Dr. Geert Vandenberphe Profile

Dr. Geert Vandenberphe

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Proceedings Article | 1 May 2023 Poster + Paper

Recent advances in EUV patterning in preparation towards high-NA EUV

Seiji Nagahara, Arnaud Dauendorffer, Arame Thiam, Xiang Liu, Yuhei Kuwahara, Cong Que Dinh, Soichiro Okada, Shinichiro Kawakami, Hisashi Genjima, Noriaki Nagamine, Makoto Muramatsu, Satoru Shimura, Atsushi Tsuboi, Kathleen Nafus, Yannick Feurprier, Marc Demand, Rajesh Ramaneti, Philippe Foubert, Danilo De Simone, Geert Vendenberghe

Proceedings Volume 12498, 124981G (2023) https://doi.org/10.1117/12.2657432

KEYWORDS: Optical lithography, Extreme ultraviolet, Extreme ultraviolet lithography, Interfaces, Etching, Coating thickness, Lithography, Stochastic processes, Critical dimension metrology

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