Background: An extreme ultraviolet (EUV)-transparent pellicle must be used during lithography to protect the photomask from fall-on particles. A pellicle made of free-standing carbon nanotube (CNT) films stops particles despite the presence of gaps while demonstrating high EUV transmission, mechanical stability, low EUV scattering and reflectivity, and DUV transmission that enables through-pellicle mask inspection.
Aim: The CNT EUV pellicle properties can be tailored based on the diversity of CNT structures and tunability of their configuration within the CNT film (density, bundle size, composition, etc.) as shown in this work. A remaining challenge is extending the CNT EUV pellicle lifetime in the scanner environment of EUV-induced hydrogen-based plasma, and the effects on different CNT films are explored here.
Approach: Optical and thermal properties of different CNT pellicles with respect to the CNT material type, density, composition, and bundle size were explored. The ability of uncoated CNT EUV pellicles to withstand high EUV powers in the hydrogen-based environment was tested. Transmission, spectroscopic, and chemical mapping of the exposed CNT membranes were performed to explore the material modifications under various exposure conditions.
Results: Uncoated CNT pellicles withstand 600-W source power equivalent in the EUV scanner-like gas environment but exhibit structural changes with prolonged exposure. Multiwalled CNT pellicles exhibit less EUV transmission change as compared to single-walled CNT pellicles under the same exposure conditions. The protection of CNT material from structural degradation by means of coating was shown.
Conclusions: These investigations add to the understanding of CNT EUV pellicle tunability for optimal performance and lifetime limiters of CNT pellicles under the influence of EUV radiation and plasma. We anticipate the need for coating the CNT pellicle to protect the CNT material against plasma damage for the current scanner conditions. Optimization of both the CNT membrane and its coating is in progress.
Research on carbon nanotube (CNT) films for the EUV pellicle application was initiated at imec in 2015 triggered by the remarkable optical, mechanical, and thermal properties of the CNT material. Today the advancement of the CNT material synthesis together with matured methods to fabricate thin CNT membranes make free-standing CNT films a very promising EUV pellicle candidate for high volume EUV lithography. Balancing the CNT material properties for the optimal pellicle performance in EUV scanners remains the ongoing research focus. Depending on the density and morphology of the CNTs within the film and individual CNT parameters, like number of walls, bundle size, metal catalyst content, purity etc., the optical and thermal properties of the CNT pellicle can be tuned. It is critical for the pellicle to be stable in the EUV lithography scanner environment which includes hydrogen plasma and heat loads associated with high powers beyond 250 W. Different types of CNTs, i.e. single-, double-, multi-walled CNTs and their combinations, are explored as building blocks of an optimized pellicle membrane. Optical properties of different pellicles and their ability to withstand high EUV powers in the hydrogen-based environment were tested. Transmission, spectroscopic and chemical composition mapping of the exposed free-standing CNT films are used to study the material changes that occur in the scanner-like environment. A solution is needed to extend the CNT pellicle lifetime and coating is discussed as a potential approach to protect the CNT material from hydrogen plasma damage.
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