin, Ankit Vora, Melia Tjio, Noel Arellano, Charles Rettner, Elizabeth Lofano, Chi-Chun Liu, Hsinyu Tsai, Anindarupa Chunder, Khanh Nguyen, Alexander Friz, Amy Bowers, Srinivasan Balakrishnan, Joy Cheng, Daniel Sanders

Proceedings Volume 9425, 94250P (2015) https://doi.org/10.1117/12.2087398

KEYWORDS: Scanning electron microscopy, Etching, Photomicroscopy, Dry etching, Annealing, Thin films, Plasma etching, Polymers, Coating, Directed self assembly

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Proceedings Article | 19 March 2015 Paper

Customization and design of directed self-assembly using hybrid prepatterns

Joy Cheng, Gregory Doerk, Charles Rettner, Gurpreet Singh, Melia Tjio, Hoa Truong, Noel Arellano, Srinivasan Balakrishnan, Markus Brink, Hsinyu Tsai, Chi-Chun Liu, Michael Guillorn, Daniel Sanders

Proceedings Volume 9423, 942307 (2015) https://doi.org/10.1117/12.2086973

KEYWORDS: Picosecond phenomena, Polymethylmethacrylate, System on a chip, Scanning electron microscopy, Image segmentation, Photomasks, Etching, Electron beam lithography, Composites, Directed self assembly

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Proceedings Article | 27 March 2014 Paper

Spin-on organic hardmask for topo-patterned substrate

Kazuhiko Komura, Yoshi Hishiro, Goji Wakamatsu, Yoshio Takimoto, Tomoki Nagai, Tooru Kimura, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Noel Arellano, Srinivasan Balakrishnan, Luisa Bozano, Ananthakrishnan Sankaranarayanan, Krishna Bajjuri, Daniel Sanders, Carl Larson, Anuja DeSilva, Martin Glodde

Proceedings Volume 9051, 905115 (2014) https://doi.org/10.1117/12.2046357

KEYWORDS: Fourier transforms, Chemical vapor deposition, Photoresist materials, Resistance, Carbon, Photomasks, Optical lithography, Lithography, Glasses

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Proceedings Article | 26 March 2013 Paper

Deterministically isolated gratings through the directed self-assembly of block copolymers

Gregory Doerk, Joy Cheng, Charles Rettner, Srinivasan Balakrishnan, Noel Arellano, Daniel Sanders

Proceedings Volume 8680, 86800Y (2013) https://doi.org/10.1117/12.2011629

KEYWORDS: Lithography, Epitaxy, Scanning electron microscopy, Custom fabrication, Polymers, Optical alignment, Polymethylmethacrylate, Etching, Oxygen, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Measurement of placement error between self-assembled polymer patterns and guiding chemical prepatterns

Gregory Doerk, Chi-Chun Liu, Joy Cheng, Charles Rettner, Jed Pitera, Leslie Krupp, Teya Topuria, Noel Arellano, Daniel Sanders

Proceedings Volume 8323, 83230P (2012) https://doi.org/10.1117/12.916421

KEYWORDS: Polymethylmethacrylate, Oxygen, Chemical analysis, Reactive ion etching, Polymers, Epitaxy, Etching, Error analysis, Lithography, Directed self assembly

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Proceedings Article | 21 March 2012 Paper

Progress towards the integration of optical proximity correction and directed self-assembly of block copolymers with graphoepitaxy

Chi-Chun Liu, Jed Pitera, Neal Lafferty, Kafai Lai, Charles Rettner, Melia Tjio, Noel Arellano, Joy Cheng

Proceedings Volume 8323, 83230X (2012) https://doi.org/10.1117/12.916525

KEYWORDS: Performance modeling, Monte Carlo methods, Optical proximity correction, Photomasks, Lithography, 3D modeling, Photoresist processing, Electron beam lithography, Double patterning technology, Directed self assembly

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Proceedings Article | 20 March 2012 Paper

Investigation of pattern wiggling for spin-on organic hardmask materials

Goji Wakamatsu, Kentaro Goto, Yoshi Hishiro, Taiichi Furukawa, Satoru Murakami, Masayuki Motonari, Yoshikazu Yamaguchi, Tsutomu Shimokawa, Greg Breyta, Anuja DeSilva, Noel Arellano, Luisa Bozano, Carl Larson, Martin Glodde, Ratnam Sooriyakumaran

Proceedings Volume 8325, 83250T (2012) https://doi.org/10.1117/12.915698

KEYWORDS: Etching, Resistance, Hydrogen, Chemical vapor deposition, Fluorine, Fourier transforms, Optical lithography, Critical dimension metrology, Double patterning technology, Extreme ultraviolet

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Showing 5 of 10 publications

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