Multicolor approaches to resolution enhancement in visible-light lithography hold the promise to afford resolution on the scale of tens of nm for large-area nanofabrication at a cost that is attractive for medium- to small-volume manufacturing applications, as well as in the research laboratory. In this talk I will review the history of multicolor lithography and discuss some of the latest advances in materials and methods.
Three-color lithography (3CL) is a technique for fabricating high-resolution nanopatterns using visible light. This technique has been benchmarked in one promising photoresist by fabricating arrays of posts in a three-color material. The smallest posts are ~130nm in diameter, and the best pitches are around 180nm. If the 3CL deactivation step is not used, any features that are fabricated this close together merge due to proximity effects. The benefit of 3CL over other techniques, such as multi-patterning and extreme UV lithography, is that 3CL uses inexpensive optics and light sources, and the setup is simpler because high vacuum is not necessary.
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