CONFERENCE PROCEEDINGS
Advanced Search
Kazuko Jochi
at KLA Japan
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 30 October 2007 Paper
EUV mask process development using DUV inspection system
David Kim, Venu Vellanki, William Huang, Andrew Cao, Chunlin Chen, Aditya Dayal, Paul Yu, Ki Hun Park, Yumiko Maenaka, Kazuko Jochi, Gregg Inderhees
Proceedings Volume 6730, 67305M (2007) https://doi.org/10.1117/12.747163
KEYWORDS: Inspection, Extreme ultraviolet, Photomasks, Extreme ultraviolet lithography, Cameras, Deep ultraviolet, Lithography, Etching, Reticles, Fiber optic illuminators
SIGN IN TO:
  • View contact details
UPDATE YOUR PROFILE
Is this your profile? Update it now.
Sign into your SPIE.org account
Don’t have a profile and want one?
Create an account on SPIE.org
Advertisement
Advertisement
Back to Top