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Hanh Pham
at CEA-LETI
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Publications (1)
Proceedings Article | 3 April 2020 Paper
Establishing a sidewall image transfer chemo-epitaxial DSA process using 193 nm immersion lithography
G. Rademaker, A. Le Pennec, T. Giammaria, K. Benotmane, H. Pham, C. Bouet, M. G. Gusmao Cacho, M. Argoud, M.-L. Pourteau, A. Paquet, A. Gharbi, C. Navarro, C. Nicolet, X. Chevalier, K. Sakavuyi, P. Nealey, R. Tiron
Proceedings Volume 11326, 113260Z (2020) https://doi.org/10.1117/12.2552003
KEYWORDS: Lithography, Metrology, Directed self assembly, Immersion lithography, Photomasks, Optical lithography, Etching, Critical dimension metrology, Semiconducting wafers
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