Mr. Chung-Hyun Ban Profile

Chung-Hyun Ban

at Hanyang Univ

SPIE Involvement:

Author

Publications (11)

SPIE Journal Paper | 31 August 2021

Possible extreme ultraviolet mask thermal deformation during exposure

Chung-Hyun Ban, In-Hwa Kang, Won-Yung Choi, Hye-Keun Oh

JM3, Vol. 20, Issue 03, 031012, (August 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.031012

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Convection, Tantalum, Nickel, Absorption, Multilayers, Silicon

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SPIE Journal Paper | 2 August 2021

Reduced lifetime of EUV pellicles due to defects

Chung-Hyun Ban, In-Hwa Kang, Won-Yung Choi, Hye-Keun Oh

JM3, Vol. 20, Issue 03, 034401, (August 2021) https://doi.org/10.1117/12.10.1117/1.JMM.20.3.034401

KEYWORDS: Pellicles, Extreme ultraviolet, Extreme ultraviolet lithography, Particles, Transmittance, Absorption, Reflectivity, Semiconducting wafers, Silicon carbide, Tin

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Proceedings Article | 22 February 2021 Poster + Paper

Line width roughness variation and printing failures caused by stochastic effect at extreme-ultraviolet exposure

In-Hwa Kang, Tae-Yi Kim, Su-Mi Hur, Chung-Hyun Ban, Jang-Gun Park, Hye-Keun Oh

Proceedings Volume 11609, 116091K (2021) https://doi.org/10.1117/12.2583690

KEYWORDS: Line width roughness, Extreme ultraviolet, Stochastic processes, Polymers, Extreme ultraviolet lithography, Chemical reactions, Quenching (fluorescence), Photoresist materials, Manufacturing, Ionization

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Proceedings Article | 22 February 2021 Poster + Presentation

Wafer heating analysis with pattern variation in EUVL

Won-Young Choi, Chung-Hyun Ban, Hye-Keun Oh

Proceedings Volume 11609, 116091P (2021) https://doi.org/10.1117/12.2583917

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Proceedings Article | 22 February 2021 Poster + Presentation

Effect of contaminants on pellicle lifetime for EUV lithography

Chung-Hyun Ban, In-Hwa Kang, Won-Young Choi, Hye-Keun Oh

Proceedings Volume 11609, 116091J (2021) https://doi.org/10.1117/12.2583675

KEYWORDS: Pellicles, Particles, Extreme ultraviolet lithography, Extreme ultraviolet, Finite element methods, Absorption, Thermography, Thermal modeling, Silicon carbide, Silica

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Proceedings Article | 20 September 2020 Poster

Thermal deformation of EUV mask according to mask type and pattern density

Chung-Hyun Ban, In-Hwa Kang, Beom-Jun Jeon, Won-young Choi, Hye-Keun Oh

Proceedings Volume 11517, 115171C (2020) https://doi.org/10.1117/12.2573149

KEYWORDS: Extreme ultraviolet, Extreme ultraviolet lithography, Multilayers, Light sources, Finite element methods, Reflectivity, Thermal effects, Pellicles, Semiconducting wafers, Computer simulations

Proceedings Article | 26 September 2019 Paper

Pattern dependent distortion and temperature variation in EUV mask

Chung-Hyun Ban, Eun-Sang Park, Ui-Jeong Ha, Chae-Yun Lim, Hye-Keun Oh

Proceedings Volume 11147, 111471R (2019) https://doi.org/10.1117/12.2536721

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Semiconducting wafers, Semiconductors, Cooling systems, High volume manufacturing, Pellicles, Mirrors, Overlay metrology

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Proceedings Article | 11 October 2018 Paper

A possible wafer heating during EUV exposure

Se-Hun Oh, Sung-Gyu Lee, Jae-Hun Park, Chung-Hyun Ban, Hye-Keun Oh

Proceedings Volume 10809, 108091R (2018) https://doi.org/10.1117/12.2502918

KEYWORDS: Extreme ultraviolet, Infrared radiation, Semiconducting wafers, Extreme ultraviolet lithography, Finite element methods, Lithography, Optical lithography, EUV optics, Reflectivity, Wafer-level optics

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Proceedings Article | 22 March 2018 Paper

Thermomechanical changes of EUV mask and absorber dependency

Chung-Hyun Ban, Sung-Gyu Lee, Eun-Sang Park, Jae-Hun Park, Hye-Keun Oh

Proceedings Volume 10583, 1058322 (2018) https://doi.org/10.1117/12.2299495

KEYWORDS: Photomasks, Extreme ultraviolet, Extreme ultraviolet lithography, Finite element methods, Computer simulations, Multilayers, Image processing, Semiconducting wafers, Tantalum, Nickel

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SPIE Journal Paper | 29 December 2017

Thermo-optical optimization of extreme-ultraviolet pellicles for future generations

Eun-Sang Park, Chung-hyun Ban, Jae-Hun Park, Hye-Keun Oh

JM3, Vol. 16, Issue 04, 041014, (December 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.4.041014

KEYWORDS: Pellicles, Extreme ultraviolet, Coating, Ruthenium, Silicon, Extreme ultraviolet lithography, Absorption, Photomasks, Finite element methods, Multilayers

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Proceedings Article | 16 October 2017 Paper

Lifetime estimation of extreme-ultraviolet pellicle at 500 W source power by thermal stress analysis

Eun-Sang Park, Chung-Hyun Ban, Jae-Hun Park, Hye-Keun Oh

Proceedings Volume 10450, 104501K (2017) https://doi.org/10.1117/12.2280518

KEYWORDS: Pellicles, Extreme ultraviolet, Coating, Extreme ultraviolet lithography, Silicon, Finite element methods, Graphene, Manufacturing, Ruthenium, Absorption

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Showing 5 of 11 publications

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