Dr. Katsuhiko Murakami Profile

Dr. Katsuhiko Murakami

Visiting Professor at Osaka Univ

SPIE Involvement:

Author

Publications (54)

Proceedings Article | 23 March 2012 Paper

Paper

Development of EUV lithography tool technologies at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Yoshio Kawabe, Takuro Ono, Noriaki Kandaka, Atsushi Yamazaki, Takashi Yamaguchi, Ryo Shibata, Masayuki Shiraishi

Proceedings Volume 8322, 832215 (2012) https://doi.org/10.1117/12.917676

KEYWORDS: Extreme ultraviolet lithography, Mirrors, Contamination, Extreme ultraviolet, Multilayers, Reflectivity, Carbon, Silicon, Apodization, Oxidation

Read Abstract +

Proceedings Article | 6 April 2011 Paper

Paper

A simple modeling of carbon contamination on EUV exposure tools based on contamination experiments with synchrotron source

M. Shiraishi, T. Yamaguchi, A. Yamazaki, N. Kandaka, T. Oshino, K. Murakami

Proceedings Volume 7969, 79690N (2011) https://doi.org/10.1117/12.879392

KEYWORDS: Contamination, Extreme ultraviolet, Oxygen, Photons, Carbon, Mirrors, Reflectivity, Protactinium, Molecules, Chemical species

Read Abstract +

Proceedings Article | 5 April 2011 Paper

Paper

Development of EUV lithography tools at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Kazushi Nomura, Hidemi Kawai, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo

Proceedings Volume 7969, 79690P (2011) https://doi.org/10.1117/12.879305

KEYWORDS: Extreme ultraviolet lithography, Extreme ultraviolet, Contamination, Mirrors, Carbon, Synchrotrons, Wavefront metrology, Oxygen, Optical design, Transmittance

Read Abstract +

Proceedings Article | 23 March 2010 Paper

Paper

Flare modeling and calculation on EUV optics

M. Shiraishi, T. Oshino, K. Murakami, H. Chiba

Proceedings Volume 7636, 763629 (2010) https://doi.org/10.1117/12.846472

KEYWORDS: Point spread functions, Mirrors, Semiconducting wafers, Light scattering, Multilayers, Extreme ultraviolet, Surface roughness, Wafer-level optics, Spatial frequencies, Reflectivity

Read Abstract +

Proceedings Article | 23 March 2010 Paper

Paper

Contamination study on EUV exposure tools using SAGA light source (SAGA-LS)

K. Murakami, T. Yamaguchi, A. Yamazaki, N. Kandaka, M. Shiraishi, S. Matsunari, T. Aoki, S. Kawata

Proceedings Volume 7636, 76361U (2010) https://doi.org/10.1117/12.846676

KEYWORDS: Contamination, Extreme ultraviolet lithography, Extreme ultraviolet, Reflectivity, Mirrors, Carbon, Synchrotrons, Alternate lighting of surfaces, Protactinium, Light sources

Read Abstract +

Proceedings Article | 20 March 2010 Paper

Paper

Nikon EUVL development progress update

Takaharu Miura, Katsuhiko Murakami, Hidemi Kawai, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo

Proceedings Volume 7636, 76361G (2010) https://doi.org/10.1117/12.846459

KEYWORDS: Extreme ultraviolet lithography, Projection systems, Mirrors, Extreme ultraviolet, Lithography, Light sources, Carbon, Reflectivity, Lithographic illumination, Coating

Read Abstract +

SPIE Journal Paper | 1 October 2009

Development progress of optics for extreme ultraviolet lithography at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Masayuki Shiraishi, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Jin Nishikawa

JM3, Vol. 8, Issue 04, 041507, (October 2009) https://doi.org/10.1117/12.10.1117/1.3238522

KEYWORDS: Projection systems, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Wavefronts, EUV optics, Resolution enhancement technologies, Multilayers, Reflectivity, Lithographic illumination

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Paper

Development progress of optics for EUVL at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Masayuki Shiraishi, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Jin Nishikawa

Proceedings Volume 7271, 72711Z (2009) https://doi.org/10.1117/12.813638

KEYWORDS: Projection systems, Mirrors, Extreme ultraviolet lithography, Extreme ultraviolet, Wavefronts, Eye, Resolution enhancement technologies, Reflectivity, Polishing, Aspheric optics

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Paper

Durability of capped multilayer mirrors for high volume manufacturing extreme ultraviolet lithography tool

S. Matsunari, Y. Kakutani, T. Aoki, S. Kawata, K. Murakami

Proceedings Volume 7271, 72713R (2009) https://doi.org/10.1117/12.813640

KEYWORDS: Mirrors, Reflectivity, Extreme ultraviolet, Ions, Silicon, Light sources, Extreme ultraviolet lithography, Metals, Titanium dioxide, Oxidation

Read Abstract +

Proceedings Article | 18 March 2009 Paper

Paper

Nikon EUVL development progress update

Takaharu Miura, Katsuhiko Murakami, Hidemi Kawai, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo

Proceedings Volume 7271, 72711X (2009) https://doi.org/10.1117/12.813384

KEYWORDS: Extreme ultraviolet lithography, Projection systems, Extreme ultraviolet, Carbon, Mirrors, Light sources, Wavefronts, Lithography, Photomasks, Contamination control

Read Abstract +

Proceedings Article | 4 December 2008 Paper

Paper

Development of EUV lithography tools at Nikon

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Kazushi Nomura, Hidemi Kawai, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo, Takaharu Miura

Proceedings Volume 7140, 71401C (2008) https://doi.org/10.1117/12.804706

KEYWORDS: Projection systems, Extreme ultraviolet lithography, Mirrors, Extreme ultraviolet, Wavefronts, Lithography, Polishing, Aspheric optics, Multilayers, Optical design

Read Abstract +

Proceedings Article | 26 March 2008 Paper

Paper

Nikon EUVL development progress update

Takaharu Miura, Katsuhiko Murakami, Kazuaki Suzuki, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo, Hidemi Kawai

Proceedings Volume 6921, 69210M (2008) https://doi.org/10.1117/12.772444

KEYWORDS: Extreme ultraviolet lithography, Projection systems, Reflectivity, Light sources, EUV optics, Photomasks, Extreme ultraviolet, Lithography, Reticles, Line edge roughness

Read Abstract +

Extreme Ultra Violet Lithography (EUVL) has been widely regarded as the lithography technology to succeed optical lithography. It is now considered as one of the most promising technologies below hp45nm node [1], following ArF immersion lithography considering trend of achievable process K1 factors. In this paper we would like to present our significant progress on the development of EUV exposure tool. There are several key important areas which should be developed to realize EUVL to be feasible, such as reflective mask, resist, and tool itself. The reflective mask features such characteristics as pellicle-less, ultra-smooth blank flatness and defect free. The resist should be of high sensitivity and small line edge roughness (LER) as well as fine resolution. EUV exposure tool itself consists of major modules such as EUV light source, projection optics, vacuum body, vacuum stages, and so on. Nikon has developed new polishing technologies such as ion-beam figuring and elastic emission machining, and new ultra high-precision interferometers for aspheric surface metrology. Our multi-layer coating technology has been also improved. High reflective Mo/Si multi layer coating has been successfully achieved and irradiation tests using synchrotron radiation have been conducted. Successful achievement of those developments enables us to produce full-field projection optics for EUVL process development tool called EUV1. The proto-type development of full-field projection optics has been successfully completed and its technical achievement has reflected into production optics. Preparation of complete set of production and metrology tools necessary for projection optics production was completed and all tools are now in full operation. Nikon has already developed dual pod reticle carrier for EUV1 tool. In parallel Nikon has been developing the same concept carrier for HVM in cooperation with Canon and Entegris. Regarding to EUV1 tool development, all modules of EUV1 such as full-field projection optics module, illumination optics module, vacuum body module, vacuum compatible reticle/wafer stage modules, reticle/wafer loader modules, EUV light source module have been completed. Nikon has already started EUV1 module installation process and the module level function and basic performance have been being checked. Nikon will complete module integration to achieve the first exposure result. Some development results will be shown which lead to confidence for realization of EUVL. Nikon also would like to announce that development of 1st generation production EUVL tool named EUV2 has been studied.

Proceedings Article | 21 March 2008 Paper

Paper

EUV wavefront measurement of six-mirror optics using EWMS

K. Sugisaki, M. Okada, K. Otaki, Y. Zhu, J. Kawakami, K. Murakami, C. Ouchi, M. Hasegawa, S. Kato, T. Hasegawa, H. Yokota, T. Honda, M. Niibe

Proceedings Volume 6921, 69212U (2008) https://doi.org/10.1117/12.772624

KEYWORDS: Wavefronts, Diffusion tensor imaging, Optical testing, Extreme ultraviolet, Projection systems, Mirrors, EUV optics, Wavefront metrology, Interferometers, Optics manufacturing

Read Abstract +

Proceedings Article | 21 March 2008 Paper

Paper

Phenomenological analysis of carbon deposition rate on the multilayer mirror

Takahiro Nakayama, Hiromitsu Takase, Shigeru Terashima, Takashi Sudo, Yutaka Watanabe, Yasuaki Fukuda, Katsuhiko Murakami, Shintaro Kawata, Takashi Aoki, Shuichi Matsunari, Yukinobu Kakutani, Masahito Niibe

Proceedings Volume 6921, 69213B (2008) https://doi.org/10.1117/12.769958

KEYWORDS: Carbon, Extreme ultraviolet, Mirrors, Protactinium, Extreme ultraviolet lithography, Multilayers, Bioalcohols, Chemical species, Coating, Oxidation

Read Abstract +

Proceedings Article | 20 March 2008 Paper

Paper

Development status of projection optics and illumination optics for EUV1

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Hiromitsu Iwata

Proceedings Volume 6921, 69210Q (2008) https://doi.org/10.1117/12.772435

KEYWORDS: Projection systems, Mirrors, Wavefronts, Polishing, Extreme ultraviolet, Point spread functions, Multilayers, Optical coatings, Extreme ultraviolet lithography, Reflection

Read Abstract +

Proceedings Article | 21 March 2007 Paper

Paper

Carbon deposition on multi-layer mirrors by extreme ultra violet ray irradiation

S. Matsunari, T. Aoki, K. Murakami, Y. Gomei, S. Terashima, H. Takase, M. Tanabe, Y. Watanabe, Y. Kakutani, M. Niibe, Y. Fukuda

Proceedings Volume 6517, 65172X (2007) https://doi.org/10.1117/12.710816

KEYWORDS: Carbon, Extreme ultraviolet, Mirrors, Gases, Natural surfaces, Reflectivity, Adsorption, Protactinium, Lithography, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 15 March 2007 Paper

Paper

Development of optics for EUV lithography tools

Katsuhiko Murakami, Tetsuya Oshino, Hiroyuki Kondo, Hiroshi Chiba, Hideki Komatsuda, Kazushi Nomura, Hiromitsu Iwata

Proceedings Volume 6517, 65170J (2007) https://doi.org/10.1117/12.711738

KEYWORDS: Mirrors, Projection systems, Coating, Polishing, Eye, Wavefronts, Extreme ultraviolet lithography, Multilayers, Aspheric optics, Wavefront metrology

Read Abstract +

Proceedings Article | 13 March 2007 Paper

Paper

Nikon EUVL development progress update

Takaharu Miura, Katsuhiko Murakami, Kazuaki Suzuki, Yoshiaki Kohama, Kenji Morita, Kazunari Hada, Yukiharu Ohkubo

Proceedings Volume 6517, 651707 (2007) https://doi.org/10.1117/12.711267

KEYWORDS: Extreme ultraviolet lithography, Projection systems, Reticles, Light sources, Reflectivity, Extreme ultraviolet, Photomasks, EUV optics, Wavefront sensors, Semiconducting wafers

Read Abstract +

Extreme Ultra Violet Lithography (EUVL) has been widely regarded as the lithography technology to succeed optical lithography. It is now considered as one of the most promising technologies below hp45nm node [1], following ArF immersion lithography considering trend of achievable process K1 factors shown in Fig. 1. In this paper we would like to present significant progress on the development of EUV exposure tool. There are several key important areas which should be developed to realize EUVL to be feasible such as reflective mask, resist, and tool itself. The reflective mask features such characteristics as pellicle-less, ultra-smooth blank flatness and defect free. The resist should be of high sensitivity and small line edge roughness (LER) as well as fine resolution. EUV exposure tool itself consists of major modules such as EUV light source, projection optics, vacuum body, vacuum stages, and so on. As far as EUVL optics development is concerned, through the development of high-NA small-field EUV exposure system (HiNA) in conjunction with EUVA (Extreme Ultraviolet Lithography System Development Association) projects, we have developed new polishing technologies such as ion-beam figuring and elastic emission machining, and new ultra high-precision interferometers for aspheric surface metrology. Wave front sensor system has been also developed partly in EUVA project. A new wave front sensor system which can be used for evaluating the projection optics with EUV light has already been installed in New SUBARU synchrotron facility in University of Hyogo. Our multi-layer coating technology has been also improved. High reflective Mo/Si multi layer coating has been successfully achieved and irradiation tests using synchrotron radiation have been conducted [8]. Successful achievement of those developments enables us to produce full-field projection optics for EUVL process development tool called EUV1. Proto-type development of full-field projection optics has been successfully completed and evaluated to be of enough performance. Preparation of complete set of production and metrology tools necessary for projection optics production was completed and all tools are now in full operation. Nikon has studied reticle protection method and developed Dual Pod Concept in cooperation with Canon. Nikon also has developed its own reticle cover to be implemented in EUV1 tool. Nikon has completed almost all module fabrication such as full-field projection optics module, illumination optics module, vacuum body module, vacuum compatible reticle/wafer stage modules, reticle/wafer loader modules, and EUV light source module. Nikon has already got into module integration production process to meet EUV1 development schedule. Nikon announced to start EUV1 tool installation in 1st half of 2007 and has been proceeding it on schedule. Nikon also would like to announce that development of 1st generation production EUVL tool dubbed EUV2 is now considered and that system concept design is under way.

Proceedings Article | 24 March 2006 Paper

Paper

New contamination experimental equipment in the NewSUBARU and evaluation of Si-capped multilayer mirrors using it

Masahito Niibe, Yukinobu Kakutani, Shigeru Terashima, Hiromitsu Takase, Yoshio Gomei, Shuichi Matsunari, Takashi Aoki, Katsuhiko Murakami, Yasuaki Fukuda

Proceedings Volume 6151, 615134 (2006) https://doi.org/10.1117/12.656845

KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Contamination, Extreme ultraviolet lithography, Absorption, Carbon, Protactinium, Oxygen, In situ metrology

Read Abstract +

Proceedings Article | 24 March 2006 Paper

Paper

Study of ruthenium-capped multilayer mirror for EUV irradiation durability

Hiromitsu Takase, Shigeru Terashima, Yoshio Gomei, Masayuki Tanabe, Yutaka Watanabe, Takashi Aoki, Katsuhiko Murakami, Shuichi Matsunari, Masahito Niibe, Yukinobu Kakutani

Proceedings Volume 6151, 615135 (2006) https://doi.org/10.1117/12.657089

KEYWORDS: Silicon, Extreme ultraviolet, Ruthenium, Diffusion, Reflectivity, Protactinium, Extreme ultraviolet lithography, Oxides, Mirrors, Oxidation

Read Abstract +

Proceedings Article | 24 March 2006 Paper

Paper

EUV wavefront metrology at EUVA

Chidane Ouchi, Seima Kato, Masanobu Hasegawa, Takayuki Hasegawa, Hideo Yokota, Katsumi Sugisaki, Masashi Okada, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 6152, 61522O (2006) https://doi.org/10.1117/12.656039

KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Diffraction, EUV optics, Projection systems, Extreme ultraviolet lithography, Diffraction gratings, CCD cameras, Mirrors

Read Abstract +

Proceedings Article | 23 March 2006 Paper

Paper

Effect of residual gas atmosphere on lifetime of Ru-capped EUVL projection optics mirror

Yukinobu Kakutani, Masahito Niibe, Yoshio Gomei, Hiromitsu Takase, Shigeru Terashima, Shuichi Matsunari, Takashi Aoki, Katsuhiko Murakami, Yasuaki Fukuda

Proceedings Volume 6151, 61510H (2006) https://doi.org/10.1117/12.656240

KEYWORDS: Reflectivity, Extreme ultraviolet, Mirrors, Protactinium, Extreme ultraviolet lithography, Projection systems, Atmospheric optics, Carbon, Lithography, Oxidation

Read Abstract +

Proceedings Article | 10 March 2006 Paper

Paper

Nikon EUVL development progress summary

Takaharu Miura, Katsuhiko Murakami, Kazuaki Suzuki, Yoshiaki Kohama, Yukiharu Ohkubo, Takeshi Asami

Proceedings Volume 6151, 615105 (2006) https://doi.org/10.1117/12.656243

KEYWORDS: Extreme ultraviolet lithography, Reticles, Mirrors, Projection systems, Coating, Reflectivity, Polishing, Particles, EUV optics, Surface finishing

Read Abstract +

Extreme Ultra Violet Lithography (EUVL) is considered as the most promising technology below hp45nm node, following ArF immersion lithography. In this paper we would like to present significant progress on the development of EUV exposure tool with recent encouraging data of mirror polishing accuracy and evaluation results of Nikon reticle protection concept. EUV exposure tool consists of major important modules such as EUV light source, projection optics, and so on. As far as EUVL optics development is concerned, through the development of high-NA small-field EUV exposure system (HiNA), our mirror polishing and metrology technologies of aspheric mirror surface and multi-layer coating technology have been remarkably improved and enable us to fabricate high-precision aspheric mirrors which meet the specification for EUV pre-production tools called EUV1. In the EUVA (Extreme Ultraviolet Lithography System Development Association) project, we have developed new polishing technologies such as ion-beam figuring and new high-precision interferometers for aspheric surface metrology. Wave front sensor systems have been also developed partly in EUVA project. Installation of a new wave front sensor system which can be used for evaluating the full-field projection optics with EUV light has already been started in New SUBARU synchrotron facility in University of Hyogo. EUV1 tool system design and its detailed design of all modules such as full-field projection optics module, illumination optics module, vacuum body module, vacuum compatible reticle/wafer stage modules, reticle/wafer loader modules have been completed. The results of development and prototyping of major modules such as vacuum stage modules and vacuum body module have been reflected in the actual tool design. Nikon has been also heavily involved in the infrastructure development such as mask handling development. In order to meet industry demands, Nikon has been already getting into EUV1 module fabrication phase. Nikon announces that EUV1 tool is scheduled to be delivered in 1^st half of 2007.

Proceedings Article | 17 September 2005 Paper

Paper

Comparisons between EUV at-wavelength metrological methods

Katsumi Sugisaki, Masashi Okada, Yucong Zhu, Katsura Otaki, Zhiqiang Liu, Jun Kawakami, Mikihiko Ishii, Jun Saito, Katsuhiko Murakami, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Hideo Yokota, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5921, 59210D (2005) https://doi.org/10.1117/12.616676

KEYWORDS: Wavefronts, Optical testing, Extreme ultraviolet, Metrology, Diffusion tensor imaging, Charge-coupled devices, EUV optics, Interferometers, Shearing interferometers, Diffraction

Read Abstract +

Proceedings Article | 10 May 2005 Paper

Paper

Double-grating lateral shearing interferometer for EUV optics at-wavelength measurement

Zhiqiang Liu, Masashi Okada, Katsumi Sugisaki, Mikihiko Ishii, Yucong Zhu, Katsura Ohtaki, Jun Saito, Akiyoshi Suzuki, Masanobu Hasegawa, Chidane Ouchi, Seima Kato, Masahito Niibe, Katsuhiko Murakami

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.599456

KEYWORDS: Diffraction, Diffraction gratings, Calibration, Shearing interferometers, Wavefronts, Light sources, Interferometers, Monochromatic aberrations, Extreme ultraviolet lithography, EUV optics

Read Abstract +

Proceedings Article | 10 May 2005 Paper

Paper

Experimental comparison of absolute PDI and lateral shearing interferometer

Yucong Zhu, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Zhiqian Liu, Mikihiko Ishii, Jun Kawakami, Jun Saito, Katsuhiko Murakami, Chidane Ouchi, Masanobu Hasegawa, Seima Kato, Takayuki Hasegawa, Akiyoshi Suzuki, Masahito Niibe

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.600274

KEYWORDS: Wavefronts, Shearing interferometers, Diffraction gratings, Extreme ultraviolet lithography, Extreme ultraviolet, Charge-coupled devices, Diffraction, Interferometers, Photomasks, Monochromatic aberrations

Read Abstract +

Proceedings Article | 6 May 2005 Paper

Paper

Comparison of EUV interferometry methods in EUVA project

Seima Kato, Chidane Ouchi, Masanobu Hasegawa, Akiyoshi Suzuki, Takayuki Hasegawa, Katsumi Sugisaki, Masashi Okada, Yucong Zhu, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.600468

KEYWORDS: Wavefronts, Optical testing, Diffraction, Charge-coupled devices, Extreme ultraviolet, Monochromatic aberrations, Interferometers, Phase shifts, Calibration, Diffraction gratings

Read Abstract +

Proceedings Article | 6 May 2005 Paper

Paper

Lithographic performance of high-numerical-aperture (NA=0.3) EUV small-field exposure tool (HINA)

H. Oizumi, Y. Tanaka, F. Kumasaka, I. Nishiyama, H. Kondo, M. Shiraishi, T. Oshino, K. Sugisaki, K. Murakami

Proceedings Volume 5751, (2005) https://doi.org/10.1117/12.599435

KEYWORDS: Extreme ultraviolet lithography, Lithography, Photomasks, Projection systems, Mirrors, Lithographic illumination, Light sources, Printing, Extreme ultraviolet, Spherical lenses

Read Abstract +

Proceedings Article | 18 October 2004 Paper

Paper

Fabrication of aspherical mirrors for EUV projection optics set-3 of HiNA

Tetsuya Oshino, Shin-ichi Takahashi, Takahiro Yamamoto, Tatsuro Miyoshi, Masayuki Shiraishi, Takaharu Komiya, Noriaki Kandaka, Hiroyuki Kondo, Kiyoto Mashima, Kazushi Nomura, Katsuhiko Murakami, Hiroaki Oizumi, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.559210

KEYWORDS: Mirrors, Wavefronts, Projection systems, Polishing, Semiconducting wafers, Extreme ultraviolet lithography, Spatial frequencies, Photomasks, Coating, Mirror mounts

Read Abstract +

Proceedings Article | 18 October 2004 Paper

Paper

Recent progress of EUV wavefront metrology in EUVA

Masanobu Hasegawa, Chidane Ouchi, Takayuki Hasegawa, Seima Kato, Akinori Ohkubo, Akiyoshi Suzuki, Katsumi Sugisaki, Masashi Okada, Katsura Otaki, Katsuhiko Murakami, Jun Saito, Masahito Niibe, Mitsuo Takeda

Proceedings Volume 5533, (2004) https://doi.org/10.1117/12.562431

KEYWORDS: Wavefronts, Extreme ultraviolet, Optical testing, Diffraction, Wavefront metrology, Interferometers, Shearing interferometers, Diffusion tensor imaging, Spherical lenses, Diffraction gratings

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Paper

Low-stress and high-reflectivity molybdenum/silicon multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography

Masayuki Shiraishi, Noriaki Kandaka, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536075

KEYWORDS: Multilayers, Reflectivity, Sputter deposition, Molybdenum, Extreme ultraviolet, Silicon, Extreme ultraviolet lithography, Surface roughness, Xenon, Microcrystalline materials

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Paper

Fabrication of aspherical mirrors for HiNA (high numerical aperture EUV exposure tool) set-3 projection optics

Tetsuya Oshino, Takahiro Yamamoto, Tatsuro Miyoshi, Masayuki Shiraishi, Takaharu Komiya, Noriaki Kandaka, Hiroyuki Kondo, Kiyoto Mashima, Kazushi Nomura, Katsuhiko Murakami, Hiroaki Oizumi, Isa Nishiyama, Shinji Okazaki

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.562365

KEYWORDS: Mirrors, Wavefronts, Projection systems, Spatial frequencies, Semiconducting wafers, Polishing, Extreme ultraviolet lithography, Photomasks, Mirror mounts, Reflectivity

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Paper

Evaluation of contamination deposition on pinholes used in EUV at-wavelength PDI

Katsumi Sugisaki, Masanobu Hasegawa, Seima Kato, Chidane Ouchi, Jun Saito, Masahito Niibe, Akiyoshi Suzuki, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537344

KEYWORDS: Oxygen, Contamination, Tantalum, Extreme ultraviolet, Nickel, Gold, Carbon, Adsorption, Projection systems, Wavefronts

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Paper

Lateral shearing interferometer for EUVL: theoretical analysis and experiment

Yucong Zhu, Katsumi Sugisaki, Chidane Ouchi, Masanobu Hasegawa, Masahito Niibe, Akiyoshi Suzuki, Katsuhiko Murakami

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.537331

KEYWORDS: Wavefronts, Charge-coupled devices, Extreme ultraviolet lithography, Shearing interferometers, Phase shifts, Diffraction gratings, Projection systems, Algorithm development, Diffraction, Extreme ultraviolet

Read Abstract +

Proceedings Article | 20 May 2004 Paper

Paper

EUV wavefront metrology system in EUVA

Takayuki Hasegawa, Chidane Ouchi, Masanobu Hasegawa, Seima Kato, Akiyoshi Suzuki, Katsumi Sugisaki, Katsuhiko Murakami, Jun Saito, Masahito Niibe

Proceedings Volume 5374, (2004) https://doi.org/10.1117/12.536327

KEYWORDS: Extreme ultraviolet, Wavefronts, Monochromatic aberrations, Wavefront metrology, Photomasks, Metrology, Nickel, Synchrotron technology, Interferometers, Spherical lenses

Read Abstract +

Proceedings Article | 13 January 2004 Paper

Paper

Development of Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for EUV lithography

Katsuhiko Murakami, Masayuki Shiraishi

Proceedings Volume 5193, (2004) https://doi.org/10.1117/12.508116

KEYWORDS: Multilayers, Reflectivity, Sputter deposition, Molybdenum, Silicon, Extreme ultraviolet, Xenon, Interfaces, Extreme ultraviolet lithography, Argon

Read Abstract +

Proceedings Article | 13 January 2004 Paper

Paper

Rigorous wavefront analysis of the visible-light point diffraction interferometer for EUVL

Katsura Otaki, Yucong Zhu, Mikihiko Ishii, Shigeru Nakayama, Katsuhiko Murakami, Takashi Gemma

Proceedings Volume 5193, (2004) https://doi.org/10.1117/12.507046

KEYWORDS: Wavefronts, Mirrors, Point diffraction interferometers, Extreme ultraviolet lithography, Diffraction, Error analysis, Projection systems, Numerical simulations, Wavefront analysis, Computer simulations

Read Abstract +

Proceedings Article | 16 June 2003 Paper

Paper

Development of illumination optics and projection optics for high-NA EUV exposure tool (HiNA)

Tetsuya Oshino, Masayuki Shiraishi, Noriaki Kandaka, Katsumi Sugisaki, Hiroyuki Kondo, Kazuya Ota, K. Mashima, Katsuhiko Murakami, Hiroaki Oizumi, Iwao Nishiyama, Shinji Okazaki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484936

KEYWORDS: Mirrors, Projection systems, Wavefronts, Extreme ultraviolet lithography, Spherical lenses, Metals, Mirror mounts, Optical components, Lithographic illumination, Photography

Read Abstract +

Proceedings Article | 16 June 2003 Paper

Paper

Mo/Si multilayers deposited by low-pressure rotary magnet cathode sputtering for extreme-ultraviolet lithography

Masayuki Shiraishi, Noriaki Kandaka, Katsuhiko Murakami

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484436

KEYWORDS: Multilayers, Reflectivity, Sputter deposition, Molybdenum, Extreme ultraviolet, Xenon, Silicon, Argon, Extreme ultraviolet lithography, Ions

Read Abstract +

Proceedings Article | 16 June 2003 Paper

Paper

Development of an experimental EUV interferometer for benchmarking several EUV wavefront metrology schemes

Katsuhiko Murakami, Jun Saito, Kazuya Ota, Hiroyuki Kondo, Mikihiko Ishii, Jun Kawakami, Tetsuya Oshino, Katsumi Sugisaki, Yucong Zhu, Masanobu Hasegawa, Yoshiyuki Sekine, Seiji Takeuchi, Chidane Ouchi, Osamu Kakuchi, Yutaka Watanabe, Takayuki Hasegawa, Shinichi Hara, Akiyoshi Suzuki

Proceedings Volume 5037, (2003) https://doi.org/10.1117/12.484935

KEYWORDS: Extreme ultraviolet, Wavefront metrology, Wavefronts, Optical testing, Interferometers, Shearing interferometers, Diffraction, Mirrors, Extreme ultraviolet lithography, Diffraction gratings

Read Abstract +

Proceedings Article | 1 July 2002 Paper

Paper

Effect of argon and non-argon ion impingement on the stress reduction of multilayers for extreme-ultraviolet lithography

Masayuki Shiraishi, Wakana Ishiyama, Noriaki Kandaka, Tetsuya Oshino, Katsuhiko Murakami

Proceedings Volume 4688, (2002) https://doi.org/10.1117/12.472329

KEYWORDS: Molybdenum, Silicon, Argon, Chemical species, Sputter deposition, Ions, Oxides, Ion beams, Oxygen, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 20 December 2001 Paper

Paper

Stress control of Mo/Si-based multilayer coatings deposited by ion-beam sputtering

Katsuhiko Murakami, Masayuki Shiraishi

Proceedings Volume 4506, (2001) https://doi.org/10.1117/12.450945

KEYWORDS: Molybdenum, Multilayers, Silicon, Ion beams, Sputter deposition, Polishing, Ions, Reflectivity, Ruthenium, Interfaces

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Paper

Development of an EUV reflectometer using a single line emission from a laser-plasma x-ray source

Noriaki Kandaka, Hiroyuki Kondo, Katsumi Sugisaki, Tetsuya Oshino, Masayuki Shiraishi, Wakana Ishiyama, Katsuhiko Murakami

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436714

KEYWORDS: Extreme ultraviolet, Mirrors, Reflectivity, Carbon dioxide lasers, Reflectometry, Multilayers, Carbon dioxide, Interfaces, Plasma, Beryllium

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Paper

Feasibility study of EUV scanners

Kazuya Ota, Katsuhiko Murakami, Hiroyuki Kondo, Tetsuya Oshino, Katsumi Sugisaki, Hideki Komatsuda

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436704

KEYWORDS: Semiconducting wafers, Scanners, Mirrors, Reticles, Extreme ultraviolet lithography, Optical alignment, Sensors, Projection systems, Deep ultraviolet, Extreme ultraviolet

Read Abstract +

Proceedings Article | 20 August 2001 Paper

Paper

In-situ stress measurement of molybdenum/silicon multilayers and low-stress multilayers for extreme-ultraviolet lithography

Masayuki Shiraishi, Wakana Ishiyama, Noriaki Kandaka, Tetsuya Oshino, Katsuhiko Murakami

Proceedings Volume 4343, (2001) https://doi.org/10.1117/12.436713

KEYWORDS: Molybdenum, Silicon, Capacitance, Capacitors, Multilayers, Electrodes, Sputter deposition, Extreme ultraviolet lithography, Ion beams, Semiconducting wafers

Read Abstract +

Proceedings Article | 2 November 2000 Paper

Paper

Development of an EUV reflectometer using a laser plasma x-ray source

Hiroyuki Kondo, Noriaki Kandaka, Katsumi Sugisaki, Tetsuya Oshino, Masayuki Shiraishi, Wakana Ishiyama, Katsuhiko Murakami

Proceedings Volume 4144, (2000) https://doi.org/10.1117/12.405906

KEYWORDS: Reflectometry, Mirrors, Reflectivity, X-rays, X-ray sources, Plasma, Carbon dioxide, Multilayers, Extreme ultraviolet, Carbon dioxide lasers

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Paper

Assembly and alignment of three-aspherical-mirror optics for extreme ultraviolet projection lithography

Katsumi Sugisaki, Tetsuya Oshino, Katsuhiko Murakami, Takeo Watanabe, Hiroo Kinoshita, Atsushi Miyafuji, Shigeo Irie, Shigeru Shirayone

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390114

KEYWORDS: Mirrors, Optical alignment, Extreme ultraviolet, Projection systems, Extreme ultraviolet lithography, Wavefronts, Tolerancing, Assembly tolerances, Monochromatic aberrations, Multilayers

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Paper

Development for the alignment procedure of three-aspherical mirror optics

Shigeo Irie, Takeo Watanabe, Hiroo Kinoshita, Atsushi Miyafuji, Katsumi Sugisaki, Tetsuya Oshino, Katsuhiko Murakami

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390122

KEYWORDS: Mirrors, Alignment procedures, NOx, Tolerancing, Extreme ultraviolet lithography, Optical alignment, Interferometers, Ray tracing, Monochromatic aberrations, Geometrical optics

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Paper

Recent advances of three-aspherical-mirror system for EUVL

Hiroo Kinoshita, Takeo Watanabe, Yanqiu Li, Atsushi Miyafuji, Tetsuya Oshino, Katsumi Sugisaki, Katsuhiko Murakami, Shigeo Irie, Shigeru Shirayone, Shinji Okazaki

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390091

KEYWORDS: Mirrors, Extreme ultraviolet lithography, Interferometers, Multilayers, Optical alignment, Phase shifts, Reflectivity, Wavefronts, Coating, Imaging systems

Read Abstract +

Proceedings Article | 21 July 2000 Paper

Paper

Stress reduction of molybdenum/silicon multilayers deposited by ion-beam sputtering

Masayuki Shiraishi, Wakana Ishiyama, Tetsuya Oshino, Katsuhiko Murakami

Proceedings Volume 3997, (2000) https://doi.org/10.1117/12.390102

KEYWORDS: Multilayers, Ion beams, Polishing, Interfaces, Sputter deposition, Reflectivity, Mirrors, Molybdenum, Argon, Extreme ultraviolet lithography

Read Abstract +

Proceedings Article | 5 June 1998 Paper

Paper

Three-aspherical-mirror system for EUV lithography

Hiroo Kinoshita, Takeo Watanabe, Masahito Niibe, Masaaki Ito, H. Oizumi, Hiromasa Yamanashi, Katsuhiko Murakami, Tetsuya Oshino, Yuriy Platonov, Nicola Grupido

Proceedings Volume 3331, (1998) https://doi.org/10.1117/12.309580

KEYWORDS: Semiconducting wafers, Wafer-level optics, Photomasks, Optical alignment, Mirrors, Extreme ultraviolet lithography, Synchrotron radiation, Tolerancing, Assembly tolerances, Optical design

Read Abstract +

Proceedings Article | 11 July 1997 Paper

Paper

Development of multilayer mirrors for the XUV Doppler telescope

Shin'ichi Nagata, Hirohisa Hara, Taro Sakao, Toshifumi Shimizu, Saku Tsuneta, Tsuyoshi Yoshida, Wakana Ishiyama, Katsuhiko Murakami, Tetsuya Oshino

Proceedings Volume 3113, (1997) https://doi.org/10.1117/12.278847

KEYWORDS: Mirrors, Reflectivity, Multilayers, Extreme ultraviolet, Doppler effect, Photomasks, Telescopes, Plasma, Silicon, Space telescopes

Read Abstract +

Proceedings Article | 25 November 1996 Paper

Paper

Japanese sounding rocket experiment with the solar XUV Doppler telescope

Taro Sakao, Saku Tsuneta, Hirohisa Hara, Ryouhei Kano, Tsuyoshi Yoshida, Shin'ichi Nagata, Toshifumi Shimizu, Takeo Kosugi, Katsuhiko Murakami, Wakuna Wasa, Masao Inoue, Katsuhiro Miura, Koji Taguchi, Kazuo Tanimoto

Proceedings Volume 2804, (1996) https://doi.org/10.1117/12.259721

KEYWORDS: Mirrors, Telescopes, Space telescopes, Extreme ultraviolet, Rockets, Charge-coupled devices, Multilayers, Doppler effect, Solar processes, Coronagraphy

Read Abstract +

Proceedings Article | 21 January 1993 Paper

Paper

Characterization of molybdenum/silicon multilayers deposited by ion beam sputtering and rf magnetron sputtering

Katsuhiko Murakami, Hiroshi Nakamura, Tetsuya Oshino, Masayuki Ohtani, Hiroshi Nagata

Proceedings Volume 1742, (1993) https://doi.org/10.1117/12.140572

KEYWORDS: Silicon, Reflectivity, Molybdenum, Sputter deposition, X-rays, Ion beams, Interfaces, Transmission electron microscopy, Chemical species, Analytical research

Read Abstract +

Showing 5 of 54 publications

Conference Committee Involvement (3)

Extreme Ultraviolet (EUV) Lithography IV

25 February 2013 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography III

13 February 2012 | San Jose, California, United States

Extreme Ultraviolet (EUV) Lithography II

28 February 2011 | San Jose, California, United States

SIGN IN TO:

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Advertisement

Advertisement