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Dr. Helen R. Armer
Applied Knowledge Base Director at Applied Materials Inc
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Publications (1)
Proceedings Article | 24 March 2006 Paper
Metrology delay time reduction in lithography via small-lot wafer transport
Vinay Shah, Eric Englhardt, Sushant Koshti, Helen Armer
Proceedings Volume 6152, 61523J (2006) https://doi.org/10.1117/12.657964
KEYWORDS: Semiconducting wafers, Metrology, Time metrology, Manufacturing, Overlay metrology, Inspection, Lithography, Optical lithography, Control systems design, Scanners
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