Ms. Ju-Mi Bang Profile

Ju-Mi Bang

at SAMSUNG Electronics Co Ltd

SPIE Involvement:

Author

Publications (3)

Proceedings Article | 9 July 2015 Paper

Development of high-transmittance phase-shifting mask for ArF immersion lithography

Won-suk Ahn, Hwan-Seok Seo, Ju-Mi Bang, Ji-Young Kim, Jae-Min Song, Byoung-Hoon Seung, Hee-Bom Kim, Chan-Uk Jeon

Proceedings Volume 9658, 965808 (2015) https://doi.org/10.1117/12.2203239

KEYWORDS: Photomasks, Chromium, Etching, Transmittance, Semiconducting wafers, Nanoimprint lithography, Phase shifts, Image processing, Immersion lithography, Optical lithography

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Proceedings Article | 14 November 2007 Paper

Full-chip-based subresolution assist features correction for mask manufacturing

Ju-Mi Bang, Issei Masumoto, Min-Kyu Ji, Sung-Hoon Jang, Isao Aburatani, Ji-Hyun Choi, Sang-Gyun Woo, Han-Ku Cho

Proceedings Volume 6730, 67302F (2007) https://doi.org/10.1117/12.746349

KEYWORDS: SRAF, Photomasks, Critical dimension metrology, Manufacturing, Printing, Lithography, Inspection, Mask making, Control systems, Semiconductors

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Proceedings Article | 5 November 2005 Paper

Optimized distributed computing environment for mask data preparation

Byoung-Sup Ahn, Ju-Mi Bang, Min-Kyu Ji, Sun Kang, Sung-Hoon Jang, Yo-Han Choi, Won-Tai Ki, Seong-Woon Choi, Woo-Sung Han

Proceedings Volume 5992, 599214 (2005) https://doi.org/10.1117/12.632427

KEYWORDS: Optical proximity correction, Computing systems, Photomasks, Distributed computing, Manufacturing, Resolution enhancement technologies, Databases, Data conversion, Data storage, Silver

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