The design rule requirements and error budget allocation for maskmaking have made the mask a critical component in the fabrication of 250 nm design rule IC devices. The MEBES 4500 raster-scan reticle writer was designed to meet the mask requirements for pilot production of this generation of devices. In this paper, we will review the IC device and user requirements that drove the design criteria of the MEBES 4500 system. The architecture of the MEBES 4500 system is described and compared to these design criteria. MEBES 4500 perfonnance results during development, manufacture, and installation are also compared to the commercial requirements of 250 nm design rule ICs.
MEBES systems are characterized by constituent error performance, whereas masks produced on pattern generators are characterized by composite error performance. System evaluation by constituent specification is notable for the ease with which system calibration can be obtained, monitored, and maintained. Constituent specifications need to be retained for these reasons. This work investigates the composite performance of a MEBES 4500 system when generating masks compared to system constituent performance. Masks with scan-centered and non-scan- centered patterns are characterized and compared with both MEBES-based MARKET metrology and independent tool-based metrology.
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