A critical requirement for using thin polymer films in many microelectronics applications is the ability to selectively immobilize materials on patterned polymer templates.1 Adaptation of standard covalent solution phase chemistries is the most direct approach, but suffers several drawbacks, including the following: (1) reduced reaction rates or yields due to surface steric effects, (2) distortion or dissolution of surface templates due to reagent/polymer incompatibilities, and (3) environmental and cost concerns arising from the use of nonaqueous solvents.
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