Dr. Moh-Lung Ling Profile

Dr. Moh-Lung Ling

SPIE Involvement:

Author

Publications (7)

Proceedings Article | 13 May 2013 Paper

Metrology solutions using optical scatterometry for advanced CMOS: III-V and Germanium multi-gate field-effect transistors

Hock-Chun Chin, Bin Liu, Xingui Zhang, Moh-Lung Ling, Chan-Hoe Yip, Yongdong Liu, Jiangtao Hu, Yee-Chia Yeo

Proceedings Volume 8788, 87881R (2013) https://doi.org/10.1117/12.2020248

KEYWORDS: Scatterometry, Metrology, Germanium, Transistors, Molybdenum, Process control, Indium gallium arsenide, Spectroscopy, Scanning electron microscopy

Read Abstract +

Proceedings Article | 10 April 2013 Paper

Metrology solutions for high performance germanium multi-gate field-effect transistors using optical scatterometry

Hock-Chun Chin, Moh-Lung Ling, Bin Liu, Xingui Zhang, Jie Li, Yongdong Liu, Jiangtao Hu, Yee-Chia Yeo

Proceedings Volume 8681, 86813D (2013) https://doi.org/10.1117/12.2013413

KEYWORDS: Germanium, Scatterometry, Transmission electron microscopy, Scanning electron microscopy, Transistors, Metrology, Etching, Front end of line, 3D modeling

Read Abstract +

Proceedings Article | 15 April 2010 Paper

Circular apertures for contact hole patterning in 193-nm immersion lithography

Cho Jui Tay, Chenggen Quan, Moh Lung Ling, Qunying Lin, Sia Kim Tan, Gek Soon Chua

Proceedings Volume 7522, 752251 (2010) https://doi.org/10.1117/12.851318

KEYWORDS: Optical lithography, Optical proximity correction, Photomasks, Nanoimprint lithography, Resolution enhancement technologies, Immersion lithography, Critical dimension metrology, Diffraction, Spatial frequencies, Image contrast enhancement

Read Abstract +

Proceedings Article | 4 March 2010 Paper

Radial segmentation approach for contact hole patterning in 193 nm immersion lithography

Moh Lung Ling, Gek Soon Chua, Sia Kim Tan, Cho Jui Tay, Chenggen Quan, Qunying Lin

Proceedings Volume 7640, 76402M (2010) https://doi.org/10.1117/12.848431

KEYWORDS: Optical lithography, Nanoimprint lithography, Image segmentation, Optical proximity correction, Photomasks, Immersion lithography, Image enhancement, Printing, Diffraction, SRAF

Read Abstract +

Proceedings Article | 16 March 2009 Paper

Line end shortening and corner rounding for novel off-axis illumination source shapes

Moh Lung Ling, Gek Soon Chua, Qunying Lin, Cho Jui Tay, Chenggen Quan

Proceedings Volume 7274, 72742V (2009) https://doi.org/10.1117/12.814057

KEYWORDS: Optical proximity correction, Diffusion, Image quality, Lithography, Distortion, Critical dimension metrology, Diffraction, Spatial frequencies, Illumination engineering, Lithographic illumination

Read Abstract +

Proceedings Article | 12 March 2008 Paper

Customized illumination shapes for 193nm immersion lithography

Moh Lung Ling, Gek Soon Chua, Qunying Lin, Cho Jui Tay, Chenggen Quan

Proceedings Volume 6924, 692435 (2008) https://doi.org/10.1117/12.772441

KEYWORDS: Critical dimension metrology, Lithographic illumination, Diffraction, Photomasks, Optical lithography, Immersion lithography, Resolution enhancement technologies, Coherence imaging, Phase shifts, Spatial frequencies

Read Abstract +

Proceedings Article | 26 March 2007 Paper

A comparative study for mask defect tolerance on phase and transmission for dry and immersion 193-nm lithography

Moh Lung Ling, Gek Soon Chua, Cho Jui Tay, Chenggen Quan, Qunying Lin

Proceedings Volume 6520, 65203U (2007) https://doi.org/10.1117/12.711629

KEYWORDS: Air contamination, Photomasks, Immersion lithography, Critical dimension metrology, Lithography, Tolerancing, Phase shifts, Lithographic illumination, Imaging systems, Reticles

Read Abstract +

Showing 5 of 7 publications

View contact details

UPDATE YOUR PROFILE

Is this your profile? Update it now.

Sign into your SPIE.org account

Don’t have a profile and want one?

Create an account on SPIE.org

Keywords/Phrases

Search In:

Publication Years