Dr. Ionela-Daniela Carja
at Merck KGaA
SPIE Involvement:
Author
Publications (3)

Proceedings Article | 10 April 2024 Presentation
Daniela Carja, Hung-Yang Chen, Takayuki Sao, Hiroshi Hitokawa, Philipp-Hans Fackler, Chunwei Chen, Ralph Dammel
Proceedings Volume 12957, 1295703 (2024) https://doi.org/10.1117/12.3010645
KEYWORDS: Photoacid generators, Sustainability, Chemically amplified resists, Photoresist materials, Transparency, Photoresist developing, Lithography, Toxicity, Thermal stability, Structural design

Proceedings Article | 9 April 2024 Poster + Paper
Proceedings Volume 12957, 129571H (2024) https://doi.org/10.1117/12.3009506
KEYWORDS: Photoresist materials, Photoacid generators, Copper, Silicon, Film thickness, Lithography, Semiconductors, Semiconducting wafers, Fabrication, Photoresist developing

Proceedings Article | 14 December 2016 Paper
Proceedings Volume 10010, 100100G (2016) https://doi.org/10.1117/12.2243339
KEYWORDS: Polymers, Liquid crystals, Liquids, Crystals, Chemical analysis, FT-IR spectroscopy, Spectroscopy, X-ray diffraction, Calorimetry, Temperature metrology

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