This course provides attendees with a comprehensive knowledge of recent advances in electron beam lithography. The course concentrates on innovative new techniques which have been and still are being developed to overcome throughput limitations encountered with more conventional e-beam systems. The new electron optics techniques are based on 'massively parallel' projection of pixels and several practical examples of these emerging lithography technologies are presented and analysed. The various technical challenges of ongoing tool development efforts are discussed together with their potential for advancing the state-of-the-art in electron beam lithography. Applications considered for these new lithography tools are discussed in context of their lithographic capability, their business value and viability. You will be able to identify emerging lithographic technologies by their specific level of complexity which will enable you to judge their applicability and opportunity for success.

This course provides attendees with a comprehensive knowledge of recent advances in electron beam lithography. The course concentrates on innovative new techniques which have been and still are being developed to overcome throughput limitations encountered with more conventional e-beam systems. The new electron optics techniques are based on 'massively parallel' projection of pixels and several practical examples of these emerging lithography technologies are presented and analysed. The various technical challenges of ongoing tool development efforts are discussed together with their potential for advancing the state-of-the-art in electron beam lithography. Applications considered for these new lithography tools are discussed in context of their lithographic capability, their business value and viability. You will be able to identify emerging lithographic technologies by their specific level of complexity which will enable you to judge their applicability and opportunity for success. The course price includes a complete set of black and white handouts of the charts presented by the instructor.

Electron-beam lithography is used for patterning photo masks, for writing directly on semiconductor substrates, and for R&D in nanofabrication. This course provides a brief history of the technique, and an overview of the electron-optical, mechanical, and electronic components that make an electron lithography tool. The advantages provided by this maskless, high resolution technology will be discussed together with its limitations set by the physics of charged particles. Writing methods will be compared and contrasted in their performance, including raster scan, vector scan, shaped beam, cell projection, and multi beam techniques. The most severe limitation of electron beam lithography tools is low throughput but limits of resolution and placement accuracy will be addressed as well. A particular focus will be on the recent advances in the state-of-the-art based on 'massively parallel' projection of pixels to overcome the throughput handicap. Several practical examples of these emerging lithography technologies are presented and the various technical challenges faced by the ongoing tool development efforts are discussed. You will be able to identify emerging lithographic technologies by their specific level of complexity which will enable you to judge their applicability in the semiconductor fabrication process and their opportunity for success. Applications considered for these new lithography tools under development are outlined in context of their lithographic capability, their business value and viability. The course provides a forecast of the technology's future and how it relates to the ever-decreasing feature sizes in semiconductor manufacturing.