Mr. Jang-Sun Sunny Kim Profile

Jang-Sun Sunny Kim

Prof Svcs Cons at KLA Corp

SPIE Involvement:

Author

Area of Expertise:

Overlay control , Machine learning , Metrology , CD control , Data science

Lithography Scanners : Canon, Nikon and ASML system
Co-optimization : Overlay to Alignment, CD to Leveling & Dose
Metrology and Mark design : DBO, SCOL, Focus, Cell overlay
Device Integration and Yield Engineering - DRAM / FLASH
Semiconductor Manufacturing Systems – APC control, Machine learning, Scanner diagnostic system

Proceedings Article | 23 March 2020 Paper

Application of intra-field alignment to reduce wafer-to-wafer variation

Jangsun Kim, Seonho Lee, Hyunjun Ha, Boris Habets, Enrico Bellmann, Holger Bald, Tobias Hoeer, Seop Kim

Proceedings Volume 11327, 113270V (2020) https://doi.org/10.1117/12.2552735

KEYWORDS: Optical alignment, Semiconducting wafers, Overlay metrology, Neodymium, Computer simulations, Data modeling, Yield improvement, Electronics, Information technology, Standards development

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Proceedings Article | 26 March 2019 Paper

YieldStar uDBO overlay metrology in Samsung D1y DRAM volume production

Jang-Sun Kim, Jin-Moo Byun, Remco Lancee, Jong-Hyun Hwang, Hyeon-Jun Ha, Kwang-Young Hu, Se-Ra Jeon, Won-Jae Jang, Hyung-Sub Son, Vidar van der Meijden, Marc Noot, Bartosz Foltynski, Lukasz Macht, Grzegorz Grzela, Cedric Grouwstra

Proceedings Volume 10959, 109592M (2019) https://doi.org/10.1117/12.2514931

KEYWORDS: Overlay metrology, Metrology, Front end of line, Yield improvement, Control systems, Scatterometry

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SPIE Journal Paper | 29 March 2016

High-order distortion control using a computational prediction method for device overlay

Young Seog Kang, Cedric Affentauschegg, Jan Mulkens, Jang-Sun Kim, Ju Hee Shin, Young Ha Kim, YoungSun Nam, Young-Sin Choi, Hunhwan Ha, Dong-Han Lee, Jae-il Lee, Umar Rizvi, Bernd Geh, Rob van der Heijden, Jan Baselmans, Oh-Sung Kwon

JM3, Vol. 15, Issue 02, 021403, (March 2016) https://doi.org/10.1117/12.10.1117/1.JMM.15.2.021403

KEYWORDS: Overlay metrology, Metrology, Distortion, Control systems, Semiconducting wafers, Scanners, Etching, Information technology, Image processing, Photomasks

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Proceedings Article | 18 March 2015 Paper

Solution for high-order distortion on extreme illumination condition using computational prediction method

Young-Seog Kang, Hunhwan Ha, Jang-Sun Kim, Ju Hee Shin, Young Ha Kim, Young Sun Nam, Young-Sin Choi, Cedric Affentauschegg, Rob van der Heijden, Umar Rizvi, Bernd Geh, Eric Janda, Jan Baselmans, Stefan van der Sanden, Oh-Sung Kwon, Mariya Ponomarenko, Daan Slotboom

Proceedings Volume 9426, 942608 (2015) https://doi.org/10.1117/12.2086938

KEYWORDS: Overlay metrology, Distortion, Etching, Metrology, Image processing, Instrument modeling, Data modeling, Calibration, Photomasks, Measurement devices

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Proceedings Article | 18 March 2015 Paper

Overlay improvement methods with diffraction based overlay and integrated metrology

Young-Sun Nam, Sunny Kim, Ju Hee Shin, Young Sin Choi, Sang Ho Yun, Young Hoon Kim, Si Woo Shin, Jeong Heung Kong, Young Seog Kang, Hun Hwan Ha

Proceedings Volume 9426, 942612 (2015) https://doi.org/10.1117/12.2087196

KEYWORDS: Overlay metrology, Metrology, Semiconducting wafers, Diffraction, Target detection, Error analysis, Scanning electron microscopy, Statistical analysis, Manufacturing, Scanners

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Proceedings Article | 31 March 2014 Paper

Analysis of overlay errors induced by exposure energy in negative tone development process for photolithography

Young Ha Kim, Jang-Sun Kim, Young-Hoon Kim, Byeong-Ok Cho, Jinphil Choi, Young Seog Kang, Hunhwan Ha

Proceedings Volume 9052, 90520V (2014) https://doi.org/10.1117/12.2046265

KEYWORDS: Semiconducting wafers, Photomasks, Overlay metrology, Error analysis, Image processing, Optical lithography, Photoresist processing, Lithography, Double patterning technology, Image contrast enhancement

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Proceedings Article | 11 December 2009 Paper

In-shot (intra-field) overlay measurement considering overlay mark pattern dependency and illumination source dependency

Dong-han Lee, Jang-sun Kim, Gil-jin Lee, Sang-ho Lee, Yong-jin Cho, Young-Seog Kang, Woo-Sung Han

Proceedings Volume 7520, 752019 (2009) https://doi.org/10.1117/12.839675

KEYWORDS: Overlay metrology, Distortion, Control systems, Reticles, Nonlinear control, Scanners, Image segmentation, Complex systems, Double patterning technology, Optical lithography

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