Dr. Bryan D. Vogt Profile

Dr. Bryan D. Vogt

Chemical Engineer at National Institute of Standards and Technology

SPIE Involvement:

Author

Publications (13)

Proceedings Article | 3 April 2007 Paper

FTIR measurements of compositional heterogeneities

Shuhui Kang, Bryan Vogt, Wen-li Wu, Vivek Prabhu, David VanderHart, Ashwin Rao, Eric Lin, Karen Turnquest

Proceedings Volume 6519, 651916 (2007) https://doi.org/10.1117/12.712659

KEYWORDS: Hydrogen, Optical spheres, FT-IR spectroscopy, Polymers, Photoresist materials, Solids, Line edge roughness, Data modeling, Spectroscopy, Polymer thin films

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Proceedings Article | 22 March 2007 Paper

Direct measurement of the in-situ developed latent image: the residual swelling fraction

Vivek Prabhu, Bryan Vogt, Shuhui Kang, Ashwin Rao, Eric Lin, Sushil Satija, Karen Turnquest

Proceedings Volume 6519, 651910 (2007) https://doi.org/10.1117/12.712311

KEYWORDS: Polymers, Reflectivity, Interfaces, Scattering, Photoresist materials, Photoresist developing, Silicon, X-rays, In situ metrology, Standards development

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Proceedings Article | 22 March 2007 Paper

Evaluation of the 3D compositional heterogeneity effect on line-edge-roughness

Shuhui Kang, Wen-Li Wu, Vivek Prabhu, Bryan Vogt, Eric Lin, Karen Turnquest

Proceedings Volume 6519, 65193V (2007) https://doi.org/10.1117/12.712682

KEYWORDS: Line edge roughness, Switches, Diffusion, Photoresist materials, Optical spheres, Polymers, 3D modeling, Computer simulations, Photoresist developing, Standards development

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Proceedings Article | 29 March 2006 Paper

The deprotection reaction front profile in model 193 nm methacrylate-based chemically amplified photoresists

Bryan Vogt, Shuhui Kang, Vivek Prabhu, Ashwin Rao, Eric Lin, Sushil Satija, Karen Turnquest, Wen-li Wu

Proceedings Volume 6153, 615316 (2006) https://doi.org/10.1117/12.656464

KEYWORDS: FT-IR spectroscopy, Diffusion, Reflectivity, Line edge roughness, Photoresist materials, Image quality, Image processing, Standards development, Polymers, Scattering

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Proceedings Article | 29 March 2006 Paper

Dissolution fundamentals of 193-nm methacrylate-based photoresists

Ashwin Rao, Shuhui Kang, Bryan Vogt, Vivek Prabhu, Eric Lin, Wen-Li Wu, Karen Turnquest, William Hinsberg

Proceedings Volume 6153, 615310 (2006) https://doi.org/10.1117/12.656540

KEYWORDS: Polymers, Photoresist materials, Quartz, Crystals, Photoresist developing, Lithography, Chemistry, Molecules, Standards development, Infrared spectroscopy

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Proceedings Article | 29 March 2006 Paper

Fundamentals of the reaction-diffusion process in model EUV photoresists

Kristopher Lavery, Kwang-Woo Choi, Bryan Vogt, Vivek Prabhu, Eric Lin, Wen-li Wu, Sushil Satija, Michael Leeson, Heidi Cao, George Thompson, Hai Deng, David Fryer

Proceedings Volume 6153, 615313 (2006) https://doi.org/10.1117/12.656831

KEYWORDS: Photoresist materials, Reflectivity, Interfaces, Diffusion, Polymers, Line width roughness, Process modeling, Extreme ultraviolet lithography, Extreme ultraviolet, Lithography

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Proceedings Article | 29 March 2006 Paper

Copolymer fraction effect on acid catalyzed deprotection reaction kinetics in model 193 nm photoresists

Shuhui Kang, Vivek Prabhu, Bryan Vogt, Eric Lin, Wen-Li Wu, Karen Turnquest

Proceedings Volume 6153, 61533N (2006) https://doi.org/10.1117/12.656594

KEYWORDS: Polymers, Photoresist materials, Diffusion, FT-IR spectroscopy, Data modeling, Glasses, Ultraviolet radiation, Spectroscopy, Chemical reactions, Hydrogen

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Proceedings Article | 4 May 2005 Paper

Water distribution within immersed polymer films

Bryan Vogt, Christopher Soles, Vivek Prabhu, Sushil Satija, Eric Lin, Wen-li Wu

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.599746

KEYWORDS: Interfaces, Reflectivity, Silicon, Polymers, Scattering, Water, Head-mounted displays, Polymer thin films, Photoresist materials, Semiconducting wafers

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Proceedings Article | 4 May 2005 Paper

Interfacial structure of photoresist thin films in developer solutions

Vivek Prabhu, Bryan Vogt, Wen-Li Wu, Jack Douglas, Eric Lin, Sushil Satija, Dario Goldfarb, Hiroshi Ito

Proceedings Volume 5753, (2005) https://doi.org/10.1117/12.598956

KEYWORDS: Polymers, Reflectivity, Interfaces, Ionization, Photoresist materials, Thin films, Photoresist developing, Standards development, Dielectrics, Liquids

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SPIE Journal Paper | 1 January 2005

Water immersion of model photoresists: interfacial influences on water concentration and surface morphology

Bryan Vogt, Christopher Soles, Chia-Ying Wang, Vivek Prabhu, Patricia McGuiggan, Jack Douglas, Eric Lin, Wen-Li Wu, Sushil Satija, Dario Goldfarb, Marie Angelopoulos

JM3, Vol. 4, Issue 01, 013003, (January 2005) https://doi.org/10.1117/12.10.1117/1.1861852

KEYWORDS: Interfaces, Polymers, Oxides, Head-mounted displays, Photoresist materials, Silicon, Liquids, Absorption, Polymer thin films, Silicon films

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Proceedings Article | 14 May 2004 Paper

Fundamentals of developer-resist interactions for line-edge roughness and critical dimension control in model 248-nm and 157-nm photoresists

Vivek Prabhu, Michael Wang, Erin Jablonski, Bryan Vogt, Eric Lin, Wen-Li Wu, Dario Goldfarb, Marie Angelopoulos, Hiroshi Ito

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535862

KEYWORDS: Reflectivity, Photoresist developing, Surface roughness, Atomic force microscopy, Polymers, Photoresist materials, Scattering, Critical dimension metrology, Semiconducting wafers, X-rays

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Proceedings Article | 14 May 2004 Paper

Measurements of water distribution in thin lithographic films

Bryan Vogt, Christopher Soles, Vivek Prabhu, Ronald Jones, Wen-Li Wu, Eric Lin, Dario Goldfarb, Marie Angelopoulos

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.535881

KEYWORDS: Reflectivity, Interfaces, Silicon, Photoresist materials, Polymers, Oxides, Scattering, Thin films, Head-mounted displays, Silicon films

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Proceedings Article | 14 May 2004 Paper

Resolution limitations in chemically amplified photoresist systems

Gerard Schmid, Michael Stewart, Chia-Ying Wang, Bryan Vogt, Vivek Prabhu, Eric Lin, C. Willson

Proceedings Volume 5376, (2004) https://doi.org/10.1117/12.536656

KEYWORDS: Diffusion, Photoresist materials, Polymers, Molecules, Scattering, Interfaces, Lithography, Distance measurement, Manufacturing, Chemically amplified resists

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Showing 5 of 13 publications

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