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Alessandro Rossi
at Dainippon Screen Italy SRL
SPIE Involvement:
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Publications (1)
Proceedings Article | 1 April 2008 Paper
Demonstration of production readiness of an immersion lithography cell
Alberto Beccalli, Paolo Canestrari, Mark Goeke, Masashi Kanaoka, Helmut Kandraschow, Takuya Kuroda, Danilo De Simone, Paolo Piacentini, Miriam Padovani, Paolo Piazza, Alessandro Rossi
Proceedings Volume 6924, 69244X (2008) https://doi.org/10.1117/12.779150
KEYWORDS: Semiconducting wafers, Critical dimension metrology, Immersion lithography, Lithography, Scanners, Silicon, Photoresist materials, Coating, Prototyping, Liquids
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