Ms. Naoko Shirota Profile

Naoko Shirota

at Asahi Glass Co Ltd

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Author

Publications (6)

Proceedings Article | 26 March 2008 Paper

Highly hydrophobic materials for ArF immersion lithography

Yoko Takebe, Naoko Shirota, Takashi Sasaki, Koichi Murata, Osamu Yokokoji

Proceedings Volume 6923, 69231U (2008) https://doi.org/10.1117/12.772525

KEYWORDS: Polymers, Immersion lithography, Sputter deposition, Polymer thin films, Interfaces, Photoresist processing, Polymerization, Lithography, Scanning electron microscopy, Ions

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Proceedings Article | 2 April 2007 Paper

Development of top coat materials for ArF immersion lithography

Yoko Takebe, Naoko Shirota, Takashi Sasaki, Osamu Yokokoji

Proceedings Volume 6519, 65191Y (2007) https://doi.org/10.1117/12.711867

KEYWORDS: Polymers, Fluorine, Immersion lithography, Thin film coatings, Lithography, Polymerization, Scanning electron microscopy, Polymer thin films, Optical lithography, Semiconducting wafers

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Proceedings Article | 2 April 2007 Paper

Development of non-topcoat resist polymers for 193-nm immersion lithography

Naoko Shirota, Yoko Takebe, Shu-Zhong Wang, Takashi Sasaki, Osamu Yokokoji

Proceedings Volume 6519, 651905 (2007) https://doi.org/10.1117/12.712057

KEYWORDS: Polymers, Immersion lithography, Polymer thin films, Polymerization, Photoresist processing, Coating, Fluorine, Imaging systems, Lithography, Semiconducting wafers

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Proceedings Article | 29 March 2006 Paper

Development of fluoropolymer for 193nm immersion lithography

Naoko Shirota, Yoko Takebe, Takashi Sasaki, Osamu Yokokoji, Minoru Toriumi, Hiroshi Masuhara

Proceedings Volume 6153, 615324 (2006) https://doi.org/10.1117/12.656234

KEYWORDS: Polymers, Diffusion, Fluorine, Immersion lithography, Crystals, Quartz, Silicon, Water, Data analysis, Oscillators

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Proceedings Article | 29 March 2006 Paper

Development of new resist materials for 193-nm dry and immersion lithography

Takashi Sasaki, Naoko Shirota, Yoko Takebe, Osamu Yokokoji

Proceedings Volume 6153, 61530E (2006) https://doi.org/10.1117/12.656141

KEYWORDS: Polymers, Diffusion, Fluorine, Lithography, Resistance, Immersion lithography, Dry etching, Transparency, Etching, Absorption

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Proceedings Article | 12 May 2005 Paper

Development of fluoropolymers for pellicle in 157nm lithography

Shinji Okada, Hiromasa Yamamoto, Ikuo Matsukura, Naoko Shirota, Yuichirou Ishibashi, Hironao Sasaki, Iwao Higashikawa, Wataru Wakamiya

Proceedings Volume 5754, (2005) https://doi.org/10.1117/12.599311

KEYWORDS: Polymers, Fluorine, Transparency, Pellicles, Lithography, 193nm lithography, Hydrogen, FT-IR spectroscopy, Manufacturing, Polymerization

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Showing 5 of 6 publications

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