Prof. Changqing Xie Profile

Prof. Changqing Xie

at Institute of Microelectronics

SPIE Involvement:

Author

Publications (19)

SPIE Journal Paper | 26 June 2024

Diffraction-limited high-efficiency extreme ultraviolet metalens at 13.5 nm wavelength based on nanohole array in molybdenum membrane

Shengchao Duan, Huiwen Xue, He Li, Changqing Xie, Lina Shi

OE, Vol. 63, Issue 06, 067105, (June 2024) https://doi.org/10.1117/12.10.1117/1.OE.63.6.067105

KEYWORDS: Molybdenum, Extreme ultraviolet, Silicon, Refractive index, Vacuum, Optical transmission, Metalenses, Optical engineering, Signal intensity, Imaging spectroscopy

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SPIE Journal Paper | 21 December 2023

Planar crossed-fork gratings with sinusoidal transmittance for eliminating high-order diffraction

Jun Zheng, Jiebin Niu, Yilei Hua, Chuhao Yao, Hailiang Li, Changqing Xie

OE, Vol. 62, Issue 12, 125104, (December 2023) https://doi.org/10.1117/12.10.1117/1.OE.62.12.125104

KEYWORDS: Diffraction, Diffraction gratings, Optical gratings, Transmittance, Technetium, Signal intensity, Optical engineering, Optical vortices, Fabrication, Silicon

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Proceedings Article | 19 March 2018 Paper

Low-stress and high-reflectance Mo/Si multilayers for EUVL by magnetron sputtering deposition with bias assistance

Bo Yu, Liping Wang, Hailiang Li, Yao Xie, Hui Wang, Haitao Zhang, Shun Yao, Yu Liu, Jie Yu, Chun Li, Changqing Xie, Chunshui Jin

Proceedings Volume 10583, 105831T (2018) https://doi.org/10.1117/12.2294479

KEYWORDS: Silicon, Multilayers, Reflectivity, Molybdenum, Extreme ultraviolet, Crystals, Sputter deposition, Argon, Ions, Extreme ultraviolet lithography

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Proceedings Article | 19 September 2017 Presentation

Fabrication and test of quasiperiodic x-ray reflection gratings for high-order diffraction suppression (Conference Presentation)

Yilei Hua, Lina Shi, Hailiang Li, Changqing Xie

Proceedings Volume 10386, 103860P (2017) https://doi.org/10.1117/12.2272428

KEYWORDS: Diffraction gratings, X-rays, Diffraction, X-ray diffraction, Reflection, X-ray astronomy, Optical fabrication, Synchrotron radiation, Interferometers, Silicon

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X-ray diffraction gratings with periodic structures have been widely used in various x-ray instruments and systems, such as synchrotron radiation, x-ray interferometer, x-ray astronomy and plasma diagnostics in the field of laser fusion. However, conventional diffraction gratings suffer from so-called high order diffraction contamination. Here we present a large-area quasiperiodic x-ray reflection grating fabricated by high-speed electron beam direct writing technique. The grating consists of a large number of circular holes for the high order diffraction suppression. The 3rd and even order diffractions can be completely eliminated, and the 5th order diffraction is as low as 0.02% of the 1st order diffraction. Shipley SAL-601 with high-resolution, high sensitivity and good resistance is used for electron beam lithography, followed by dry silicon etching and Au thin film deposition using magnetron sputtering. Since the surface roughness and flatness of the x-ray reflection gratings have a great impact on the dispersion performance, we optimized the fabrication the inductively coupled plasma (ICP) silicon etching process, and tested the surface roughness and flatness of the x-ray reflection gratings by an atomic force microscope and a Zygo interferometer, respectively. The optical characterization of the fabricated quasiperiodic x-ray reflection gratings was performed at the spectral radiation standard and metrology beamline BL08B, national synchrotron radiation laboratory of China. The test results demonstrated the effectiveness of high order diffraction suppression. The capability of high order diffraction suppression and fabrication constraints and the limitation of the diffraction efficiency of the quasiperiodic x-ray reflection gratings are also discussed. The unique high order diffraction suppression properties of the quasiperiodic x-ray reflection gratings may provide a platform for x-ray spectroscopic instruments in laboratory sciences and synchrotron light sources.

Proceedings Article | 23 August 2017 Presentation + Paper

Nanofabrication of free-standing spectroscopic photon sieves operating in soft x-ray region

Xiaoli Zhu, Lai Wei, Hailiang Li, Leifeng Cao, Changqing Xie

Proceedings Volume 10386, 103860Q (2017) https://doi.org/10.1117/12.2272803

KEYWORDS: Electron beam lithography, X-rays, Diffraction, Spectroscopy, Diffraction gratings, Lithography, X-ray lithography, X-ray diffraction, Gold

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SPIE Journal Paper | 19 August 2017

Nanofabrication and characterization of high-line-density x-ray transmission gratings

Xiaoli Zhu, Hailiang Li, Leifeng Cao, Shenye Liu, Peixiong Shi, Changqing Xie

JM3, Vol. 16, Issue 03, 034503, (August 2017) https://doi.org/10.1117/12.10.1117/1.JMM.16.3.034503

KEYWORDS: X-rays, Electron beam lithography, X-ray diffraction, X-ray lithography, Gold, X-ray characterization, Nanofabrication, Diffraction gratings, Photomasks, Diffraction

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SPIE Journal Paper | 5 March 2013

Fabrication of x-ray diffractive optical elements for laser fusion applications

Changqing Xie, Xiaoli Zhu, Hailiang Li, Jiebin Niu, Yilei Hua, Lina Shi

OE, Vol. 52, Issue 03, 033402, (March 2013) https://doi.org/10.1117/12.10.1117/1.OE.52.3.033402

KEYWORDS: X-rays, X-ray lithography, Gold, Silicon carbide, X-ray diffraction, Electron beam lithography, X-ray optics, Laser welding, Diffraction gratings, Lithography

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Proceedings Article | 12 January 2009 Paper

Fabrication of transmission gratings for extreme ultraviolet interference lithography

Jie Ma, Xiaoli Zhu, Weizhong Zhu, Changqing Xie, Tianchun Ye, Peixiong Shi

Proceedings Volume 7133, 713336 (2009) https://doi.org/10.1117/12.810640

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SPIE Journal Paper | 1 May 2008

Design, fabrication, and test of soft x-ray sinusoidal transmission grating

Min Zhao, Xiaoli Zhu, Baoqin Chen, Changqing Xie, Min Liu, Jiebing Niu, Longyu Kuang, Leifeng Cao

OE, Vol. 47, Issue 05, 058001, (May 2008) https://doi.org/10.1117/12.10.1117/1.2919717

KEYWORDS: X-ray lithography, X-rays, Diffraction gratings, Diffraction, Lithography, Photomasks, Gold, X-ray diffraction, Spectroscopy, Spectrographs

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Proceedings Article | 15 January 2008 Paper

Near-field diffraction analysis and simulation about nanoscale of Fresnel zone plate

Ji Jang, Changqing Xie, Xiping Xu, Xiaoli Zhu, Ming Liu

Proceedings Volume 6832, 68321S (2008) https://doi.org/10.1117/12.755092

KEYWORDS: Diffraction, Zone plates, X-rays, Near field diffraction, X-ray diffraction, Computer simulations, X-ray astronomy, X-ray lithography, X-ray technology, Synchrotron x-ray imaging

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Proceedings Article | 4 January 2008 Paper

Fabrication of 200 nm period x-ray transmission gratings using electron beam lithography

Xiaoli Zhu, Changqing Xie, Tianchun Ye, Min Zhao, Jie Ma, Ji Jiang, Jiebin Niu, Ming Liu

Proceedings Volume 6832, 68320V (2008) https://doi.org/10.1117/12.758100

KEYWORDS: X-ray lithography, X-rays, Electron beam lithography, Gold, Electroplating, Polymethylmethacrylate, Photomasks, Silicon, X-ray telescopes, Photoresist processing

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Proceedings Article | 21 November 2007 Paper

Fabrication of quantum dot array diffraction grating for soft x-ray spectroscopy

Min Zhao, XiaoLi Zhu, Baoqin Chen, ChangQing Xie, Ming Liu, Leifeng Cao

Proceedings Volume 6724, 67241O (2007) https://doi.org/10.1117/12.782916

KEYWORDS: X-rays, Spectroscopy, Diffraction, Electron beam lithography, X-ray diffraction, X-ray lithography, Gold, Photomasks, Electron beams, Silicon

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Proceedings Article | 21 November 2007 Paper

Analysis of the resolution doubling technique of high-resolution gratings by x-ray lithography

Jie Ma, Xiaoli Zhu, Changqing Xie, Ming Liu, Min Zhao, Ji Jiang

Proceedings Volume 6827, 68272A (2007) https://doi.org/10.1117/12.757819

KEYWORDS: Photomasks, X-ray lithography, Semiconducting wafers, X-rays, Gold, Beam propagation method, Optical design, Wave propagation, Light wave propagation, Lithography

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Proceedings Article | 21 November 2007 Paper

Analysis of property of HSQ in electron beam lithography

Min Zhao, XiaoLi Zhu, Baoqin Chen, Jiebin Niu, Ming Liu, Changqing Xie

Proceedings Volume 6827, 682728 (2007) https://doi.org/10.1117/12.757739

KEYWORDS: Electron beam lithography, Silicon, Electron beams, Chemical species, Hydrogen, Backscatter, Nanoimprint lithography, Lithography, Nanolithography, Nanostructures

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Proceedings Article | 14 November 2007 Paper

Fabrication of x-ray diffractive optical elements for ICF target diagnosis

Xiaoli Zhu, Deqiang Wang, Changqing Xie, Leifeng Cao, Jiamin Yang, Tianchun Ye, Jiebin Niu, Baoqin Chen, Ming Liu

Proceedings Volume 6722, 672208 (2007) https://doi.org/10.1117/12.782678

KEYWORDS: X-rays, Electron beam lithography, Diffractive optical elements, Electroplating, Gold, Photomasks, X-ray diffraction, X-ray lithography, Silicon, X-ray optics

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SPIE Journal Paper | 1 January 2006

Microzone plates with high-aspect ratio fabricated by e-beam and x-ray lithography

De-Qiang Wang, Leifeng Cao, Changqing Xie, Ming Liu, Tianchun Ye

JM3, Vol. 5, Issue 01, 013002, (January 2006) https://doi.org/10.1117/12.10.1117/1.2170110

KEYWORDS: Electron beam lithography, X-ray lithography, Photomasks, Gold, Nickel, X-rays, Scanning electron microscopy, Lithography, Silicon, Zone plates

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Proceedings Article | 27 January 2005 Paper

Analysis of nanometer-isolated trench diffract aerial image of both conventional and second-generation synchrotron-based proximity x-ray lithography

Changqing Xie, Dapeng Chen, Ming Liu, Tianchun Ye, Futing Yi

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573232

KEYWORDS: Tantalum, X-rays, Semiconducting wafers, X-ray lithography, Photomasks, X-ray imaging, Beam propagation method, X-ray diffraction, Image resolution, Silicon

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Proceedings Article | 27 January 2005 Paper

The advanced nanofabrication technology

Ming Liu, Qiuxia Xu, Baoqin Chen, Changqing Xie, Tianchun Ye, Xinchun Liu

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.570206

KEYWORDS: Optical lithography, Electron beam lithography, Lithography, X-ray lithography, Photomasks, Gallium arsenide, Optical proximity correction, Etching, Nanofabrication, Resolution enhancement technologies

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Proceedings Article | 27 January 2005 Paper

A new ZEP520/P(MMA-MAA)/ZEP520 trilayer process for T-shaped gate using synchrotron-based proximity x-ray lithography

Changqing Xie, Dapeng Chen, Jiebing Niu, Ming Liu, Tianchun Ye, Futing Yi, Liangqiang Peng

Proceedings Volume 5645, (2005) https://doi.org/10.1117/12.573519

KEYWORDS: Electron beam lithography, X-ray lithography, Photoresist processing, Lithography, Photomasks, Head, X-rays, Silicon, Polymethylmethacrylate, Semiconducting wafers

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Showing 5 of 19 publications

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