CONFERENCE PROCEEDINGS
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Dr. Michael Murphy
at TEL Technology Ctr America LLC
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Author
Publications (4)
SPIE Journal Paper | 22 November 2024
Sub-20-nm tip-to-tip enabled by anti-spacer patterning
Jodi Grzeskowiak, Michael Murphy, David Power, Steven Grzeskowiak, Jacob Dobson, Andrew Weloth, Charlotte Cutler, Eric Liu, David Conklin, Anton Devilliers
JM3, Vol. 24, Issue 01, 011004, (November 2024) https://doi.org/10.1117/12.10.1117/1.JMM.24.1.011004
Proceedings Article | 10 April 2024 Presentation
Breaching high-NA EUV dimensions with 193i anti-spacer multipatterning
Proceedings Volume 12957, 1295711 (2024) https://doi.org/10.1117/12.3010447
KEYWORDS: Extreme ultraviolet, Printing, Lithography, Optical lithography, Integrated circuits, Film thickness, Extreme ultraviolet lithography, Etching, Double patterning technology, Chemistry
Proceedings Article | 9 April 2024 Presentation + Paper
Sub-20nm tip-to-tip enabled by anti-spacer patterning
J. Grzeskowiak, M. Murphy, D. Power, S. Grzeskowiak, E. Liu, D. Conklin, A. deVilliers
Proceedings Volume 12957, 129570U (2024) https://doi.org/10.1117/12.3009982
KEYWORDS: Double patterning technology, Advanced patterning, Photoresist materials, Optical lithography, Etching, Extreme ultraviolet, Design, Extreme ultraviolet lithography, Lithography, Scanning electron microscopy, Printing, Semiconducting wafers
Proceedings Article | 30 April 2023 Presentation
Process signature correction through film thickness modification of a spin-on glass film
Jodi Grzeskowiak, Michael Murphy, Daniel Fulford, David Conklin
Proceedings Volume 12498, 1249808 (2023) https://doi.org/10.1117/12.2657589
KEYWORDS: Glasses, Semiconducting wafers, Chemistry, Semiconductor manufacturing, Optical lithography, Metals, Laser systems engineering, Integrated circuits, Etching, Double patterning technology
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