Dr. Jie Li Profile

Dr. Jie Li

at Onto Innovation Inc

SPIE Involvement:

Author

Publications (22)

Proceedings Article | 27 April 2023 Presentation + Paper

Presentation + Paper

Characterization of asymmetries in 3D NAND memory devices

Jie Li, Shashank Srivastava, Joyce Li, Zhuo Chen, Petar Žuvela, Boyang Chor, Jinyu Deng, Haodong Qiu, YaChing Chang, Sadao Takabayashi, Xadric Yiew, Bo Hui Ng, Rohit Kothari, Dan Engelhard, Han Yang Tan

Proceedings Volume 12496, 124960F (2023) https://doi.org/10.1117/12.2658148

KEYWORDS: Education and training, Semiconducting wafers, Overlay metrology, Critical dimension metrology, Mueller matrices, 3D metrology, Data modeling, 3D modeling, Machine learning, Spectral response

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Proceedings Article | 22 February 2021 Presentation + Paper

Presentation + Paper

Methods to overcome limited labeled data sets in machine learning-based optical critical dimension metrology

Franklin Wong, Yudong Hao, Wenmei Ming, Petar Žuvela, Peifen Teh, Jingsheng Shi, Jie Li

Proceedings Volume 11611, 116111P (2021) https://doi.org/10.1117/12.2583774

KEYWORDS: Metrology, Machine learning, Signal processing, Semiconductors, Data modeling, Time metrology, Data processing

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Proceedings Article | 22 February 2021 Presentation + Paper

Presentation + Paper

X-ray critical dimension metrology solution for high aspect ratio semiconductor structures

Matthew Wormington, Adam Ginsburg, Israel Reichental, Alex Dikopoltsev, Alex Krokhmal, Yuri Vinshtein, Paul Ryan, Rahul Korlahalli, Franklin Wong, Silvio Rabello, Yang Song, Jie Li

Proceedings Volume 11611, 116110W (2021) https://doi.org/10.1117/12.2583966

KEYWORDS: X-rays, Semiconductors, Critical dimension metrology, Semiconducting wafers, Metrology, X-ray characterization, Scattering, Etching, Capacitors, 3D metrology

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SPIE Journal Paper | 16 October 2014

Scatterometry performance enhancement by holistic approach

Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsehpour, Holger Schroder, John Piggot

JM3, Vol. 13, Issue 04, 041406, (October 2014) https://doi.org/10.1117/12.10.1117/1.JMM.13.4.041406

KEYWORDS: Critical dimension metrology, Scatterometry, Line edge roughness, Reactive ion etching, Metrology, Scatter measurement, Semiconducting wafers, Optics manufacturing, Magnetism, Etching

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Proceedings Article | 2 April 2014 Paper

Paper

Scatterometry performance improvement by parameter and spectrum feed-forward

Jie Li, Shahin Zangooie, Karthik Boinapally, Xi Zou, Jiangtao Hu, Zhuan Liu, Sanjay Yedur, Peter Wilkens, Avraham Ver, Robert Cohen, Babak Khamsepour

Proceedings Volume 9050, 90502T (2014) https://doi.org/10.1117/12.2046639

KEYWORDS: Reactive ion etching, Scatterometry, Critical dimension metrology, Metrology, Magnetism, Manufacturing, Photomasks, Etching, Measurement devices, Semiconducting wafers

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Proceedings Article | 2 April 2014 Paper

Paper

Enhanced optical CD metrology by hybridization and azimuthal scatterometry

Shahin Zangooie, Jie Li, Karthik Boinapally, Peter Wilkens, Avraham Ver, Babak Khamsepour, Holger Schroder, John Piggot, Sanjay Yedur, Zhuan Liu, Jiangtao Hu

Proceedings Volume 9050, 90501G (2014) https://doi.org/10.1117/12.2046165

KEYWORDS: Scatterometry, Critical dimension metrology, Line edge roughness, Scatter measurement, Semiconducting wafers, Metrology, Reactive ion etching, Manufacturing, Ellipsometry, Data modeling

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Proceedings Article | 10 April 2013 Paper

Paper

Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry

Hock-Chun Chin, Moh-Lung Ling, Bin Liu, Xingui Zhang, Jie Li, Yongdong Liu, Jiangtao Hu, Yee-Chia Yeo

Proceedings Volume 8681, 86813D (2013) https://doi.org/10.1117/12.2013413

KEYWORDS: Germanium, Scatterometry, Transmission electron microscopy, Scanning electron microscopy, Transistors, Metrology, Etching, Front end of line, 3D modeling

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Proceedings Article | 10 April 2013 Paper

Paper

Scatterometry evaluation of focus-dose effects of EUV structures

Prasad Dasari, Oleg Kritsun, Jie Li, Catherine Volkman, Jiangtao Hu, Zhuan Liu

Proceedings Volume 8681, 86810T (2013) https://doi.org/10.1117/12.2012120

KEYWORDS: Critical dimension metrology, Scatterometry, Extreme ultraviolet lithography, Extreme ultraviolet, Semiconducting wafers, Metrology, Scanners, 3D modeling, Scanning electron microscopy, Ellipsometry

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Proceedings Article | 10 April 2013 Paper

Paper

Evaluating scatterometry 3D capabilities for EUV

Jie Li, Oleg Kritsun, Prasad Dasari, Catherine Volkman, Tom Wallow, Jiangtao Hu

Proceedings Volume 8681, 86810S (2013) https://doi.org/10.1117/12.2011675

KEYWORDS: Semiconducting wafers, Scatterometry, Metrology, Extreme ultraviolet, Critical dimension metrology, Extreme ultraviolet lithography, 3D metrology, Neodymium, Spectroscopic ellipsometry, Lithography

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Proceedings Article | 6 April 2012 Paper

Paper

Evaluating diffraction-based overlay

Jie Li, Asher Tan, JinWoo Jung, Gary Goelzer, Nigel Smith, Jiangtao Hu, Boo-Hyun Ham, Min-Cheol Kwak, Cheol-Hong Kim, Suk-Woo Nam

Proceedings Volume 8324, 83243A (2012) https://doi.org/10.1117/12.918706

KEYWORDS: Semiconducting wafers, Overlay metrology, Detection and tracking algorithms, Wafer testing, Wafer-level optics, Reflectivity, Oxides, Error analysis, Silicon, Precision measurement

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Proceedings Article | 5 April 2012 Paper

Paper

Faster diffraction-based overlay measurements with smaller targets using 3D gratings

Jie Li, Oleg Kritsun, Yongdong Liu, Prasad Dasari, Catherine Volkman, Jiangtao Hu

Proceedings Volume 8324, 83241I (2012) https://doi.org/10.1117/12.916747

KEYWORDS: Semiconducting wafers, Overlay metrology, 3D acquisition, 3D metrology, Finite element methods, Diffraction gratings, Time metrology, Spectroscopy, Reflectance spectroscopy, 3D modeling

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Proceedings Article | 5 April 2012 Paper

Paper

Scatterometry metrology challenges of EUV

Prasad Dasari, Jie Li, Jiangtao Hu, Zhuan Liu, Oleg Kritsun, Catherine Volkman

Proceedings Volume 8324, 83240M (2012) https://doi.org/10.1117/12.916006

KEYWORDS: Scatterometry, Extreme ultraviolet lithography, Critical dimension metrology, Extreme ultraviolet, Metrology, Semiconducting wafers, Double patterning technology, Cadmium, Optical lithography, Ellipsometry

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Proceedings Article | 20 April 2011 Paper

Paper

Metrology characterization of spacer double patterning by scatterometry

Prasad Dasari, Jie Li, Jiangtao Hu, Zhuan Liu, Oleg Kritsun, Catherine Volkman

Proceedings Volume 7971, 797111 (2011) https://doi.org/10.1117/12.879900

KEYWORDS: Scatterometry, Critical dimension metrology, Semiconducting wafers, Metrology, Double patterning technology, Etching, Process control, Scatter measurement, Reflectometry, Scanning electron microscopy

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Proceedings Article | 20 April 2011 Paper

Paper

Advancements of diffraction-based overlay metrology for double patterning

Jie Li, Oleg Kritsun, Yongdong Liu, Prasad Dasari, Ulrich Weher, Catherine Volkman, Martin Mazur, Jiangtao Hu

Proceedings Volume 7971, 79711Y (2011) https://doi.org/10.1117/12.879552

KEYWORDS: Overlay metrology, Double patterning technology, Reflectance spectroscopy, Detection and tracking algorithms, Time metrology, Semiconducting wafers, Diffraction, Diffraction gratings, Spectroscopy, Reflectometry

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SPIE Journal Paper | 1 October 2010

Mueller matrix measurement of asymmetric gratings

Jie Li, Justin Hwu, Yongdong Liu, Silvio Rabello, Zhuan Liu, Jiangtao Hu

JM3, Vol. 9, Issue 04, 041305, (October 2010) https://doi.org/10.1117/12.10.1117/1.3514708

KEYWORDS: Picosecond phenomena, Scatterometry, Atomic force microscopy, Nanoimprint lithography, Calibration, Spectroscopic ellipsometry, Scanning electron microscopy, Photoresist processing, Metrology, Polarization

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Proceedings Article | 2 April 2010 Paper

Paper

Advanced diffraction-based overlay for double patterning

Jie Li, Yongdong Liu, Prasad Dasari, Jiangtao Hu, Nigel Smith, Oleg Kritsun, Catherine Volkman

Proceedings Volume 7638, 76382C (2010) https://doi.org/10.1117/12.848516

KEYWORDS: Overlay metrology, Double patterning technology, Spectroscopic ellipsometry, Semiconducting wafers, Time metrology, Optical components, Metrology, Diffraction, Integrated circuits, Critical dimension metrology

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Proceedings Article | 2 April 2010 Paper

Paper

A comparison of advanced overlay technologies

Prasad Dasari, Nigel Smith, Gary Goelzer, Zhuan Liu, Jie Li, Asher Tan, Chin Hwee Koh

Proceedings Volume 7638, 76381P (2010) https://doi.org/10.1117/12.848189

KEYWORDS: Overlay metrology, Semiconducting wafers, Scatterometry, Error analysis, Data modeling, Reflectometry, Process control, Spectroscopy, Diffraction gratings, Carbon

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Proceedings Article | 11 December 2009 Paper

Paper

Scatterometry measurement of asymmetric gratings

Jie Li, Justin Hwu, Yongdong Liu, Silvio Rabello, Zhuan Liu, Jiangtao Hu

Proceedings Volume 7520, 75201B (2009) https://doi.org/10.1117/12.839821

KEYWORDS: Picosecond phenomena, Scatterometry, Atomic force microscopy, Lithography, Scatter measurement, Critical dimension metrology, Spectroscopic ellipsometry, Photoresist processing, Calibration, Metrology

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Proceedings Article | 24 March 2009 Paper

Paper

Diffraction-based overlay metrology for double patterning technologies

Prasad Dasari, Rahul Korlahalli, Jie Li, Nigel Smith, Oleg Kritsun, Cathy Volkman

Proceedings Volume 7272, 727212 (2009) https://doi.org/10.1117/12.816590

KEYWORDS: Overlay metrology, Double patterning technology, Optical lithography, Data modeling, Metrology, Semiconducting wafers, Scatterometry, Spectroscopy, Lithography, Etching

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Proceedings Article | 23 March 2009 Paper

Paper

Simultaneous overlay and CD measurement for double patterning: scatterometry and RCWA approach

Jie Li, Zhuan Liu, Silvio Rabello, Prasad Dasari, Oleg Kritsun, Catherine Volkman, Jungchul Park, Lovejeet Singh

Proceedings Volume 7272, 727207 (2009) https://doi.org/10.1117/12.814706

KEYWORDS: Overlay metrology, Critical dimension metrology, Semiconducting wafers, Scatterometry, Double patterning technology, Error analysis, Reflectivity, Metrology, Cadmium, Diffraction gratings

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Proceedings Article | 20 March 2009 Paper

Paper

Characterization of a 0.25NA full-field EUV exposure tool

Oleg Kritsun, Bruno La Fontaine, Yudong Hao, Jie Li, Obert Wood, Sudharshanan Raghunathan, Tim Brunner, Chiew-Seng Koay, Hiroyuki Mizuno

Proceedings Volume 7271, 727121 (2009) https://doi.org/10.1117/12.816545

KEYWORDS: Critical dimension metrology, Semiconducting wafers, Extreme ultraviolet lithography, Scanners, Scatterometry, Extreme ultraviolet, Reticles, Overlay metrology, Metrology, Diffraction gratings

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Proceedings Article | 16 March 2009 Paper

Paper

Calibrating OPC model with full CD profile data for 2D and 3D patterns using scatterometry

Aasutosh Dave, Oleg Kritsun, Yunfei Deng, Kenji Yoshimoto, Jie Li, Jiangtao Hu

Proceedings Volume 7274, 727415 (2009) https://doi.org/10.1117/12.814955

KEYWORDS: Data modeling, 3D modeling, Scatterometry, Calibration, Optical proximity correction, 3D metrology, Critical dimension metrology, Lithography, Line edge roughness, Cadmium

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Showing 5 of 22 publications

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