Mr. Byounghoon Seung Profile

Byounghoon Seung

at S&S Tech Co Ltd

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Author

Publications (5)

Proceedings Article | 22 November 2023 Presentation

Development and performance of high-power EUV pellicles for HVM

Prashant Purwar, Donghoi Kim, Munsu Choi, Chulkyun Park, Byounghoon Seung, Yongdae Kim, Cheol Shin, Juhee Hong

Proceedings Volume PC12750, PC127500L (2023) https://doi.org/10.1117/12.2685949

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Photomasks, Transmittance, Thin films, Semiconductors, Particles, Lithography, Industry

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Proceedings Article | 11 November 2022 Presentation

Full size EUV pellicle development for high power

Juhee Hong, Haena Lee, Yesong Kim, Donghoi Kim, Munsu Choi, Seungjo Lee, Byeong Sung Yu, Chulkyun Park, Min Wook Jung, Chang Hoon Lee, Byoung Hoon Seung, Cheol Shin

Proceedings Volume PC12292, PC122920E (2022) https://doi.org/10.1117/12.2641755

KEYWORDS: Pellicles, Extreme ultraviolet lithography, Extreme ultraviolet, Transmittance, Yield improvement, Spectroscopy, Semiconductors, Semiconducting wafers, Photomasks, Particles

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Proceedings Article | 9 July 2015 Paper

Development of high-transmittance phase-shifting mask for ArF immersion lithography

Won-suk Ahn, Hwan-Seok Seo, Ju-Mi Bang, Ji-Young Kim, Jae-Min Song, Byoung-Hoon Seung, Hee-Bom Kim, Chan-Uk Jeon

Proceedings Volume 9658, 965808 (2015) https://doi.org/10.1117/12.2203239

KEYWORDS: Photomasks, Chromium, Etching, Transmittance, Semiconducting wafers, Nanoimprint lithography, Phase shifts, Image processing, Immersion lithography, Optical lithography

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Proceedings Article | 14 October 2011 Paper

30nm full field quartz template replicated from Si master for FLASH active layer NIL

Duhyun Lee, Byung-Kyu Lee, Woong Ko, Jae-Kwan Kim, Kiyeon Yang, Byounghoon Seung, Ilyong Jang, Mun Ja Kim, Byunggook Kim, ChangMin Park, Jeongho Yeo, Changyoul Moon

Proceedings Volume 8166, 81661U (2011) https://doi.org/10.1117/12.898747

KEYWORDS: Quartz, Silicon, Etching, Nanoimprint lithography, Chromium, Oxides, Photomasks, Line width roughness, Electron beam lithography, Semiconducting wafers

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Proceedings Article | 11 May 2009 Paper

The novel plasma etching process for defect reduction in photomask fabrication

Ji-Hyun Lee, Il-Yong Jang, Yu Suk Jeong, Byounghoon Seung, Seong-Yong Moon, Sang-Gyun Woo, Han Ku Cho

Proceedings Volume 7379, 737906 (2009) https://doi.org/10.1117/12.824247

KEYWORDS: Etching, Chromium, Plasma, Fluorine, Particles, Chlorine, Dielectrics, Plasma etching, Photomasks, Aluminum

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