We demonstrate the metamorphic growth of InAs1-xSbx (x = 0.08 – 0.68) layers on GaAs substrate with an optimized InAs-based intermediate buffer layer by molecular beam epitaxy. The broad range of group-V flux ratio is applied to investigate the effect between Sb incorporation and material quality. We find that high Sb compositions significantly roughen surface morphology, and that optimized growth temperature is crucial to prevent phase separation and surface segregation of Sb atoms. In addition, we achieve a high degree of strain relaxation (~94%) in the metamorphic InAsSb layers even with a 58% Sb composition. This result indicates that our InAs/GaAs virtual substrate is suitable for the growth of an almost fully relaxed InAsSb layer. Also, we investigate a threading dislocation density (TDD) trend with the broad range of Sb compositions, and a drastically increasing TDD trend (> 200 times) was observed. Finally, we report a narrow bandgap of 0.13 eV at 10 K of the InAs0.42Sb0.58 layer, which is promising for the detection of longwavelength infrared radiation. This InAsSb layer on GaAs substrate opens up possibility for mid-wavelength and long-wavelength infrared optoelectronics applications.
In this study, we investigated the methods for prolonged lifetime in the CsPbX3 (X: Cl, Br, I) structured perovskite materials. First, the changes in structural and optical properties were compared by doping Ni in the CsPbBr3 quantum dots (QDs). The steady-state photoluminescence (PL) intensity of Ni-doped QDs shows 3.8 times increase comparing with undoped QDs. CsPbBr3 without nickel had a quantum efficiency of only 56.7 %, whereas CsPbBr3 doped with nickel had a quantum efficiency of 82.9 %. It was found that the doped divalent element acts as a defect in the perovskite structure, reducing the recombination rate of electrons and holes. After 48 hours UV-light irradiation, PL intensity of CsPbBr3 decreased about 70 % while that of Ni-substituted CsPbBr3 QDs decreased only 18 %, indicating the prolonged stability against UV-light irradiation. Furthermore, Ni-substituted CsPbBr3 QDs shows higher stability against temperature and moisture. These results confirmed that Ni substitution method is effective to increase the stability of CsPbX3 QDs. Second, we used sulfuroleylamine (S-OLA) complex which was utilized to etch the defect-rich surface of the CsPbI3 QDs and then self-assembly to form a matrix outside the CsPbI3 QDs protected the QDs from environmental moisture and solar irradiation. The PL intensity of the CsPbI3 QDs increased by 21% of its initial value. There was a significant increase in the colloidal stability of the CsPbI3 QDs. The introduction of S-OLA induced the recovery of the lost photoluminescence of the nonluminous aged CsPbI3 QDs with time to 95% of that of the fresh QDs. Furthermore, the PL was maintained for one month. The increase in the stability and PL intensity are critical for realizing high-performance perovskite-QD-based devices.
In this study, we investigated the methods for prolonged lifetime in the CsPbX3 (X: Cl, Br, I) structured perovskite materials. First, the changes in structural and optical properties were compared by doping Ni in the CsPbBr3 quantum dots (QDs). It was found that the doped divalent element acts as a defect in the perovskite structure, reducing the recombination rate of electrons and holes. Ni-substituted CsPbBr3 QDs shows higher stability against temperature and moisture. These results confirmed that Ni substitution method is effective to increase the stability of CsPbX3 QDs. Second, we used sulfuroleylamine (S-OLA) complex which was utilized to etch the defect-rich surface of the CsPbI3 QDs and then self-assembly to form a matrix outside the CsPbI3 QDs protected the QDs from environmental moisture and solar irradiation. The introduction of S-OLA induced the recovery of the lost photoluminescence of the nonluminous aged CsPbI3 QDs with time to 95% of that of the fresh QDs.
We report multilevel resistive switching using an organolead halide perovskite (OHP). Solution-processed 400 nm thick
CH3NH3PbI3 films with Ag top and Pt bottom electrodes exhibited electroforming-free resistive switching with a low
SET voltage of ~0.13 V and high ON/OFF ratios of ≈10^6 under ±0.15 V pulses. Based on these extraordinary properties, four-level storage capability of the CH3NH3PbI3-based devices was demonstrated. We attributed the high performance resistive switching behavior of the CH3NH3PbI3-based devices to the energetically benign migration of anions defects, but further studies are needed to identify the mechanism responsible for the ultralow electric field resistive switching. Enhancements in switching speed, endurance, and retention are also necessary and may be achieved by controlling the doping concentration, crystallinity, and large area compositional uniformity of the OHP film. The inherent structural flexibility and the number of possible combinations for ABX3-type OHPs will support intensive studies for other electronic device applications beyond resistive switching memories. Finally, we believe that the solution-processed CH3NH3PbI3-based cells are promising for microelectronics built on flexible substrates.
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