Dr. Koji Nozaki Profile

Dr. Koji Nozaki

Director at Fujitsu Ltd

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Author

Publications (5)

Proceedings Article | 12 June 2003 Paper

Overcoat materials for acrylate resists to enhance their resolution

Koji Nozaki, Miwa Igarashi, Ei Yano, Hajime Yamamoto, Satoshi Takechi, Isamu Hanyu

Proceedings Volume 5039, (2003) https://doi.org/10.1117/12.487727

KEYWORDS: Polymethylmethacrylate, Line edge roughness, Polymers, Resolution enhancement technologies, Etching, Oxides, Lithography, Photoresist processing, Scanning electron microscopy, Photography

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Proceedings Article | 23 June 2000 Paper

High-performance EB chemically amplified resists using alicyclic protective groups

Jun-Ichi Kon, Koji Nozaki, Takahisa Namiki, Ei Yano

Proceedings Volume 3999, (2000) https://doi.org/10.1117/12.388288

KEYWORDS: Dry etching, Lithography, Chemically amplified resists, Deep ultraviolet, Etching, Photomicroscopy, Plasma, Electron beams, Scanning electron microscopy, Optical lithography

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Proceedings Article | 9 June 1995 Paper

Environmentally stable chemically amplified resist effects of organic salt additives

Ei Yano, Yohko Kuramitsu, Keiji Watanabe, Takahisa Namiki, Koji Nozaki, Miwa Igarashi

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210360

KEYWORDS: Contamination, Ion exchange, Chemically amplified resists, Ions, Excimer lasers, Spectroscopy, Quantum efficiency, Transmittance, Absorption, Deep ultraviolet

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Proceedings Article | 9 June 1995 Paper

Evaluation of chemically amplified resist based on adamantyl methacrylate for 193-nm lithography

Makoto Takahashi, Satoshi Takechi, Yuko Kaimoto, Isamu Hanyu, Naomichi Abe, Koji Nozaki

Proceedings Volume 2438, (1995) https://doi.org/10.1117/12.210352

KEYWORDS: Coating, Polymers, Lithography, Standards development, Chemically amplified resists, Photoresist processing, Resistance, Transparency, Silicon, Transmittance

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Proceedings Article | 1 June 1992 Paper

Alicyclic polymer for ArF and KrF excimer resist based on chemical amplification

Yuko Kaimoto, Koji Nozaki, Satoshi Takechi, Naomichi Abe

Proceedings Volume 1672, (1992) https://doi.org/10.1117/12.59727

KEYWORDS: Etching, Polymers, Resistance, Excimers, Lithography, Dry etching, Polymethylmethacrylate, Silicon, Argon, Excimer lasers

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