Mr. John K. Higley Profile

John K. Higley

at Entegris Inc

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 28 May 2004 Paper

Airborne molecular contamination control in the micromirror SLM-based deep ultraviolet DUV SIGMA7300 laser pattern generator

Mats Ekberg, Hans Fosshaug, Thomas Ostrom, Peter Bjornangen, Thomas Utterback, Per-Uno Skotte, John Higley, David Ruede, Oleg Kishkovich

Proceedings Volume 5377, (2004) https://doi.org/10.1117/12.535833

KEYWORDS: Photomasks, Deep ultraviolet, Molecules, Chemical analysis, Climatology, Molecular lasers, Spatial light modulators, Contamination, Optical components, Contamination control

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Proceedings Article | 1 August 2002 Paper

Molecular contamination control in photomask/reticle manufacturing using chemically amplified resists (CAR) lessons from wafer lithography

James Hudzik, Oleg Kishkovich, John Higley

Proceedings Volume 4754, (2002) https://doi.org/10.1117/12.476949

KEYWORDS: Contamination, Photomasks, Lithography, Manufacturing, Photoresist materials, Semiconducting wafers, Environmental sensing, Deep ultraviolet, Contamination control, Chemically amplified resists

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Proceedings Article | 14 June 1999 Paper

Real-time methodologies for monitoring airborne molecular contamination in modern DUV photolithography facilities

Oleg Kishkovich, Devon Kinkead, John Higley, Robert Kirwin, John Piatt

Proceedings Volume 3677, (1999) https://doi.org/10.1117/12.350824

KEYWORDS: Calibration, Contamination, Deep ultraviolet, Ions, Semiconducting wafers, Chemical analysis, Manufacturing, Environmental monitoring, Molecules, Optical lithography

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Proceedings Article | 29 June 1998 Paper

Real-time amine monitoring and its correlation to critical dimension control of chemically amplified resists for sub-0.25-um geometries

Will Conley, Carl Babcock, John Lilygren, Clifford Sandstrom, Nigel Farrar, John Piatt, Devon Kinkead, William Goodwin, Oleg Kishkovich, John Higley, Phil Cate

Proceedings Volume 3333, (1998) https://doi.org/10.1117/12.312479

KEYWORDS: Critical dimension metrology, Contamination, Photoresist materials, Chemically amplified resists, Manufacturing, Phase modulation, Calibration, Deep ultraviolet, Semiconducting wafers, Head-mounted displays

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