Se-Hun Oh
at Hanyang Univ
SPIE Involvement:
Author
Publications (2)

Proceedings Article | 11 October 2018 Paper
Proceedings Volume 10809, 108091R (2018) https://doi.org/10.1117/12.2502918
KEYWORDS: Extreme ultraviolet, Infrared radiation, Semiconducting wafers, Extreme ultraviolet lithography, Finite element methods, Lithography, Optical lithography, EUV optics, Reflectivity, Wafer-level optics

Proceedings Article | 9 October 2018 Presentation + Paper
Proceedings Volume 10809, 108091G (2018) https://doi.org/10.1117/12.2502784
KEYWORDS: Particles, Extreme ultraviolet, Pellicles, Critical dimension metrology, Optical lithography, Extreme ultraviolet lithography, Photomasks, Contamination, Applied physics, Lithography

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