We experimentally implement a novel strategy for dielectric nanophotonics: resonant subwavelength localized confinement of light in air. We demonstrate that individual voids created in high-index dielectric host materials support localized resonant modes that do not suffer from the loss and dispersion of the host medium and are weakly dependent on the void geometry. We show that Mie void modes in dispersive dielectric materials, e.g. silicon, possess a large quality factor, comparable or larger than that for silicon resonant nanoparticles in the visible and UV. We experimentally realize resonant Mie voids by focused ion beam milling into bulk silicon wafers. We experimentally demonstrate resonant light confinement with individual Mie voids from visible down to the UV spectral range at 265 nm. We also experimentally demonstrate a high locality of optical properties of individual voids, which allows implementing them as non-interfering pixels while arranged densely in lattices. Using this property, we further experimentally utilize the bright, intense, and naturalistic colours for nanoscale colour printing.
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