Mr. Naoki Shibata Profile

Naoki Shibata

at TEL Technology Ctr America LLC

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Author

Publications (3)

Proceedings Article | 6 April 2020 Presentation + Paper

Strategies for aggressive scaling of EUV multi-patterning to sub-20 nm features

Ashim Dutta, Jennifer Church, Joe Lee, Brendan O’Brien, Luciana Meli, Chi Chun Liu, Saumya Sharma, Karen Petrillo, Cody Murray, Eric Liu, Katie Lutker-Lee, Qiaowei Lou, Chris Cole, Angélique Raley, Akiteru Ko, Subhadeep Kal, Jake Kaminsky, Aelan Mosden, Henan Zhang, Shan Hu, Lior Huli, Naoki Shibata, Dave Hetzer, Chia-Yun (Sharon) Hsieh

Proceedings Volume 11323, 113230V (2020) https://doi.org/10.1117/12.2551727

KEYWORDS: Line edge roughness, Lithography, Etching, Amorphous silicon, Extreme ultraviolet, Oxidation, Extreme ultraviolet lithography, Optical lithography, Scanning electron microscopy, Critical dimension metrology

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Proceedings Article | 26 March 2019 Paper

The defect mitigation on EUV stack by track based technology

Naoki Shibata, Lior Huli, Corey Lemley, Yuichiro Miyata, Dave Hetzer, Toshiharu Wada, Akiteru Ko, Shinichiro Kawakami, Akiko Kai, Takahiro Shiozawa, Hidetsugu Yano, Kenichi Ueda, Akihiro Sonoda, Karen Petrillo, Luciana Meli, Nelson Felix, Cody Murray, Alex Hubbard

Proceedings Volume 10957, 109571J (2019) https://doi.org/10.1117/12.2514885

KEYWORDS: Extreme ultraviolet, Optical lithography, Bridges, Extreme ultraviolet lithography, Inspection, Photoresist processing, Coating, Particles, Semiconducting wafers

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Proceedings Article | 19 October 2018 Paper

Track based techniques to improve high-resolution EUV patterning defectivity

Naoki Shibata, Lior Huli, Corey Lemley, Dave Hetzer, Eric Liu, Ko Akiteru, Shinichiro Kawakami, Karen Petrillo, Luciana Meli, Nelson Felix, Cody Murray, Alex Hubbard, Rick Johnson

Proceedings Volume 10809, 1080922 (2018) https://doi.org/10.1117/12.2501668

KEYWORDS: Extreme ultraviolet, Optical lithography, Extreme ultraviolet lithography, Coating, Manufacturing

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