Dr. Georgiy O. Vaschenko Profile

Dr. Georgiy O. Vaschenko

at ASML San Diego

SPIE Involvement:

Author

Publications (38)

Proceedings Article | 9 September 2019 Presentation

Laser-produced plasma incoherent EUV light sources for high-volume manufacturing semiconductor lithography (Conference Presentation)

Michael Purvis, Igor Fomenkov, Alexander Schafgans, Peter Mayer, Klaus Hummler, Martijn Leenders, Yezheng Tao, Slava Rokitski, Jayson Stewart, Alex Ershov, Robert Rafac, Silvia De Dea, Georgiy Vaschenko, David Brandt, Daniel Brown

Proceedings Volume 11111, 111110K (2019) https://doi.org/10.1117/12.2534691

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Proceedings Article | 3 October 2018 Presentation + Paper

NXE:3400B EUV source performance in the field, readiness for HVM and power scaling beyond 250W

Igor Fomenkov, Michael Purvis, Alexander Schafgans, Yezheng Tao, Slava Rokitski, Jayson Stewart, Andrew LaForge, Alexander Ershov, Robert Rafac, Silvia De Dea, Chirag Rajyaguru, Georgiy Vaschenko, Mathew Abraham, David Brandt, Daniel Brown

Proceedings Volume 10809, 108091L (2018) https://doi.org/10.1117/12.2502801

KEYWORDS: Extreme ultraviolet, High volume manufacturing

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Proceedings Article | 10 May 2018 Paper

Industrialization of a robust EUV source for high-volume manufacturing and power scaling beyond 250W

Michael Purvis, Igor Fomenkov, Alexander Schafgans, Mike Vargas, Spencer Rich, Yezheng Tao, Slava Rokitski, Melchior Mulder, Erik Buurman, Michael Kats, Jayson Stewart, Andrew LaForge, Chirag Rajyaguru, Georgiy Vaschenko, Alex Ershov, Robert Rafac, Mathew Abraham, David Brandt, Daniel Brown

Proceedings Volume 10583, 1058327 (2018) https://doi.org/10.1117/12.2305955

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Plasma, Tin, High volume manufacturing, Semiconducting wafers, Reflectivity, EUV optics, Photoresist materials

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Proceedings Article | 5 May 2017 Presentation

Scaling LPP EUV sources to meet high volume manufacturing requirements (Conference Presentation)

Alexander Schafgans, Daniel Brown, Igor Fomenkov, Yezheng Tao, Michael Purvis, Slava Rokitski, Georgiy Vaschenko, Robert Rafac, David Brandt

Proceedings Volume 10143, 101431I (2017) https://doi.org/10.1117/12.2258628

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, High volume manufacturing, Lithography, Current controlled current source

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Proceedings Article | 16 March 2015 Paper

Performance optimization of MOPA pre-pulse LPP light source

Alexander Schafgans, Daniel Brown, Igor Fomenkov, Rick Sandstrom, Alex Ershov, Georgiy Vaschenko, Rob Rafac, Michael Purvis, Slava Rokitski, Yezheng Tao, Daniel Riggs, Wayne Dunstan, Matthew Graham, Nigel Farrar, David Brandt, Norbert Böwering, Alberto Pirati, Noreen Harned, Christian Wagner, Hans Meiling, Ron Kool

Proceedings Volume 9422, 94220B (2015) https://doi.org/10.1117/12.2087421

KEYWORDS: Extreme ultraviolet, Light sources, Pulsed laser operation, Extreme ultraviolet lithography, Plasma, Amplifiers, High power lasers, Tin, Laser energy, High volume manufacturing

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Proceedings Article | 1 April 2013 Paper

CO2/Sn LPP EUV sources for device development and HVM

David Brandt, Igor Fomenkov, Nigel Farrar, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christopher Wittak, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao, Kay Hoffmann, Tedsuja Ishikawa, David Evans, Spencer Rich

Proceedings Volume 8679, 86791G (2013) https://doi.org/10.1117/12.2011212

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Mirrors, Tin, Pulsed laser operation, Plasma systems, Laser scanners

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SPIE Journal Paper | 29 June 2012

Development of stable extreme-ultraviolet sources for use in lithography exposure systems

Igor Fomenkov, Bruno La Fontaine, Daniel Brown, Imtiaz Ahmad, Peter Baumgart, Norbert Bowering, David Brandt, Alexander Bykanov, Silvia De Dea, Alex Ershov, Nigel Farrar, Daniel Golich, Michael Lercel, David Myers, Chirag Rajyaguru, Shailendra Srivastava, Yezheng Tao, Georgiy Vaschenko

JM3, Vol. 11, Issue 02, 021110, (June 2012) https://doi.org/10.1117/12.10.1117/1.JMM.11.2.021110

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Lithography, Tin, Reflectivity, Semiconducting wafers, Mirrors, Scanners, Gas lasers

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Proceedings Article | 23 March 2012 Paper

Laser produced plasma EUV sources for device development and HVM

David Brandt, Igor Fomenkov, Michael Lercel, Bruno La Fontaine, David Myers, Daniel Brown, Alex Ershov, Richard Sandstrom, Alexander Bykanov, Georgiy Vaschenko, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Wayne Dunstan, Peter Baumgart, Toshi Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, Peter Porshnev, Christian Wittak, Michael Woolston, Robert Rafac, Jonathan Grava, Alexander Schafgans, Yezheng Tao

Proceedings Volume 8322, 83221I (2012) https://doi.org/10.1117/12.916521

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Mirrors, Coating, Manufacturing, Tin, Semiconducting wafers, Laser scanners

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Proceedings Article | 8 April 2011 Paper

Laser produced plasma light source for EUVL

Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Daniel Brown, Richard Sandstrom, Bruno La Fontaine, Alexander Bykanov, Georgiy Vaschenko, Oleh Khodykin, Norbert Böwering, Palash Das, Vladimir Fleurov, Kevin Zhang, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Silvia De Dea, Richard Hou, Wayne Dunstan, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt, David Brandt

Proceedings Volume 7969, 796933 (2011) https://doi.org/10.1117/12.882210

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Spectrometers, Light sources, Scanners, Optical filters, Reflectivity, Optical lithography, Laser applications

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Proceedings Article | 7 April 2011 Paper

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Bruno La Fontaine, Michael Lercel, Alexander Bykanov, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Palash Das, Vladimir Fleurov, Kevin Zhang, Daniel Golich, Silvia De Dea, Richard Hou, Wayne Dunstan, Christian Wittak, Peter Baumgart, Toshihiko Ishihara, Rod Simmons, Robert Jacques, Robert Bergstedt

Proceedings Volume 7969, 79691H (2011) https://doi.org/10.1117/12.882208

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Scanners, Reflectivity, Plasma, Mirrors, Semiconducting wafers, Carbon dioxide lasers, Laser scanners, 3D scanning

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Proceedings Article | 23 March 2010 Paper

Laser-produced plasma light source for EUVL

Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, Silvia De Dea, Richard Hou, Kevin O'Brien, Wayne Dunstan, David Brandt

Proceedings Volume 7636, 763639 (2010) https://doi.org/10.1117/12.848408

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Carbon dioxide lasers, Reflectivity, Tin, Plasma, Manufacturing, Mirrors, Ions, Light sources

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Proceedings Article | 20 March 2010 Paper

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Richard Sandstrom, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, Silvia De Dea, Richard Hou, Kevin O'Brien, Wayne Dunstan

Proceedings Volume 7636, 76361I (2010) https://doi.org/10.1117/12.848404

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Plasma, Scanners, Carbon dioxide lasers, Manufacturing, Prototyping, Tin, Mirrors, Laser scanners

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SPIE Journal Paper | 1 October 2009

Performance results of laser-produced plasma test and prototype light sources for EUV lithography

Norbert Böwering, Igor Fomenkov, David Brandt, Alexander Bykanov, Alexander Ershov, William Partlo, Dave Myers, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

JM3, Vol. 8, Issue 04, 041504, (October 2009) https://doi.org/10.1117/12.10.1117/1.3224942

KEYWORDS: Extreme ultraviolet, Ions, Plasma, Gas lasers, Extreme ultraviolet lithography, Tin, Carbon monoxide, Mirrors, Prototyping, Light sources

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Proceedings Article | 18 March 2009 Paper

Laser-produced plasma light source for EUVL

Igor Fomenkov, David Brandt, Alexander Bykanov, Alex Ershov, William Partlo, Dave Myers, Norbert Böwering, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

Proceedings Volume 7271, 727138 (2009) https://doi.org/10.1117/12.814272

KEYWORDS: Extreme ultraviolet, Ions, Plasma, Extreme ultraviolet lithography, Sensors, Carbon dioxide lasers, Mirrors, Tin, Coating, Light sources

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Proceedings Article | 18 March 2009 Open Access

LPP source system development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Nigel Farrar, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, Imtiaz Ahmad, Chirag Rajyaguru, Daniel Golich, David Vidusek, Silvia De Dea, Richard Hou

Proceedings Volume 7271, 727103 (2009) https://doi.org/10.1117/12.814228

KEYWORDS: Extreme ultraviolet, Reflectivity, Extreme ultraviolet lithography, Mirrors, Tin, Plasma, Coating, Scanners, Manufacturing, Light sources

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Proceedings Article | 4 December 2008 Paper

Laser-produced plasma source system development

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Alexander Bykanov, Jerzy Hoffman, Christopher Chrobak, Shailendra Srivastava, David Vidusek, Silvia De Dea, Richard Hou

Proceedings Volume 7140, 71401E (2008) https://doi.org/10.1117/12.806648

KEYWORDS: Extreme ultraviolet, Plasma, Reflectivity, Mirrors, Extreme ultraviolet lithography, Tin, Plasma systems, Manufacturing, Light sources, Carbon dioxide lasers

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This paper provides a review of development progress for a laser-produced-plasma (LPP) extreme-ultra-violet (EUV) source with performance goals targeted to meet joint requirements from all leading scanner manufacturers. Laser produced plasma systems have been developed as a viable approach for the EUV scanner light source for optical imaging of circuit features at sub-32nm and beyond nodes on the ITRS roadmap. Recent advances in the development of the system, its present average output power level and progress with various subcomponents is discussed. We present the latest results on peak EUV and average EUV power as well as stability of EUV output, measured in burst-mode operation at the nominal repetition rate of the light source. In addition, our progress in developing of critical components, such as normal-incidence EUV collector and liquid-target delivery system is described. We also report on dose stability, plasma position stability and EUV distribution at the output region of the source. This presentation reviews the experimental results obtained on systems with a focus on the topics most critical for an HVM source. The capability to scale LPP power by further development of the high power CO2 drive laser in order to increase duty cycle and duration of continuous light source operation is shown. Production systems with thermal management and capable of 5 sr light collection are being assembled and tested. A description of the development of a normal-incidence ellipsoidal collector is included. Improvements in substrate quality lead to increased EUV reflectance of the mirror. Results on the generation of liquid tin droplets as target material for efficient plasma generation are also described. The droplet generator serves as a key element in the precise and spatially stable delivery of small quantities of liquid tin at high repetition rates. We describe a protection module at the intermediate focus (IF) region of the source and imaging of the EUV distribution using a sub-aperture collector and a fluorescent screen. A path to meet requirements for production scanners planned well into the next decade is also presented.

Proceedings Article | 12 October 2007 Paper

Structural transformations in Sc/Si multilayers irradiated by EUV lasers

Dmitriy Voronov, Evgeniy Zubarev, Yuriy Pershyn, Victoriya Sevryukova, Valeriy Kondratenko, Alexander Vinogradov, Igor Artioukov, Yuriy Uspenskiy, Michael Grisham, Georgiy Vaschenko, Carmen Menoni, Jorge Rocca

Proceedings Volume 6702, 67020U (2007) https://doi.org/10.1117/12.732705

KEYWORDS: Silicon, Extreme ultraviolet, Multilayers, Transmission electron microscopy, Laser ablation, Crystals, Laser irradiation, Laser damage threshold, Pulsed laser operation, Amorphous silicon

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Proceedings Article | 12 October 2007 Paper

Nanoscale ablation with soft x-ray lasers

Fernando Brizuela, Herman Bravo, Georgiy Vaschenko, Mark Berrill, Benjamin Langdon, Carmen Menoni, Oscar Hemberg, Scott Bloom, Weilun Chao, Erik Anderson, David Attwood, Jorge Rocca

Proceedings Volume 6702, 67020L (2007) https://doi.org/10.1117/12.733401

KEYWORDS: Laser ablation, X-ray lasers, Zone plates, Polymethylmethacrylate, Diffraction, Signal attenuation, Silver, Laser induced breakdown spectroscopy, Spectroscopy, Atomic force microscopy

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Proceedings Article | 21 March 2007 Paper

Laser-produced plasma source system development

Igor Fomenkov, David Brandt, Alexander Bykanov, Alexander Ershov, William Partlo, David Myers, Norbert Böwering, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Ernesto Vargas L., Rodney Simmons, Juan Chavez, Christopher Chrobak

Proceedings Volume 6517, 65173J (2007) https://doi.org/10.1117/12.713454

KEYWORDS: Extreme ultraviolet, Ions, Gas lasers, Plasma, Tin, Spectroscopy, Carbon monoxide, Extreme ultraviolet lithography, Calibration, Sensors

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This paper describes the development of laser produced plasma (LPP) technology as an EUV source for advanced scanner lithography applications in high volume manufacturing. EUV lithography is expected to succeed 193 nm immersion technology for critical layer patterning below 32 nm beginning with beta generation scanners in 2009. This paper describes the development status of subsystems most critical to the performance to meet joint scanner manufacturer requirements and semiconductor industry standards for reliability and economic targets for cost of ownership. The intensity and power of the drive laser are critical parameters in the development of extreme ultraviolet LPP lithography sources. The conversion efficiency (CE) of laser light into EUV light is strongly dependent on the intensity of the laser energy on the target material at the point of interaction. The total EUV light generated then scales directly with the total incident laser power. The progress on the development of a short pulse, high power CO2 laser for EUV applications is reported. The lifetime of the collector mirror is a critical parameter in the development of extreme ultra-violet LPP lithography sources. The deposition of target materials and contaminants, as well as sputtering of the collector multilayer coating and implantation of incident particles can reduce the reflectivity of the mirror substantially over the exposure time even though debris mitigation schemes are being employed. The results of measurements of high energy ions generated by a short-pulse CO2 laser on a laser-produced plasma EUV light source with Sn target are presented. Droplet generation is a key element of the LPP source being developed at Cymer for EUV lithography applications. The main purpose of this device is to deliver small quantities of liquid target material as droplets to the laser focus. The EUV light in such configuration is obtained as a result of creating a highly ionized plasma from the material of the droplets. Liquid tin is the material of choice to be used as a target due to the relatively high CE of the laser energy into in-band EUV radiation. Results obtained with the droplet generator and technical challenges related to successful implementation of the device are discussed.

Proceedings Article | 19 March 2007 Paper

LPP EUV source development for HVM

David Brandt, Igor Fomenkov, Alex Ershov, William Partlo, David Myers, Norbert Böwering, Alexander Bykanov, Georgiy Vaschenko, Oleh Khodykin, Jerzy Hoffman, Ernesto Vargas L., Rodney Simmons, Juan Chavez, Christopher Chrobak

Proceedings Volume 6517, 65170Q (2007) https://doi.org/10.1117/12.713279

KEYWORDS: Extreme ultraviolet, Gas lasers, Plasmas, Tin, Mirrors, Reflectivity, Extreme ultraviolet lithography, Carbon monoxide, Ions, Scanners

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Proceedings Article | 23 March 2006 Paper

EUV imaging with a 13nm tabletop laser reaches sub-38 nm spatial resolution

Georgiy Vaschenko, Fernando Brizuela, Courtney Brewer, Miguel Larotonda, Yong Wang, Bradley Luther, Mario Marconi, Jorge Rocca, Carmen Menoni, Weilun Chao, Erik Anderson, Yanwei Liu, David Attwood

Proceedings Volume 6151, 61510X (2006) https://doi.org/10.1117/12.656588

KEYWORDS: Extreme ultraviolet, Zone plates, Spatial resolution, Microscopes, Photomasks, Imaging systems, Extreme ultraviolet lithography, Inspection, Plasma, Reflectivity

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Proceedings Article | 14 September 2005 Paper

Nanometer-scale imaging with compact soft x-ray lasers

Fernando Brizuela, Georgiy Vaschenko, Courtney Brewer, Michael Grisham, Carmen Menoni, Hector Mancini, Mario Marconi, Jorge Rocca, Weilun Chao, J. Alexander Liddle, Erik Anderson, David Attwood, Alexander Vinogradov, Igor Artioukov, Yuriy Pershyn, Valeriy Kondratenko

Proceedings Volume 5919, 59190N (2005) https://doi.org/10.1117/12.614646

KEYWORDS: Zone plates, Image resolution, X-ray lasers, Imaging systems, Capillaries, Microscopes, X-rays, Spatial resolution, Objectives, Modulation

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SPIE Journal Paper | 1 July 2005

Short-wavelength ablation of molecular solids: pulse duration and wavelength effects

Libor Juha, Michal Bittner, Dagmar Chvostova, Josef Krasa, Michaela Kozlov, Miroslav Pfeifer, Jiri Polan, Ansgar Präg, Bedrich Rus, Michal Stupka, Josef Feldhaus, Vit Letal, Zdenek Otcenasek, Jacek Krzywinski, Robert Nietubye, Jerzy Pelka, Andrzej Andrejczuk, Ryszard Sobierajski, Leszek Ryc, Frederick Boody, Henryk Fiedorowicz, Andrzej Bartnik, Janusz Mikolajczyk, Rafal Rakowski, Pavel Kubát, Ladislav Pína, Martin Horváth, Michael Grisham, Georgiy Vaschenko, Carmen Menoni, Jorge Rocca

JM3, Vol. 4, Issue 03, 033007, (July 2005) https://doi.org/10.1117/12.10.1117/1.2037467

KEYWORDS: Laser ablation, Polymethylmethacrylate, Extreme ultraviolet, Free electron lasers, Solids, Pulsed laser operation, X-rays, Signal attenuation, Photons, Absorption

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Proceedings Article | 10 May 2005 Paper

Nano-imaging with compact extreme ultraviolet laser sources

G. Vaschenko, F. Brizuela, C. Brewer, M. Grisham, Y. Wang, M. Larotonda, B. Luther, C. Menoni, M. Marconi, J. Rocca, W. Chao, J. Liddle, E. Anderson, D. Attwood, A. Vinogradov, I. Artioukov, Y. Pershyn, V. Kondratenko

Proceedings Volume 5752, (2005) https://doi.org/10.1117/12.601899

KEYWORDS: Zone plates, Extreme ultraviolet, Imaging systems, Image resolution, Microscopes, Laser sources, Silicon, Spatial resolution, Objectives, Reflectivity

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Proceedings Article | 10 November 2004 Paper

Study of irradiation damage of Sc/Si multilayer mirrors with a 46.9-nm tabletop laser

Georgiy Vaschenko, Michael Grisham, Carmen Menoni, Jorge Rocca, Yuriy Pershin, Evgeniy Zubarev, Dmitrii Voronov, Viktoria Sevryukova, Valeriy Kondratenko, Alexander Vinogradov, Igor Artioukov

Proceedings Volume 5534, (2004) https://doi.org/10.1117/12.557952

KEYWORDS: Mirrors, Multilayers, Silicon, Extreme ultraviolet, Laser damage threshold, Extreme ultraviolet lithography, Argon ion lasers, Borosilicate glass, Transmission electron microscopy, X-ray diffraction

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Proceedings Article | 10 November 2004 Paper

Short-wavelength ablation of solids: pulse duration and wavelength effects

Libor Juha, Michal Bittner, Dagmar Chvostova, Vit Letal, Josef Krasa, Zdenek Otcenasek, Michaela Kozlova, Jiri Polan, Ansgar Prag, Bedrich Rus, Michal Stupka, Jacek Krzywinski, Andrzej Andrejczuk, Jerzy Pelka, Ryszard Sobierajski, Leszek Ryc, Josef Feldhaus, Frederick Boody, Henryk Fiedorowicz, Andrzej Bartnik, Janusz Mikolajczyk, Rafal Rakowski, P. Kubat, Ladislav Pina, Michael Grisham, Georgiy Vaschenko, Carmen Menoni, Jorge Rocca

Proceedings Volume 5534, (2004) https://doi.org/10.1117/12.560413

KEYWORDS: Laser ablation, Polymethylmethacrylate, Extreme ultraviolet, Free electron lasers, Pulsed laser operation, Photons, X-rays, Plasma, Signal attenuation, Etching

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Proceedings Article | 21 October 2004 Paper

Interferometric lithography at 46.9 nm

M. Capeluto, Georgiy Vaschenko, Michael Grisham, Mario Marconi, Carmen Menoni, Jorge Rocca, S. Luduena, L. Pietrasanta

Proceedings Volume 5622, (2004) https://doi.org/10.1117/12.592201

KEYWORDS: Polymethylmethacrylate, Interferometry, Lithography, Extreme ultraviolet, Diffraction, Mirrors, Semiconducting wafers, Near field diffraction, Laser sources, Plasma

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Proceedings Article | 20 September 2004 Paper

Comparing ablation induced by fs, ps, and ns XUV-laser pulses

Michal Bittner, Libor Juha, Dagmar Chvostova, Vit Letal, Josef Krasa, Zdenek Otcenasek, Michaela Kozlova, Jiri Polan, Ansgar Praeg, Bedrich Rus, Michal Stupka, Jacek Krzywinski, Andrzej Andrejczuk, Jerzy Pelka, Ryszard Sobierajski, Josef Feldhaus, Frederick Boody, Michael Grisham, Georgiy Vaschenko, Carmen Menoni, Jorge Rocca

Proceedings Volume 5448, (2004) https://doi.org/10.1117/12.547086

KEYWORDS: Laser ablation, Extreme ultraviolet, Free electron lasers, Polymethylmethacrylate, Pulsed laser operation, Mirrors, Picosecond phenomena, Spherical lenses, Absorption, Etching

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Proceedings Article | 19 December 2003 Paper

Recent results in capillary discharge soft x-ray laser research

Jorge Rocca, Mario Marconi, Yong Wang, Bradley Luther, Francesco Pedacci, Michael Grisham, Georgiy Vaschenko, Carmen Menoni, Jorge Filevich, Libor Juha, Yu. Pershin, E. Zubarev, D. Voronov, V. Sevryukova, V. Kondratenko, Vyacheslav Shlyaptsev, Alexander Vinogradov, Igor Artioukov

Proceedings Volume 5197, (2003) https://doi.org/10.1117/12.510944

KEYWORDS: Capillaries, Plasma, Silicon, Laser ablation, Multilayers, X-ray lasers, Mirrors, Laser damage threshold, Waveguides, Polymethylmethacrylate

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Proceedings Article | 4 December 2002 Paper

Small signal frequency response of laser diodes using a femtosectond frequency comb

Ovidio Anton, G. Vaschenko, Dinesh Patel, Jon Pikal, Carmen Menoni

Proceedings Volume 4871, (2002) https://doi.org/10.1117/12.460479

KEYWORDS: Modulation, Semiconductor lasers, Optical parametric oscillators, Quantum wells, Femtosecond phenomena, Optical testing, Laser optics, Spectrum analysis, Laser damage threshold, Optical amplifiers

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Proceedings Article | 11 June 2002 Paper

Improvement in the frequency response of 1.3-um buried heterostructure InAsP lasers

Carmen Menoni, Ovidio Anton, Dinesh Patel, G. Vaschenko, Gary Robinson, Jon Pikal

Proceedings Volume 4643, (2002) https://doi.org/10.1117/12.470420

KEYWORDS: Modulation, Quantum wells, Optical parametric oscillators, Semiconductor lasers, Heterojunctions, Resistors, Laser optics, Femtosecond phenomena, Optical testing, Solids

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Proceedings Article | 8 November 2001 Paper

Analysis of the modulation response of 1.3-um strained InAsP lasers

Ovidio Anton, Dinesh Patel, G. Vaschenko, Gary Robinson, Jon Pikal, Carmen Menoni

Proceedings Volume 4533, (2001) https://doi.org/10.1117/12.447767

KEYWORDS: Modulation, Quantum wells, Semiconductor lasers, Inductance, Heterojunctions, Resistors, Laser damage threshold, Network security, Laser processing, Signal analysis

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Proceedings Article | 22 June 1999 Paper

Picosecond characterization of low-frequency fluctuations in edge-emitting semiconductor lasers with optical feedback

G. Vaschenko, Carmen Menoni, Jorge Rocca, Massimo Giudici, Jorge Tredicce, Salvador Balle

Proceedings Volume 3516, (1999) https://doi.org/10.1117/12.350442

KEYWORDS: Streak cameras, Picosecond phenomena, Semiconductor lasers, Diodes, Edge emitting semiconductor lasers, Oscilloscopes, Microchannel plates, Image intensifiers, Laser optics, Spectroscopy

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Proceedings Article | 22 June 1999 Paper

Probing carrier dynamics in ZnCdSe/ZnSe quantum wells with a synchroscan streak camera

G. Vaschenko, Carmen Menoni, Y. Qiu, Henryk Temkin

Proceedings Volume 3516, (1999) https://doi.org/10.1117/12.350443

KEYWORDS: Excitons, Quantum wells, Streak cameras, Carrier dynamics, Luminescence, Time metrology, Quantum efficiency, Picosecond phenomena, Neodymium, Electrical engineering

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Proceedings Article | 28 May 1997 Paper

Femtosecond synchroscan streak camera

Mikhail Schelev, Yury Serdyuchenko, G. Vaschenko

Proceedings Volume 2869, (1997) https://doi.org/10.1117/12.273403

KEYWORDS: Cameras, Femtosecond phenomena, Streak cameras, Temporal resolution, Camera shutters, Interference (communication), Picosecond phenomena, Physics, Ultrafast phenomena, Mode locking

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Proceedings Article | 1 January 1993 Paper

492-MHz circular-scan streak camera

V. Orlov, Yury Serdyuchenko, G. Vaschenko

Proceedings Volume 1801, (1993) https://doi.org/10.1117/12.145840

KEYWORDS: Cameras, Picosecond phenomena, Streak cameras, Temporal resolution, Printed circuit board testing, High speed photography, Photonics, Dye lasers, Physics

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Proceedings Article | 1 April 1991 Paper

328 MHz synchroscan streak camera

Mikhail Schelev, Yury Serdyuchenko, G. Vaschenko

Proceedings Volume 1358, (1991) https://doi.org/10.1117/12.24009

KEYWORDS: Streak cameras, Mode locking, Cameras, Camera shutters, Image intensifiers, Radio frequency circuits, Oscillators, Photodiodes, Temporal resolution, Picosecond phenomena

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Proceedings Article | 1 April 1991 Paper

Soviet-American image converter cameras "PROSCHEN"

Dennis Briscoe, Chinmaya Shrivastava, Sidney Nebeker, Shih-Kai Hsu, Valerij Lozovoi, Valdis Postovalov, Alexander Prokhorov, Mikhail Schelev, Yury Serdyuchenko, G. Vaschenko

Proceedings Volume 1358, (1991) https://doi.org/10.1117/12.24014

KEYWORDS: Cameras, Analytical research, Temporal resolution, Picosecond phenomena, Laser development, Laser applications, Design for manufacturability, Manufacturing, Plasma

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