Mr. Gandolf Feigl Profile

Gandolf Feigl

at Technische Univ Graz

SPIE Involvement:

Author

Publications (4)

Proceedings Article | 18 June 2024 Paper

Enhancing silicon nitride waveguide performance: optimization of sidewall roughness for low-loss applications through resist reflowing via tree-based modeling of relevant processing parameters

Jakob Wilhelm Hinum-Wagner, Samuel Marko Hoermann, Gandolf Feigl, Christoph Schmidt, Jochen Kraft, Alexander Bergmann

Proceedings Volume 13011, 1301102 (2024) https://doi.org/10.1117/12.3017081

KEYWORDS: Waveguides, Annealing, Silicon, Wave propagation, Data modeling, Semiconducting wafers, Plasma enhanced chemical vapor deposition, Diffractive optical elements, Low pressure chemical vapor deposition, Design

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Proceedings Article | 18 June 2024 Paper

Comparative analysis of fabrication techniques for sensing windows on silicon nitride waveguide platforms

Jakob Wilhelm Hinum-Wagner, Samuel Marko Hoermann, Gandolf Feigl, Christoph Schmidt, Deborah Morecroft, Jochen Kraft, Alexander Bergmann

Proceedings Volume 13012, 130120N (2024) https://doi.org/10.1117/12.3008895

KEYWORDS: Waveguides, Windows, Semiconducting wafers, Plasma enhanced chemical vapor deposition, Fabrication, Etching, Low pressure chemical vapor deposition, Wave propagation, Silicon nitride, Silicon

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Proceedings Article | 30 November 2023 Paper

CART-based optimization of core and cladding layers in silicon nitride photonic integrated circuits towards propagation and bend loss minimization

Jakob Wilhelm Hinum-Wagner, Peter Scheibelhofer, Samuel Marko Hörmann, Christoph Schmidt, Gandolf Feigl, Jochen Kraft, Alexander Bergmann

Proceedings Volume 12794, 127940S (2023) https://doi.org/10.1117/12.3000805

KEYWORDS: Waveguides, Silicon, Semiconducting wafers, Wave propagation, Data modeling, Diffractive optical elements, Cladding, Low pressure chemical vapor deposition, Plasma enhanced chemical vapor deposition, Photonic integrated circuits

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Proceedings Article | 31 May 2023 Presentation + Paper

Design optimization of silicon nitride-based micro-ring resonator systems in a CMOS mass production environment

Jakob Wilhelm Hinum-Wagner, Anton Buchberger, Christoph Schmidt, Christian Schörner, Desiree Rist, Samuel Marko Hoermann, Gandolf Feigl, Iga Malicka, Stephan Janka, Jochen Kraft, Alexander Bergmann

Proceedings Volume 12575, 125750A (2023) https://doi.org/10.1117/12.2665322

KEYWORDS: Semiconducting wafers, Waveguides, Silicon, Resonators, Design and modelling, Fabrication, Simulations, Plasma enhanced chemical vapor deposition, Microrings, Low pressure chemical vapor deposition

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