Masaya Kato
at Dai Nippon Printing Co Ltd
SPIE Involvement:
Author
Publications (1)

Proceedings Article | 23 October 2015 Paper
Proceedings Volume 9635, 96351W (2015) https://doi.org/10.1117/12.2197814
KEYWORDS: Photomasks, Inspection, Critical dimension metrology, Opacity, Lithography, Semiconducting wafers, Source mask optimization, Reticles, Optical proximity correction, Bridges

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