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Kiwook Park
at SK Hynix Inc.
SPIE Involvement:
Author
Publications (1)
Proceedings Article | 12 October 2021 Presentation + Paper
Sensitivity analysis based SEM measurement down-sampling approach for mask process modeling applications
Proceedings Volume 11855, 118550Z (2021) https://doi.org/10.1117/12.2600926
KEYWORDS: Data modeling, Calibration, Photomasks, Process modeling, Statistical modeling, Scanning electron microscopy, Metrology, Critical dimension metrology, Error analysis
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